Data publication: Controlled Silicidation of SiNW using FLA

The folder contains the following: 1. all the SEM and TEM images. 2. The schematics of fabrication 3. comparison of silicidation with FLA and RTA and 4. temperature simulations to estimate temperature during FLA process

Towards reconfigurable electronics: Silicidation of top-down fabricated silicon nanowires

We present results of our investigations on nickel silicidation of top-down fabricated silicon nanowires (SiNWs). Control over the silicidation process is important for the application of SiNWs in reconfigurable field-effect transistors. Silicidation is performed using a rapid thermal annealing process on the SiNWs fabricated by electron beam lithography and inductively-coupled plasma etching. The effects of variations in crystallographic orientations of SiNWs and different NW designs on the silicidation process are studied. Scanning electron microscopy and transmission electron microscopy are performed to study Ni diffusion, silicide phases, and silicide-silicon interfaces. Control over the silicide phase is achieved together with atomically sharp silicide-silicon interfaces. We find that (111) interfaces are predominantly formed, which are energetically most favorable according to density functional theory calculations. However, control over the silicide length remains a challenge

Abstracts of 1st International Conference on Machine Intelligence and System Sciences

This book contains the abstracts of the papers presented at the International Conference on Machine Intelligence and System Sciences (MISS-2021) Organized by the Techno College of Engineering, Agartala, Tripura, India & Tongmyong University, Busan, South Korea, held on 1–2 November 2021. This conference was intended to enable researchers to build connections between different digital technologies based on Machine Intelligence, Image Processing, and the Internet of Things (IoT). Conference Title: 1st International Conference on Machine Intelligence and System SciencesConference Acronym: MISS-2021Conference Date: 1–2 November 2021Conference Location: Techno College of Engineering Agartala, Tripura(w), IndiaConference Organizer: Techno College of Engineering, Agartala, Tripura, India & Tongmyong University, Busan, South Korea