49 research outputs found

    Final Report Spacially-Resolved Diagnostics and Modeling of Micro-Discharges

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    Optical emission spectroscopy measurements were performed with added trace probe gases in an atmospheric pressure direct current (DC) helium microplasma. Spatially resolved measurements (resolution {approx} 6 {micro}m) were taken across a 200 {micro}m slot-type discharge. Stark splitting of the hydrogen Balmer-line was used to investigate the electric field distribution in the cathode sheath region. Electron densities were evaluated from the analysis of the spectral line broadenings of H-{beta} emission. The electron density in the bulk plasma was in the range 3-8 x 1013 cm-3. The electric field peaked at the cathode ({approx}60 kV/cm) and decayed to small values over a distance of {approx} 50 {micro}m (sheath edge) from the cathode. These experimental data were in good agreement with a self-consistent one-dimensional model of the discharge. The dependence of gas temperature on gas flow through the slot-type, atmospheric pressure microplasma in helium or argon was investigated by a combination of experiments and modeling. Spatially-resolved gas temperature profiles across the gap between the two electrodes were obtained from rotational analysis of N{sub 2} (C{sup 3}II{sub u} {yields} B{sup 3} II{sub g}) emission spectra, with small amounts of N{sub 2} added as actinometer gas. Under the same input power of 20 kW/cm{sup 3}, the peak gas temperature in helium ({approx}650 K) was significantly lower than that in argon (over 1200 K). This reflects the much higher thermal conductivity of helium gas. The gas temperature decreased with increasing gas flow rate, more so in argon compared to helium. This was consistent with the fact that conductive heat losses dominate in helium microplasmas, while convective heat losses play a major role in argon microplasmas. A plasma-gas flow simulation of the microdischarge, including a chemistry set, a compressible Navier-Stokes (and mass continuity) equation, and a convective heat transport equation, was also performed. Experimental measurements were in good agreement with simulation predictions. Finally, laser scattering experiments were performed at pressures of 100s of Torr in argon or nitrogen. Laser Thomson Scattering (LTS) and Rotational Raman Scattering were employed in a novel, backscattering, confocal configuration. LTS allows direct and simultaneous measurement of both electron density (ne) and electron temperature (Te). For 50 mA current and over the pressure range of 300-700 Torr, LTS yielded Te = 0.9 {+-} 0.3 eV and ne = (6 {+-} 3) 1013 cm-3, in reasonable agreement with the predictions of a mathematical model. Rotational Raman spectroscopy (RRS) was employed for absolute calibration of the LTS signal. RRS was also applied to measure the 3D gas temperature (Tg) in nitrogen DC microdischarges. In addition, diode laser absorption spectroscopy was employed to measure the density of argon metastables (1s5 in Paschen notations) in argon microdischarges. The gas temperature, extracted from the width of the absorption profile, was compared with Tg values obtained by optical emission spectroscopy

    Ion energy distributions in inductively coupled plasmas having a biased boundary electrode

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    In many plasma materials processing applications requiring energetic ion bombardment such as plasma etching, control of the time-averaged ion energy distributions (IEDs) to surfaces is becoming increasingly important to discriminate between surface processes having different threshold energies. Inductively coupled plasmas (ICPs) are attractive in this regard since the plasma potential is low and so the energy of ion fluxes can be more finely tuned with externally applied biases. In these situations, pulsed plasmas provide another level of control as the IEDs from different times during the pulse power period can be combined to create the desired time-averaged IED. A recent development in controlling of IEDs in ICPs is the use of a boundary electrode (BE) in which a continuous or pulsed dc bias is applied to shift the plasma potential and modify the IEDs to surfaces without significant changes in the bulk plasma properties. Combinations of pulsing the ICP power and the BE bias provide additional flexibility to craft IEDs. In this paper we discuss results from a computational investigation of IEDs to a grounded substrate in low-pressure (a few to 50 mTorr) ICPs sustained in argon. Results are compared with experimental measurements of plasma properties and IEDs. We demonstrate the ability to customize IEDs consisting of three energy peaks corresponding to the plasma potential during the plasma active glow, plasma afterglow and the plasma potential with the applied boundary voltage.Peer Reviewedhttp://deepblue.lib.umich.edu/bitstream/2027.42/98615/1/0963-0252_21_6_065009.pd

    Effect of Electron Energy Distribution Function on Power Deposition and Plasma Density in an Inductively Coupled Discharge at Very Low Pressures

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    A self-consistent 1-D model was developed to study the effect of the electron energy distribution function (EEDF) on power deposition and plasma density profiles in a planar inductively coupled plasma (ICP) in the non-local regime (pressure < 10 mTorr). The model consisted of three modules: (1) an electron energy distribution function (EEDF) module to compute the non-Maxwellian EEDF, (2) a non-local electron kinetics module to predict the non-local electron conductivity, RF current, electric field and power deposition profiles in the non-uniform plasma, and (3) a heavy species transport module to solve for the ion density and velocity profiles as well as the metastable density. Results using the non-Maxwellian EEDF model were compared with predictions using a Maxwellian EEDF, under otherwise identical conditions. The RF electric field, current, and power deposition profiles were different, especially at 1mTorr, for which the electron effective mean free path was larger than the skin depth. The plasma density predicted by the Maxwellian EEDF was up to 93% larger for the conditions examined. Thus, the non-Maxwellian EEDF must be accounted for in modeling ICPs at very low pressures.Comment: 19 pages submitted to Plasma Sources Sci. Techno

    Wet Chemical Etching of GaAs Using a Novel Rotating‐Cell Reactor

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