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1 research outputs found
Current Status of Nanonex Nanoimprint Solutions
Author
Colby Steere
Hua Tan
+3Â more
Larry Koecher
Linshu Kong
Mingtao Li
Publication venue
Publication date
24/04/2020
Field of study
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ABSTRACT Nanoimprint lithography (NIL) has the advantage of high-throughput, sub-10 nm resolution and low cos
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