Система "Умный дом"

Many reactive sputter deposition applications require high deposition rates. The primary limiting parameters in magnetron sputtering are the target power dissipation and sputtering yields of the target elements. In reactive deposition of oxides, the deposition rate is of particular interest due to the low sputtering yield of most commonly used oxides. Traditional high rate techniques rely on a feedback control of the oxygen partial pressure to prevent formation of oxide on the target and hence enable operation in the transition area. An alternative approach, based on target doping, is presented in this paper. By doping the sputtering target with heavy elements, it is possible to substantially enhance the sputtering yield and hence the deposition rate. Simulations of the partial sputtering yield values for aluminium from doped targets sputtered in reactive atmosphere have been carried out. The Monte Carlo based TRIDYN computer code has been used for simulations. The program has been used to find out optimum alloying conditions to obtain maximum partial sputtering yield for deposition of Al2O3. Our simulations indicate that the sputtering yield amplification in reactive sputtering may lead to much higher relative deposition rate increase than in a nonreactive case. The highest relative increase may be achieved in the transition region but substantial increase is predicted also in the oxide mode

Expression of Group I metabotropic glutamate receptors on phenotypically different cells within the nucleus of the solitary tract in the rat

Group I metabotropic glutamate receptors (mGluRs) are G-coupled receptors that modulate synaptic activity. Previous studies have shown that Group I mGluRs are present in the nucleus of the solitary tract (NTS), in which many visceral afferents terminate. Microinjection of selective Group I mGluR agonists into the NTS results in a depressor response and decrease in sympathetic nerve activity. There is, however, little evidence detailing which phenotypes of neurons within the NTS express Group I mGluRs. In brainstem slices, we performed immunohistochemical localization of Group I mGluRs and either glutamic acid decarboxylase 67 kDa isoform (GAD67), neuronal nitric oxide synthase (nNOS) or tyrosine hydroxylase (TH). Fluoro-Gold (FG, 2%; 15 nl) was microinjected in the caudal ventrolateral medulla (CVLM) of the rat to retrogradely label NTS neurons that project to CVLM. Group I mGluRs were distributed throughout the rostral-caudal extent of the NTS and were found within most NTS subregions. The relative percentages of Group I mGluR expressing neurons colabeled with the different markers were FG (6.9+/-0.7) nNOS (5.6+/-0.9), TH (3.9+/-1.0), and GAD67 (3.1+/-1.4). The percentage of FG containing cells colabeled with Group I mGluR (13.6+/-2.0) was greater than the percent colabeled with GAD67 (3.1+/-0.5), nNOS (4.7+/-0.5), and TH (0.1+/-0.08). Cells triple labeled for FG, nNOS, and Group I mGluRs were identified in the NTS. Thus, these data provide an anatomical substrate by which Group I mGluRs could modulate activity of CVLM projecting neurons in the NTS.16 page(s