Direct UV written planar Bragg gratings that feature zero fluence induced birefringence

Direct UV writing is a planar fabrication process capable of simultaneously defining waveguides and Bragg gratings. The technique is fully computer controlled and uniquely uses a small focused spot ~7 μm in diameter for direct writing exposure. This work investigates its use to achieve phase trimming and Bragg grating definition in silica-on-silicon lithographic waveguides. It is observed that birefringence control using direct UV writing can be made independent of exposure fluence with this technique through tailoring substrate stress. The result is demonstrated experimentally and supported theoretically using finite element analysis