Spin Curves for MicroChem S1800 (1805, 1813, 1818) Series Positive Resist

Spin curves for MicroChem\u27s S1805, S1813, and S1818 were generated and mapped using the Filmetrics F50. Statistical measurements were performed (N=85) and are reported here

The role of van der Waals and exchange interactions in high-pressure solid hydrogen

We investigate the van der Waals interactions in solid molecular hydrogen structures. We calculate enthalpy and the Gibbs free energy to obtain zero and finite temperature phase diagrams, respectively. We employ density functional theory (DFT) to calculate the electronic structure and density functional perturbation theory (DFPT) with van der Waals (vdW) functionals to obtain phonon spectra. We focus on the solid molecular C2/c, Cmca-12, P63/m, Cmca, and Pbcn structures within the pressure range of 200 < P < 450 GPa. We propose two structures of the C2/c and Pbcn for phase III which are stabilized within different pressure range above 200 GPa. We find that vdW functionals have a big effect on vibrations and finite-temperature phase stability, however, different vdW functionals have different effects. We conclude that, in addition to the vdW interaction, a correct treatment of the high charge gradient limit is essential. We show that the dependence of molecular bond-lengths on exchange–correlation also has a considerable influence on the calculated metallization pressure, introducing errors of up to 100 GPa

ZEP520A Contrast Curves

This report documents the contrast curves for the ZEP520A electron beam lithography resist from ZEON Chemicals. Dilution by weight of ZEP520A vs spin speed from 1000 to 6000 rpm was generated in previous work. The aim is to provide an approximate clearing and base dose for the ZEP520A standard process at the Singh Center for Nanotechnology

PMMA A2 and A4 Spin Curves

This report documents the spin curves for the PMMA A2 and A4 electron beam lithography resists from MicroChem. The aim is to provide a spin curve reference for the A2 and A4 dilutions at the Singh Center for Nanotechnolgy Quattrone Nanofabrication Facility

Elionix ELS-7500EX: Field Size Analysis

This report documents the field distortion of the Elionix ELS-7500EX electron beam lithography system at the University of Pennsylvania Singh Center for Nanotechnology at the Quattrone Nanofabrication Facility. The system is equipped with a 20MHz fixed clock and fixed focus. The aim of the work is to understand optimal field sizes to use for critical dimensions 80nm and above. Field uniformity was analyzed as a function of critical dimension and objective lens aperture (OLA) a.k.a. final paerture. As features scale down below 300nm, they are more susceptible to the systematic effects of field distortion. Suggested field sizes depend on the feature size that is desired

PMMA A2 Contrast Curves

This report documents the contrast curves for the PMMA A2 electron beam lithography resist from MicroChem. Spin curves for PMMA A2 can be found in previous work. The aim is to provide an approximate clearing and base dose for the PMMA A2 standard process at the Singh Center for Nanotechnology

Using Bayesian Model Averaging (BMA) to calibrate probabilistic surface temperature forecasts over Iran

Using Bayesian Model Averaging (BMA), an attempt was made to obtain calibrated probabilistic numerical forecasts of 2-m temperature over Iran. The ensemble employs three limited area models (WRF, MM5 and HRM), with WRF used with five different configurations. Initial and boundary conditions for MM5 and WRF are obtained from the National Centers for Environmental Prediction (NCEP) Global Forecast System (GFS) and for HRM the initial and boundary conditions come from analysis of Global Model Europe (GME) of the German Weather Service. The resulting ensemble of seven members was run for a period of 6 months (from December 2008 to May 2009) over Iran. The 48-h raw ensemble outputs were calibrated using BMA technique for 120 days using a 40 days training sample of forecasts and relative verification data. <br><br> The calibrated probabilistic forecasts were assessed using rank histogram and attribute diagrams. Results showed that application of BMA improved the reliability of the raw ensemble. Using the weighted ensemble mean forecast as a deterministic forecast it was found that the deterministic-style BMA forecasts performed usually better than the best member's deterministic forecast

Characterization of Silicon Dioxide (SiO2) and Microchem S1800 Resist Etching Using Oxford 80 Plus RIE

This technical report describes the process of etching silicon dioxide (SiO2) and Microchem S1800 resist using the Oxford 80 Plus Reactive Ion Etch (RIE) system

Characterization of Silicon Deep Reactive Ion Etching Using the SPTS Rapier

This technical report examines the silicon etch process using the SPTS Rapier Si DRIE system and highlights the difference in etch properties between small (~10 micron) and large (~500 micron) features

Simulation and life cycle assessment of algae gasification process in dual fluidized bed gasifiers

We present simulation results for the production of algae-derived syngas using dual fluidized bed (DFB) gasifiers.Part of this work was funded by the Technology Strategy Board (TSB) grant programme, “Carbon Abatement Technologies, Phase 2 competition for collaborative R&D and feasibility”, Grant No. TS/J004553. MK acknowledges support by the Singapore National Research Foundation under its Campus for Research Excellence And Technological Enterprise (CREATE) program.This is the accepted manuscript. The final version is available at http://pubs.rsc.org/en/Content/ArticleLanding/2015/GC/c4gc01698j#!divAbstract