U-shaped bilayer graphene channel transistor with very high Ion/Ioff ratio

A novel graphene transistor architecture is reported. The transistor has a U-shaped geometry and was fabricated using a gallium focused ion beam (FIB). The channel conductance was tuned with a back gate. The Ion/Ioff ratio exceeded 10E5

Fabrication and characterisation of a double-clamped beam structure as a control gate for a high-speed non-volatile memory device

We report the fabrication and characterisation of a suspended double-clamped beam structure that is implemented as a movable control gate within a hybrid high-speed non-volatile memory device. This structure features a foundation of SiO2/Si layers over which a poly-Si layer (sacrificial) is deposited by using a low-pressure chemical vapour deposition (LPCVD) and as a movable control gate, an aluminium (Al) layer is deposited by using an e-beam evaporator. The Al layer is patterned with double-clamped beam structures by using photolithography and through a combination of wet and dry etching processes, the structures are successfully suspended and characterised by using a C–V meter. From the structure characterisation, the pull-in curve is successfully obtained and due to unexpected large short-range forces such as the van der Waals forces, the pull-out curve is not observed. In order to clarify this issue, a numerical analysis is performed in which the structural materials under test shown the influence of such short-range forces on the structure and a solution to override them is propose