89 research outputs found

    Economic feasibility study of total energy system options for the Massachusetts Institute of Technology

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    Includes bibliographical references (leaf 39)Prepared for the MIT Physical Plant Dep

    A Systematic Study of Radiation-Induced Segregation in Ferritic–Martensitic Alloys

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    A systematic approach to measuring radiation-induced segregation (RIS) was used on four ferritic–martensitic (F–M) alloys: T91, HCM12A, HT9, and a Fe–9Cr model alloy, irradiated with 2.0 MeV protons over a range of doses (1–10 dpa) and temperatures (300–700°C). The experimental conditions are established so as to isolate the dependence of RIS on the experimental parameters: temperature, dose and bulk composition. RIS is measured at prior austenite grain boundaries (PAGBs) using the STEM/EDX technique. Chromium is found to enrich at PAGBs in all conditions with the exception being T91 irradiated to 3 dpa at 700°C. The magnitude of enrichment is small (\u3c2 at%). Minor elements Si, Ni, and Cu also enrich consistently. A bell-shaped temperature dependence of RIS is observed in all elements. The amount of Cr enrichment decreases as a function of increasing bulk Cr concentration. Lastly, it is found that the 9Cr model alloy reaches a steady-state Cr RIS behavior at approximately 7 dpa, while the T91 reaches what may be a steady state near 3 dpa, then the amount of enrichment decreases at 10 dpa

    Ion beam modification of metals: Compositional and microstructural changes

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    Ion implantation has become a highly developed tool for modifying the structure and properties of metals and alloys. In addition to direct implantation, a variety of other ion beam techniques such as ion beam mixing, ion beam assisted deposition and plasma source ion implantation have been used increasingly in recent years. The modifications constitute compositional and microstructural changes in the surface of the metal. This leads to alterations in physical properties (transport, optical, corrosion, oxidation), as well as mechanical properties (strength, hardness, wear resistance, fatigue resistance). The compositional changes brought about by ion bombardment are classified into recoil implantation, cascade mixing, radiation-enhanced diffusion, radiation-induced segregation, Gibbsian adsorption and sputtering which combine to produce an often complicated compositional variation within the implanted layer and often, well beyond. Microstructurally, the phases present are often altered from what is expected from equilibrium thermodynamics giving rise to order-disorder transformations, metastable (crystalline, amorphous or quasicrystalline) phase formation and growth, as well as densification, grain growth, formation of a preferred texture and the formation of a high density dislocation network. All these effects need to be understood before one can determine the effect of ion bombardment on the physical and mechanical properties of metals. This paper reviews the literature in terms of the compositional and microstructural changes induced by ion bombardment, whether by direct implantation, ion beam mixing or other forms of ion irradiation. The topics are introduced as well as reviewed, making this a more pedogogical approach as opposed to one which treats only recent developments. The aim is to provide the tools needed to understand the consequent changes in physical and mechanical properties.Peer Reviewedhttp://deepblue.lib.umich.edu/bitstream/2027.42/28153/1/0000605.pd

    The heat‐of‐mixing effect on ion‐induced grain growth

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    Irradiation experiments were conducted on multilayer (ML) and coevaporated (CO) thin films in order to examine the role that the heat‐of‐mixing (ΔHmix) has in ion‐induced grain growth. Room‐temperature irradiations using 1.7‐MeV Xe ions were performed in the High Voltage Electron Microscope at Argonne National Laboratory. The ML films (Pt‐Ti, Pt‐V, Pt‐Ni, Au‐Co, and Ni‐Al) spanned a large range of calculated ΔHmix values. Comparison of grain growth rates between ML and CO films of a given alloy confirmed a heat‐of‐mixing effect. With the exception of the Pt‐V system, differences in grain growth rates between ML and CO films varied according to the sign of the calculated ΔHmix of the system. Substantial variations in growth rates among CO alloy films experiencing similar displacement damage demonstrated that a purely collisional approach is inadequate for describing ion‐induced grain growth. Therefore consideration must also be given to material‐specific properties, such as cohesive energy.Peer Reviewedhttp://deepblue.lib.umich.edu/bitstream/2027.42/70305/2/JAPIAU-70-3-1252-1.pd

    Phase formation in ion‐irradiated and annealed Ni‐rich Ni‐Al thin films

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    Phase formation was studied in ion‐irradiated multilayer and coevaporated Ni‐20 at. % Al films supported by Cu, Mo, and Ni transmission electron microscopy (TEM) grids. Irradiation with either 700‐keV Xe or 1.7‐MeV Xe, to doses sufficient to homogenize the multilayers (≄7.5×1015 cm−2), resulted in the formation of metastable supersaturated Îł and HCP phases in both film types. Post‐irradiation annealing of multilayers at 450 °C for 1 h transformed the metastable phases to a two‐phase Îł+Îłâ€Č microstructure. In the absence of Cu, the formation of Îłâ€Č appeared to proceed by a traditional diffusional growth mechanism, resulting in small (<50 Å) Îłâ€Č precipitates in Îł matrix grains. The presence of Cu caused the formation of a dual‐phase Îł+Îłâ€Č structure (i.e., distinct, equal‐sized grains of Îł and Îłâ€Č) during post‐irradiation annealing. It is suggested that copper affected the nucleation of Îłâ€Č precipitates and increased the kinetics of growth resulting in the dual‐phase morphology. Strong irradiation‐induced textures were observed in the multilayers that were less pronounced in the coevaporated films. The texture in the multilayers was attributed to the presence of a slight as‐evaporated texture combined with the enhanced atomic mobility due to the heat‐of‐mixing released during irradiation. The irradiation‐induced texture appeared to be necessary for the formation of the dual‐phase structure since it likely provided high‐diffusivity paths for Cu to diffuse into the film from the TEM grid.Peer Reviewedhttp://deepblue.lib.umich.edu/bitstream/2027.42/70874/2/JAPIAU-69-4-2021-1.pd

    Automatic iterative fitting of Rutherford backscattering spectra from multielement samples

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    A computer code (BASF) has been constructed to perform automatic iterative fitting of Rutherford backscattering spectra using only the experimental spectrum and the parameter set defining the experiment. The code may be used to analyze samples containing anywhere from two to five elements. The code output consists of the total amount of each element present and a composition versus depth profile.The code's performance was verified on both computer generated and experimental backscattering spectra. Samples consisting of nickel substrates onto which layers of pure nickel and pure aluminum have been alternately evaporated in thicknesses of 130 and 100 A, respectively, were used to produce backscattering spectra. These spectra, when analyzed, demonstrated that the code was able to determine the total aluminum content to within 3% and the ratio of aluminum to nickel to within 1% of the thickness monitor readings taken during evaporation. The code has shown the ability to recognize sharp interfaces in well resolved spectra. The code performs equally well on slowly varying concentration profiles which are created during the annealing of layered samples. Limitations on the code and its use include the precise knowledge of the relevant experimental parameters used as input, and complete specification of all elements in the sample. The ultimate limits on the code's accuracy are the resolution of the spectrum and the accuracy of the computed stopping powers.This code provides a significant advantage over other spectrum fitting codes in that the process is fully automated and does not require constant user interaction. Further, it provides the capability of accurately determining concentration profiles in layered samples where the layer thickness is of the order 100 A.Peer Reviewedhttp://deepblue.lib.umich.edu/bitstream/2027.42/25485/1/0000025.pd

    A high intensity radiation effects facility

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    The facility of the Michigan Ion Beam Laboratory at the University of Michigan has been upgraded to conduct high intensity radiation effects studies on materials. This upgrade is necessary to pursue higher radiation damage levels than the studies previously conducted. To achieve this capability a new volume ion source was installed which can produce several times more H−H− current than the previous duoplasmatron. We will describe the objectives of the research and the facility as well as applications to a variety of radiation damage problems. © 2001 American Institute of Physics.Peer Reviewedhttp://deepblue.lib.umich.edu/bitstream/2027.42/87674/2/687_1.pd

    Remote Monitoring and Control of Irradiation Experiments

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    As computer technology plays an increasing important role in particle accelerator facilities, instrumentation systems can be expected to include web connections and other remote capability features. The Michigan Ion Beam Laboratory at the University of Michigan in Ann Arbor has developed remote monitor and control capability by using a combination of commercial software packages and in‐house software development. Irradiation parameters such as ion current on the samples and apertures, sample temperature read from an optical pyrometer, and chamber pressure can all be accessed and monitored remotely through a web site, as can ion source parameters such as power supply currents and voltages or feed gas pressure. With administrator permission, the control parameters of the ion source or the readouts from the irradiation stage can be modified in real time during an experiment. A description will be given of the various ways in which this type of remote monitoring and control has been accomplished at the Michigan Ion Beam Laboratory. © 2003 American Institute of PhysicsPeer Reviewedhttp://deepblue.lib.umich.edu/bitstream/2027.42/87309/2/1046_1.pd
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