Applied Plasma Research

Contains reports on three research projects.National Science Foundation (Grant GK-10472)Joint Services Electronics Programs (U. S. Army, U.S. Navy, and U. S. Air Force) under Contract DA 28-043-AMC-02536(E

Broadband diffractive lens

Significant progress has been made toward solving the century-old problem of chromatic aberrations in diffractive optics. Our approach exploits modern materials and microfabrication technology and is very different from the purely diffractive strategy,'' which is commonly employed and which results in multiple diffractive elements separated by a finite distance. We have developed a Fresnel zone plate lens comprised of a serial stack of patterned minus-filters which allows broadband radiation to be focused (or imaged) without longitudinal or transverse chromatic aberrations. 7 refs., 4 figs

Submicron Structures Fabrication and Research

Contains reports on twelve research projects.Lawrence Livermore Laboratory (Subcontract 2069209)Joint Services Electronics Program (Contract DAAG29-C-0104)U.S. Navy - Office of Naval Research (Contract N00014-79-C-0908)Joint Services Electronics Program (Contract DAAG29-80-C-0104)Harkness FoundationI.B.M.U.S. Department of Energy (Contract DE-ACO2-80-E10179)National Science Foundation (Grant ECS80-17705

Time-resolved spectral measurements above 80 A

We have made time-resolved spectral measurements above 80 A from laser-produced plasmas. These are made using a transmission grating spectrograph whose primary components are a cylindrically-curved x-ray mirror for light collection, a transmission grating for spectral dispersions, and an x-ray streak camera for temporal resolution. A description of the instrument and an example of the data are given

Solid state track detectors in the inertial confinement fusion program at LLL. [CR-39 and cellulose nitrate detectors]

Two recent conference papers on the use of cellulose nitrate and CR-39 to diagnose laser fusion targets are combined with a chronological introduction and update to efforts in this area

Virtually distortion-free imaging system for large field, high resolution lithography using electrons, ions or other particle beams

Virtually distortion free large field high resolution imaging is performed using an imaging system which contains large field distortion or field curvature. A reticle is imaged in one direction through the optical system to form an encoded mask. The encoded mask is then imaged back through the imaging system onto a wafer positioned at the reticle position. Particle beams, including electrons, ions and neutral particles, may be used as well as electromagnetic radiation