9 research outputs found

    Phase transitions and crossovers in reaction-diffusion models with catalyst deactivation

    Full text link
    The activity of catalytic materials is reduced during operation by several mechanisms, one of them being poisoning of catalytic sites by chemisorbed impurities or products. Here we study the effects of poisoning in two reaction-diffusion models in one-dimensional lattices with randomly distributed catalytic sites. Unimolecular and bimolecular single-species reactions are considered, without reactant input during the operation. The models show transitions between a phase with continuous decay of reactant concentration and a phase with asymptotic non-zero reactant concentration and complete poisoning of the catalyst. The transition boundary depends on the initial reactant and catalyst concentrations and on the poisoning probability. The critical system behaves as in the two-species annihilation reaction, with reactant concentration decaying as t^{-1/4} and the catalytic sites playing the role of the second species. In the unimolecular reaction, a significant crossover to the asymptotic scaling is observed even when one of those parameters is 10% far from criticality. Consequently, an effective power-law decay of concentration may persist up to long times and lead to an apparent change in the reaction kinetics. In the bimolecular single-species reaction, the critical scaling is followed by a two-dimensional rapid decay, thus two crossovers are found.Comment: 8 pages, 7 figure

    Depinning transitions in interface growth models

    No full text

    Temperature Effects in the Initial Stages of Heteroepitaxial Film Growth

    No full text
    Kinetic Monte Carlo simulations of a model of thin film heteroepitaxy are performed to investigate the effects of the deposition temperature in the initial growth stages. Broad ranges of the rates of surface processes are used to model materials with several activation energies and several temperature changes, in conditions of larger diffusivity on the substrate in comparison with other film layers. When films with the same coverage are compared, the roughness increases with the deposition temperature in the regimes of island growth, coalescence, and initial formation of the continuous films. Concomitantly, the position of the minimum of the autocorrelation function is displaced to larger sizes. These apparently universal trends are consequences of the formation of wider and taller islands, and are observed with or without Ehrlich-Schwöebel barriers for adatom diffusion at step edges. The roughness increase with temperature qualitatively matches the observations of recent works on the deposition of inorganic and organic materials. In thicker films, simulations with some parameter sets show the decrease of roughness with temperature. In these cases, a re-entrance of roughness may be observed in the initial formation of the continuous films
    corecore