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    Optimization of Surface Orientation for High-Performance, Low-Power and Robust FinFET SRAM

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    We analyze the impact of surface orientation on stability and performance of FinFET SRAMs. We show that devices with proper orientations can improve static noise margin (SNM, 23-35%) and access time (22-33%) of 32nm FinFET SRAM compared to a design with devices of single (110) orientation
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