10 research outputs found

    High-Power Plasma Discharge Source At 13.5 Nm And 11.4 Nm For Euv Lithography

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    An intense pulsed capillary discharge source operating at 13.5 nm and 11.4 nm, suitable for use in conjunction with Mo:Si or Mo:Be coated optics, has produced an average power of approximately 1.4 W within a 0.3 nm emission bandwidth from the end of the capillary when operated at a repetition rate of 100 Hz. The source is comprised of a small capillary discharge tube filled with xenon gas at low pressure to which electrodes are attached at each end. When a voltage is applied across the tube, an electrical current is generated for short periods within the capillary that produces highly ionized xenon ions radiating in the EUV. Issues associated with plasma bore erosion are currently being addressed from the standpoint of developing such a source for operation at repetition rates of greater than 1 kHz

    REVIEW OF LIVERMORE'S SOFT X-RAY LASER PROGRAM

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    We will describe our optical laser pumped XUV Laser Program. To date, we have concentrated our efforts on exploding foil amplifier designs using Ne- and Ni-like n=3p to 3s and n=4f, d to 4d, p inversion schemes, respectively. We will describe our latest modeling results as well as measurements which demonstrate output power near the 1 MW level at 206 and 209 Ã… and lasing at wavelengths as short as 106 Ã…
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