Aberration characterization of x-ray optics using multi-modal ptychography and a partially coherent source

Ptychography is a scanning coherent diffraction imaging technique that provides high-resolution imaging and complete spatial information of the complex probe and object transmission function. The wavefront error caused by aberrated optics has previously been recovered using ptychography when a highly coherent source is used, but has not been demonstrated with partial coherence due to the multi-modal probe required. Here, we demonstrate that partial coherence can be accounted for in ptychographic reconstructions using the multi-modal approach and assuming that decoherence arises from either the probe or the object. This equivalence recovers coherent (or single state) reconstructions of both the probe and the object even in the presence of partial coherence. We demonstrate this experimentally by using hard x-ray ptychography with a partially coherent source to image a Siemens star test object and to also recover the wavefront error from an aberrated beryllium compound refractive lens. The source properties and resolving capabilities are analyzed, and the wavefront error results are compared with another at-wavelength metrology technique. Our work demonstrates the capability of ptychography to provide high-resolution imaging and optics characterization even in the presence of partial coherence

Two-dimensional wavefront characterization of adaptable corrective optics and Kirkpatrick-Baez mirror system using ptychography

Aberrations introduced during fabrication degrade the performance of X-ray optics and their ability to achieve diffraction limited focusing. Corrective optics can counteract these errors by introducing wavefront perturbations prior to the optic which cancel out the distortions. Here we demonstrate two-dimensional wavefront correction of an aberrated Kirkpatrick-Baez mirror pair using adaptable refractive structures. The resulting two-dimensional wavefront is measured using hard X-ray ptychography to recover the complex probe wavefield with high spatial resolution and model the optical performance under coherent conditions. The optical performance including the beam caustic, focal profile and wavefront error is examined before and after correction with both mirrors found to be diffraction limited after correcting. The results will be applicable to a wide variety of high numerical aperture X-ray optics aiming to achieve diffraction limited focussing using low emittance sources

Hard X-ray ptychography for optics characterization using a partially coherent synchrotron source

Ptychography is a scanning coherent diffraction imaging technique which provides high resolution imaging and complete spatial information of the complex electric field probe and sample transmission function. Its ability to accurately determine the illumination probe has led to its use at modern synchrotrons and free-electron lasers as a wavefront-sensing technique for optics alignment, monitoring and correction. Recent developments in the ptychography reconstruction process now incorporate a modal decomposition of the illuminating probe and relax the restriction of using sources with high spatial coherence. In this article a practical implementation of hard X-ray ptychography from a partially coherent X-ray source with a large number of modes is demonstrated experimentally. A strongly diffracting Siemens star test sample is imaged using the focused beam produced by either a Fresnel zone plate or beryllium compound refractive lens. The recovered probe from each optic is back propagated in order to plot the beam caustic and determine the precise focal size and position. The power distribution of the reconstructed probe modes also allows the quantification of the beams coherence and is compared with the values predicted by a Gaussian-Schell model and the optics exit intensity

Deep reactive ion etching of silicon moulds for the fabrication of diamond x-ray focusing lenses

Diamond is a highly desirable material for use in x-ray optics and instrumentation. However, due to its extreme hardness and resistance to chemical attack, diamond is difficult to form into a structure suitable for x-ray lenses. Refractive lenses are capable of delivering x-ray beams with nanoscale resolution. A moulding technique for the fabrication of diamond lenses is reported. High-quality silicon moulds were made using photolithography and deep reactive ion etching. The study of the etch process conducted to achieve silicon moulds with vertical sidewalls and minimal surface roughness is discussed. Issues experienced when attempting to deposit diamond into a high-aspect-ratio mould by chemical vapour deposition are highlighted. Two generations of lenses have been successfully fabricated using this transfer-moulding approach with significant improvement in the quality and performance of the optics observed in the second iteration. Testing of the diamond x-ray optics on the Diamond Light Source Ltd synchrotron B16 beamline has yielded a line focus of sub-micrometre width. © 2013 IOP Publishing Ltd