Entwicklung eines Prüfstandes zur rückführbaren Kalibrierung von Cantilevern

Zur rückführbaren Messung von Kräften im Bereich von Nanonewton werden typischerweise AFM Cantilever verwendet, deren Durchbiegung in guter Näherung proportional zur eingeleiteten Kraft ist. Die Proportionalitätskonstante zwischen den Größen wird durch die Steifigkeit des Cantilevers beschrieben. In dieser Arbeit wird die Konzeption, Entwickelung und Analyse eines Prüfstandes zur Vermessung der Steifigkeiten von Cantilevern beschrieben. Dazu wird der Cantilever an einem Halter befestigt und durch einen Piezoantrieb auf die Oberfläche eines Diamanttasters gedrückt. Die Auslenkung des Cantilevers wird durch ein Differenzinterferometer und die dafür notwendige Kraft mit einer neu entwickelten EMK-Wägezelle gemessen. Der Mechanismus der monolithischen Wägezelle ist durch die Verwendung eines einzelnen Drehgelenks sehr weich und ermöglicht dadurch eine hohe Kraftauflösung. Die Position des Wägebalkens wird durch ein weiteres Differenzinterferometer gemessen und mit einem PID-Regler zu Null geregelt. In zwei unabhängigen Verfahren wurde in guter Übereinstimmung die effektive Kraftkonstante der Wägezelle auf Bl = 25,9 mN/A bestimmt. Der Prüfstand wurde hinsichtlich seiner Eigenschaften untersucht und die Einflussgrößen auf die Messunsicherheit der Cantileversteifigkeit identifiziert. Die Kalibrierung eines weichen Cantilever ergab eine relative Messunsicherheit von 1,5 % (k = 2) bei einer Kalibrierkraft < 100 nN. Bei der anschließenden Untersuchung der Spitze waren keine Schäden festzustellen. Die Messung eines zweiten Cantilevers ergab eine gute Wiederholbarkeit der Kalibrierergebnisse. Außerdem wurden die durch diesen Prüfstand erzielten Ergebnisse mit den Resultaten eines an deren Prüfstandes verglichen und zeigten gute Übereinstimmung.Traceable measurements of forces in the range of Nanonewtons are typically done with AFM cantilevers. As a good approximation, the cantilever deflection is proportional to the applied force. This thesis describes the development of a calibration device that measures the stiffness of cantilevers by pushing them on a diamond surface. The cantilever is moved by a piezo stage while an interferometer measures its position. A novel load cell measures the force that is applied to the diamond according to the electromagnetic force compensating principle. Its single pivot design results in a soft mechanism that deflects under the load of the cantilever force. The deflection of the load cell is measured by another interferometer with a sub nanometer resolution. During the force measurement, the current through the coil is controlled by a PID controller. The effective force constant of the load cell has been measured in two independent ways with a good agreement. In several experiments, the metrological properties of the device were determined as well as the contribution factors to the uncertainty of the cantilever stiffness. A calibration of a small cantilever resulted in relative uncertainty of 1,5 % (k = 2) with a calibration force of < 100 nN. The imaging of the cantilever with a SEM microscope showed that the tip was not damaged. A second cantilever was calibrated multiple times and showed a good repeatability. The determined stiffness shows a good agreement with the results of a similar calibration device

FPGA-based signal processing of a heterodyne interferometer

A heterodyne interferometer and a data acquiring algorithm have been developed to measure the movement of a mirror in one dimension, as well as its rotation around two axis. The interferometer uses spatially separated beams to reduce periodic optical non-linearities, furthermore the optical set-up was designed for low drift, few number of optical elements and easy adjustment. The FPGA-based signal processing is based on an undersampling technique with the aim to minimise the calculation effort. The working principles of the interferometer and the electronics are described and their remaining non-linearities are investigated. Finally, the z-position, the tip and tilt angle of a planar stage are measured with the described system as an example of use

Unsicherheitsbeiträge der Krafteinleitung bei der Kalibrierung der Federkonstanten von AFM Cantilevern

Bei der Kalibrierung der Federsteifigkeit von AFM Cantilevern liefert deren Fehlausrichtung bezüglich des Kalibriersystems einen signifikanten Beitrag zur Messunsicherheit. In dieser Veröffentlichung werden diese Messunsicherheitsbeiträge auf Basis von analytischen und numerischen Modellen beschrieben sowie mit geeigneten Messungen überprüft. Das Ziel ist die Reduzierung der Messunsicherheit der Federsteifigkeit

Rationale and Design of JenaMACS—Acute Hemodynamic Impact of Ventricular Unloading Using the Impella CP Assist Device in Patients with Cardiogenic Shock

Introduction: Cardiogenic shock due to myocardial infarction or heart failure entails a reduction in end organ perfusion. Patients who cannot be stabilized with inotropes and who experience increasing circulatory failure are in need of an extracorporeal mechanical support system. Today, small, percutaneously implantable cardiac assist devices are available and might be a solution to reduce mortality and complications. A temporary, ventricular, continuous flow propeller pump using magnetic levitation (Impella ® ) has been approved for that purpose. Methods and Study Design: JenaMACS (Jena Mechanical Assist Circulatory Support) is a monocenter, proof-of-concept study to determine whether treatment with an Impella CP ® leads to improvement of hemodynamic parameters in patients with cardiogenic shock requiring extracorporeal, hemodynamic support. The primary outcomes of JenaMACS are changes in hemodynamic parameters measured by pulmonary artery catheterization and changes in echocardiographic parameters of left and right heart function before and after Impella ® implantation at different support levels after 24 h of support. Secondary outcome measures are hemodynamic and echocardiographic changes over time as well as clinical endpoints such as mortality or time to hemodynamic stabilization. Further, laboratory and clinical safety endpoints including severe bleeding, stroke, neurological outcome, peripheral ischemic complications and occurrence of sepsis will be assessed. JenaMACS addresses essential questions of extracorporeal, mechanical, cardiac support with an Impella CP ® device in patients with cardiogenic shock. Knowledge of the acute and subacute hemodynamic and echocardiographic effects may help to optimize therapy and improve the outcome in those patients. Conclusion: The JenaMACS study will address essential questions of extracorporeal, mechanical, cardiac support with an Impella CP ® assist device in patients with cardiogenic shock. Knowledge of the acute and subacute hemodynamic and echocardiographic effects may help to optimize therapy and may improve outcome in those patients. Ethics and Dissemination: The protocol was approved by the institutional review board and ethics committee of the University Hospital of Jena. Written informed consent will be obtained from all participants of the study. The results of this study will be published in a renowned international medical journal, irrespective of the outcomes of the study. Strengths and Limitations: JenaMACS is an innovative approach to characterize the effect of additional left ventricular mechanical unloading during cardiogenic shock via a minimally invasive cardiac assist system (Impella CP ® ) 24 h after onset and will provide valuable data for acute interventional strategies or future prospective trials. However, JenaMACS, due to its proof-of-concept design, is limited by its single center protocol, with a small sample size and without a comparison group

Tip- and laser-based 3D nanofabrication in extended macroscopic working areas

The field of optical lithography is subject to intense research and has gained enormous improvement. However, the effort necessary for creating structures at the size of 20 nm and below is considerable using conventional technologies. This effort and the resulting financial requirements can only be tackled by few global companies and thus a paradigm change for the semiconductor industry is conceivable: custom design and solutions for specific applications will dominate future development (Fritze in: Panning EM, Liddle JA (eds) Novel patterning technologies. International society for optics and photonics. SPIE, Bellingham, 2021. https://doi.org/10.1117/12.2593229). For this reason, new aspects arise for future lithography, which is why enormous effort has been directed to the development of alternative fabrication technologies. Yet, the technologies emerging from this process, which are promising for coping with the current resolution and accuracy challenges, are only demonstrated as a proof-of-concept on a lab scale of several square micrometers. Such scale is not adequate for the requirements of modern lithography; therefore, there is the need for new and alternative cross-scale solutions to further advance the possibilities of unconventional nanotechnologies. Similar challenges arise because of the technical progress in various other fields, realizing new and unique functionalities based on nanoscale effects, e.g., in nanophotonics, quantum computing, energy harvesting, and life sciences. Experimental platforms for basic research in the field of scale-spanning nanomeasuring and nanofabrication are necessary for these tasks, which are available at the Technische Universität Ilmenau in the form of nanopositioning and nanomeasuring (NPM) machines. With this equipment, the limits of technical structurability are explored for high-performance tip-based and laser-based processes for enabling real 3D nanofabrication with the highest precision in an adequate working range of several thousand cubic millimeters

Direct polymer microcantilever fabrication from free-standing dry film photoresists

Traditionally, polymeric microcantilevers are assembled by a multitude of process steps comprising liquid spin-coated photoresists and rigid substrate materials. Polymer microcantilevers presented in this work rely instead on commercially available dry film photoresists and allowed an omittance of multiple fabrication steps. Thin, 5 μm thick dry film photoresists are thermally laminated onto prepatterned silicon substrates that contain AFM compatible probe bodies. Partially suspended dry film resists are formed between these probe bodies, which are patterned to yield microcantilevers using conventional photolithography protocols. A limited amount of thermal cycling is required, and sacrificial probe-release layers are omitted as microcantilevers form directly through resist development. Even 1 mm long polymeric cantilevers were fabricated this way with superior in-plane alignment. The general effects of post-exposure bake (PEB) and hardbake protocols on cantilever deflection are discussed. Generally, higher PEB temperatures limit out-of-plane cantilever bending. Hardbake improved vertical alignment only of high-PEB temperature cantilevers, while surprisingly worsening the alignment of low-PEB temperature cantilevers. The mechanism behind the latter is likely explained by complex interactions between the resist and the substrate related to differences in thermal expansion, heat conduction, as well as resist cross-linking gradients. We present furthermore multilayer structures of dry film resists, specifically cylindrical dry film resist pillars on the polymer cantilever, as well as the integration of metal structures onto the polymer cantilever, which should enable in future integrated piezoresistive deflection readout for various sensing applications. Finally, cantilever spring constants were determined by measuring force–displacement curves with an advanced cantilever calibration device, allowing also the determination of both, dry film resist cantilever density and Young's modulus