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4 research outputs found
Predicted effect of shot noise on contact hole dimension in e-beam lithography
Author
Eder-Kapl
Gallatin
+7 more
Leunissen
M. Wieland
Michaelson
P. Kruit
Poppe
S. Steenbrink
Yu
Publication venue
'American Vacuum Society'
Publication date
01/01/2006
Field of study
No full text
Crossref
Mask manufacture for projection mask-less lithography (PML2): MEMS-technology for a programmable aperture plate system
Author
Brünger W.
Döring H.-J.
+8 more
Eder-Kapl S.
Eichholz J.
Haugeneder E.
Kähler D.
Nowak R.
Ratzmann L.
Reimer K.
Witt M.
Publication venue
Publication date
01/01/2005
Field of study
No full text
Crossref
Fraunhofer-ePrints
Proof-of-concept tool development for projection mask-less lithography (PML2)
Author
Brandstätter C.
Döring H.-J.
+10 more
Eder-Kapl S.
Eichholz J.
Elster T.
Fortagne O.
Haugeneder E.
Heinitz J.
Lammer G.
Löschner H.
Reimer K.
Saniter J.
Publication venue
Publication date
01/01/2005
Field of study
No full text
Crossref
Fraunhofer-ePrints
Mechanism of Extreme Ultraviolet Photoresist Development with a Supercritical CO 2
Author
Bashki V
Bird B.
+60 more
Brandt D. C
Brunner T. A.
Burns Sean D.
Cao T.
Chang S. W.
Constantoudis V.
Corthout M
De Campo F.
DeYoung J.
Eder-Kapl S.
Felix N.
Flanigan L. W.
Flanigan L. W.
Flanigan L. W.
Gambaretto G.
Geankoplis C. J.
Goldfarb D. L.
Hand A.
Irie M.
Jones C. A.
Jung M. H.
Lemmon E. W.
Lu C.
Ma Y. S.
Muramatsu H.
Muramatsu H.
Muramatsu H.
Namatsu H.
Namatsu H.
Namatsu H.
Narasimhan B.
Peters L.
Pham V. Q.
Pham V. Q.
Reiser A.
Reynolds G. W.
Shao H.
Shih H. Y.
Shih H. Y.
Shin K. S.
Somervell M. H.
Sundararajan N.
Susse C.
Tanaka K.
Tanaka T.
Tanaka T.
Thackeray J. W.
Tsiartas P. C.
Wagner M.
Wagner M.
Wilke C. R.
Wu Y. T.
Yamashita Y.
Yeh T. F.
Yoshimura T.
Yoshizawa M.
Zhang P.
Zhang X. G.
Zweber A. E.
Zweber A. E.
Publication venue
'American Chemical Society (ACS)'
Publication date
Field of study
No full text
Crossref