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2 research outputs found
Self-Correcting Process for High Quality Patterning by Atomic Layer Deposition
Author
Cabritaajavaara J. F.
Chaiya Prasittichai
+3Â more
Fatemeh Sadat Minaye Hashemi
Ritala M.
Stacey F. Bent
Publication venue
'American Chemical Society (ACS)'
Publication date
Field of study
No full text
Crossref
A New Resist for Area Selective Atomic and Molecular Layer Deposition on Metal–Dielectric Patterns
Author
Boubour E.
Cabritaajavaara J. F.
+41Â more
Cai X.
Chaiya Prasittichai
Chen R.
Chen R.
Chen R.
Chen R.
DiBenedetto S. A.
Elina F.
Fatemeh Sadat Minaye Hashemi
Fonder G.
Färm E.
Färm E.
Gay G.
George S. M.
Hanson E. L.
Hong J.
Janek R. P.
Jennings G. K.
Jiang X.
Kaur I.
Loscutoff P. W.
Ma H.
Mikko R.
Nie H. Y.
Nie H. Y.
Nie H. Y.
Prasittichai C.
Ritala M.
Sankur H. O.
Sinha A.
Sinha A.
Stacey F. Bent
Swalen J. D.
Tao Q.
Tao Q.
Thissen P.
Ulman A.
Zhou H.
Zhou H.
Zhou H.
Özgür Ü.
Publication venue
'American Chemical Society (ACS)'
Publication date
Field of study
No full text
Crossref