2 research outputs found
МЕТОДЫ АВТОМАТИЧЕСКОГО КОНТРОЛЯ ТОПОЛОГИИ ПЛАНАРНЫХ СТРУКТУР ИЗДЕЛИЙ ЭЛЕКТРОННОЙ ТЕХНИКИ
The given paper contains description of existing methods for automatic control of planar structure layout pertaining to products of micro- and nanoelectronics and other electronic technologies products and their classification. An algorithm of method selection is based on the analysis of factors influencing on method preference and depends on characteristics of an object to be controlled and controlling conditions. The described algorythm is to be applied in the process of designing the equipment for automatic control of planar structure layout on photographic masks, semiconductor wafers, printed-circuit boards with high-density assembly. Приводится описание существующих методов автоматического контроля топологии планарных структур изделий микро- и наноэлектроники, других изделий электронной техники, дается их классификация. На основании анализа факторов, влияющих на принятие решения о выборе метода контроля топологии, определяется алгоритм выбора метода в зависимости от характеристик контролируемого объекта и условий контроля. Описанный алгоритм предназначен для использования при проектировании оборудования для автоматического контроля топологии планарных структур на фотошаблонах, полупроводниковых пластинах, печатных платах высокой плотности монтажа.
METHODS FOR AUTOMATIC CONTROL OF PLANAR STRUCTURE LAYOUT PERTAINING TO ELECTRONICS TECHNOLOGIES PRODUCTS
The given paper contains description of existing methods for automatic control of planar structure layout pertaining to products of micro- and nanoelectronics and other electronic technologies products and their classification. An algorithm of method selection is based on the analysis of factors influencing on method preference and depends on characteristics of an object to be controlled and controlling conditions. The described algorythm is to be applied in the process of designing the equipment for automatic control of planar structure layout on photographic masks, semiconductor wafers, printed-circuit boards with high-density assembly