Gottstein G. Stress-driven migration of symmetrical h100i tilt grain boundaries

Abstract Stress-induced migration of planar grain boundaries in aluminum bicrystals was measured for both low-and high-angle symmetrical h1 0 0i tilt grain boundaries across the entire misorientation range (0-90°). Boundary migration under a shear stress was observed to be coupled to a lateral translation of the grains. Boundaries with misorientations smaller than 31°and larger than 36°moved in opposite directions under the same applied external stress. The measured ratios of the normal boundary motion to the lateral displacement of grains are in an excellent agreement with theoretical predictions. The coupled boundary motion was measured in the temperature range between 280 and 400°C, and the corresponding activation parameters were determined. The results revealed that for mechanically induced grain-boundary motion there is a misorientation dependence of migration activation parameters. The obtained results are discussed with respect of the mechanism of grain-boundary motion