Dielectric-graphene integration and electron transport in graphene hybrid structures

textDielectrics have been an integral part of the electron devices and will likely resume playing a significant role in the future of nanoelectronics. An important step in assessing graphene potential as an alternative channel material for future electron devices is to benchmark its transport characteristics when integrated with dielectrics. Using back-gated and dual gated graphene field-effect transistors with top high-k metal-oxide dielectric, we study the dielectric thickness dependence of the carrier mobility. We show the carrier mobility decreases after deposition of metal-oxide dielectrics by atomic layer deposition (ALD) thanks to the Coulomb scattering by charged point defects in the dielectric. We investigate a novel method for the ALD of metal-oxide dielectrics on graphene, using an ultrathin nucleation layer that enables the realization of graphene field-effect transistors with aggressively scaled gate dielectric thickness. We show the nucleation layer significantly affects the quality of the subsequently deposited dielectric. In addition, we study transport characteristics of double layer systems. We demonstrate heterostructures consisting of two rotationally aligned bilayer graphene with an ultra-thin hexagonal boron nitride dielectric in between fabricated using advanced layer-by-layer transfer as well as layer pickup techniques. We show that double bilayer graphene devices possess negative differential resistance and resonant tunneling in their interlayer current-voltage characteristics in a wide range of temperatures. We show the resonant tunneling occurs either when the charge neutrality points of the two bilayer graphene are energetically aligned or when the lower conduction sub-band of one layer is aligned with the upper conduction sub-band of the opposite layer. Finally, we study the Raman spectra and the magneto-transport characteristics of A-B stacked and rotationally misaligned bilayer graphene deposited by chemical-vapor-deposition (CVD) on Cu. We show that the quantum Hall states (QHSs) sequence of the CVD grown A-B stacked bilayer graphene is consistent with that of natural bilayer graphene, while the sequence of the QHSs in the CVD grown rotationally misaligned bilayer graphene is a superposition of monolayer graphene QHSs. From the magnetotransport measurements in rotationally misaligned CVD-grown bilayer we determine the layer densities and the interlayer capacitance.Electrical and Computer Engineerin

Quantum Hall Effect in Bernal Stacked and Twisted Bilayer Graphene Grown on Cu by Chemical Vapor Deposition

We examine the quantum Hall effect in bilayer graphene grown on Cu substrates by chemical vapor deposition. Spatially resolved Raman spectroscopy suggests a mixture of Bernal (A-B) stacked and rotationally faulted (twisted) domains. Magnetotransport measurements performed on bilayer domains with a wide 2D band reveal quantum Hall states (QHSs) at filling factors $\nu=4, 8, 12$ consistent with a Bernal stacked bilayer, while magnetotransport measurements in bilayer domains defined by a narrow 2D band show a superposition of QHSs of two independent monolayers. The analysis of the Shubnikov-de Haas oscillations measured in twisted graphene bilayers provides the carrier density in each layer as a function of the gate bias and the inter-layer capacitance.Comment: 5 pages, 4 figure

Dielectric Thickness Dependence of Carrier Mobility in Graphene with HfO2 Top Dielectric

We investigate the carrier mobility in mono- and bi-layer graphene with a top HfO2 dielectric, as a function of the HfO2 film thickness and temperature. The results show that the carrier mobility decreases during the deposition of the first 2-4 nm of top dielectric and remains constant for thicker layers. The carrier mobility shows a relatively weak dependence on temperature indicating that phonon scattering does not play a dominant role in controlling the carrier mobility. The data strongly suggest that fixed charged impurities located in close proximity to the graphene are responsible for the mobility degradation.Comment: 3 pages, 4 figure

Direct Measurement of the Fermi Energy in Graphene Using a Double Layer Structure

We describe a technique which allows a direct measurement of the relative Fermi energy in an electron system using a double layer structure, where graphene is one of the two layers. We illustrate this method by probing the Fermi energy as a function of density in a graphene monolayer, at zero and in high magnetic fields. This technique allows us to determine the Fermi velocity, Landau level spacing, and Landau level broadening in graphene. We find that the N=0 Landau level broadening is larger by comparison to the broadening of upper and lower Landau levels.Comment: 5 pages, 4 figure