2 research outputs found
Mechanism for etching of exfoliated graphene on substrates by low-energy electron irradiation from helium plasma electron sources
Article investigating the mechanism for etching of exfoliated graphene multilayers on SiO₂ by low-energy (50 eV) electron irradiation using He plasma systems for electron sources
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Comment on "Modification of graphene properties due to electron-beam irradiation"
This article gives comment to a previous article entitled 'Modification of graphene properties due to electron-beam irradiation'. These articles discuss the modification of graphene properties due to electron-beam irradiation