Spectroscopic ellipsometry and polarimetry for materials and systems analysis at the nanometer scale: state-of-the-art, potential, and perspectives

This paper discusses the fundamentals, applications, potential, limitations, and future perspectives of polarized light reflection techniques for the characterization of materials and related systems and devices at the nanoscale. These techniques include spectroscopic ellipsometry, polarimetry, and reflectance anisotropy. We give an overview of the various ellipsometry strategies for the measurement and analysis of nanometric films, metal nanoparticles and nanowires, semiconductor nanocrystals, and submicron periodic structures. We show that ellipsometry is capable of more than the determination of thickness and optical properties, and it can be exploited to gain information about process control, geometry factors, anisotropy, defects, and quantum confinement effects of nanostructures

Developing 1D nanostructure arrays for future nanophotonics

There is intense and growing interest in one-dimensional (1-D) nanostructures from the perspective of their synthesis and unique properties, especially with respect to their excellent optical response and an ability to form heterostructures. This review discusses alternative approaches to preparation and organization of such structures, and their potential properties. In particular, molecular-scale printing is highlighted as a method for creating organized pre-cursor structure for locating nanowires, as well as vapor–liquid–solid (VLS) templated growth using nano-channel alumina (NCA), and deposition of 1-D structures with glancing angle deposition (GLAD). As regards novel optical properties, we discuss as an example, finite size photonic crystal cavity structures formed from such nanostructure arrays possessing highQand small mode volume, and being ideal for developing future nanolasers

Biaxial thin-film coated-plate polarizing beam splitters

We present a design for a biaxial thin-film coated-plate polarizing beam splitter that transmits the p-polarized component of a beam of light without change of direction and reflects the s-polarized component. The beam splitter has a periodic structure and is planned for fabrication by serial bideposition in mutually orthogonal planes. Recent experimental data for form-birefringent silicon is used to establish the feasibility of the design for a beam splitter to be used at 1310 nm and at an angle of 45° in air. © 2006 Optical Society of America

Enhanced birefringence in vacuum evaporated silicon thin films

NRC publication: Ye

Proceedings of the International Conference on Alications of Photonic Technology

NRC publication: Ye

Thickness and density evaluation for nanostructured thin films by glancing angle deposition

NRC publication: Ye