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5 research outputs found

Study of 193 nm photoresist degradation during short time fluorocarbon plasma exposures. II. Plasma parameter trends for photoresist degradation

Author: Bae
F. Weilnboeck
G. S. Oehrlein
Ito
Kishimura
M. Sumiya
R. Bruce
S. Engelmann
Sanders
Publication venue: 'American Vacuum Society'
Publication date: 01/01/2008
Field of study

Study of 193 nm photoresist degradation during short time fluorocarbon plasma exposure. I. Studies of modified layer formation

Author: Bae
F. Weilnboeck
G. S. Oehrlein
Ito
Kishimura
M. Sumiya
R. Bruce
S. Engelmann
Sakamori
Sanders
Publication venue: 'American Vacuum Society'
Publication date: 01/01/2008
Field of study

Evolution of photoresist layer structure and surface morphology under fluorocarbon‐based plasma exposure

Author: Chung T.‐Y.
DuPont
Engelmann S.
Hopf C.
Hua X.
Keudell A.
Li X.
Li X.
Lin K.‐Y.
Metzler D.
Pranda A.
Rae P. J.
Schaepkens M.
Sekine M.
Shi H.
Tanaka J.
Wang M.
Weilnboeck F.
Yin Y.
Publication venue: 'Wiley'
Publication date
Field of study

Damage-free plasma etching of porous organo-silicate low-k using micro-capillary condensation above −50 °C

Author: A Grill
A Humbert
AD Becke
B Jinnai
C Lee
D Eon
D Shamiryan
E Kunnen
F Bailly
F Leroy
F Weilnboeck
H Jeong
H Ren
H Shi
H Yin
J Li
J-F Marneffe de
K Maex
L Zhang
L Zhang
L Zhang
M Darnon
M Krishtab
MR Baklanov
MR Baklanov
QT Le
R Bauernschmitt
RL Bruce
S Napolitano
S Napolitano
S Napolitano
SK Singh
T Frot
T Rakhimova
TV Rakhimova
V Jousseaume
YA Mankelevich
Publication venue: 'Springer Science and Business Media LLC'
Publication date
Field of study

Vapor-Deposited Parylene Photoresist: A Multipotent Approach toward Chemically and Topographically Defined Biointerfaces

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