Comparison of interfacial and electrical characteristics of HfO₂and HfAlO high-k dielectrics on compressively strained Si[sub 1−x]Ge[sub x]

Author name used in this publication: P. F. LeeAuthor name used in this publication: J. Y. Dai2005-2006 > Academic research: refereed > Publication in refereed journalVersion of RecordPublishe