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Printing EUV Phase-shift Masks using the 0.3NA Berkeley Micro-exposure Tool
Author
Chovino Christian
Denham Paul
+9 more
Fontaine Bruno La
Gullikson Eric
Hoef Brian
Holfeld Christian
Letzkus Florian
Levinson Harry
Naulleau Patrick
Pawloski Adam R.
Wood Obert R.
Publication venue
eScholarship, University of California
Publication date
25/03/2005
Field of study
No full text
eScholarship - University of California
No full text
