107 research outputs found

    Preface : Materials and Technologies for 3-D Integration - 2008 MRS Fall Meeting; Boston, MA; 1 December 2008 through 3 December 2008

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    3-dimensional integration (3D IC) is a system level architecture/technology wherein multiple layers of planar devices are stacked and vertically interconnected through the silicon substrate (or other semiconductor material) in the Z direction as shown in Figure 1

    Deep Reactive Ion Etching of Through Silicon Vias

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    This chapter contains sections titled: • Introduction • DRIE Equipment and Characterization • DRIE Processing • Practical Solutions in Via Etching • Concluding Remarks • Appendix A: Glossary of Abbreviations • Appendix B: Examples of DRIE Recipes • Reference
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