Engineering the composition, morphology, and optical properties of InAsSb nanostructures via graded growth technique

Graded growth technique is utilized to realize the control over the composition, morphology, and optical properties of self-assembled InAsSb/InGaAs/InP nanostructures. By increasing the initial mole fraction of the Sb precursor during the graded growth of InAsSb, more Sb atoms can be incorporated into the InAsSb nanostructures despite the same Sb mole fraction averaged over the graded growth. This leads to a shape change from dots to dashes/wires for the InAsSb nanostructures. As a result of the composition and morphology change, photoluminescence from the InAsSb nanostructures shows different polarization and temperature characteristics. This work demonstrates a technologically important technique—graded growth, to control the growth and the resultant physical properties of self-assembled semiconductor nanostructures.Financial support from Australian Research Council is gratefully acknowledged

Multiple wavelength InGaAs quantum dot lasers using selective area epitaxy

The authors demonstrate multiple wavelength lasers fabricated from InGaAsquantum dots. Selective area epitaxy is used to grow the active region, consisting of five layer stack of InGaAsquantum dots with different band gapenergies in selected regions of the substrate, for fabrication of the lasers. The mechanism responsible for engineering of the band gap of quantum dots is discussed. The performance of the selectively grown lasers is compared to the lasers fabricated from structures grown in a standard, nonselective area growth process.The Australian Research Council is gratefully acknowledged for financial support

Review of zincblende ZnO: Stability of metastable ZnO phases

Common II-VI compound semiconducting materials are stable thermodynamically with zincblende phase, while the II-O materials such as zinc oxide (ZnO) and beryllium oxide (BeO) are stable with wurtzite phase, and cadmium oxide (CdO) and magnesium oxide (MgO) are stable in rocksalt phase. This phase disharmony in the same material family laid a challenge for the basic physics and in practical applications in optoelectronic devices, where ternary and quaternary compounds are employed. Thermodynamically the zincblende ZnO is a metastable phase which is free from the giant internal electric fields in the [001] directions and has an easy cleavage facet in the ⟨110⟩ directions for laser cavity fabrication that combined with evidence for the higher optical gain. The zincblende materials also have lower ionicity that leads to the lower carrier scattering and higher doping efficiencies. Even with these outstanding features in the zincblende materials, the growth of zincblende ZnO and its fundamental properties are still limited. In this paper, recent progress in growth and fundamental properties of zincblende ZnOmaterial has been reviewed.This research is supported in part by the Australian Research Council, Australia, Institute of Physical and Chemical Research RIKEN, and the Ministry of Education, Science, Sports and Culture, Japan

Electrical isolation of GaN by MeV ion irradiation

The evolution of sheet resistance of n-type GaN epilayers exposed to irradiation with MeV H, Li, C, and O ions is studied in situ. Results show that the threshold dose necessary for complete isolation linearly depends on the original free electron concentration and reciprocally depends on the number of atomic displacements produced by ion irradiation. Furthermore, such isolation is stable to rapid thermal annealing at temperatures up to 900 °C. In addition to providing a better understanding of the physical mechanisms responsible for electrical isolation, these results can be used for choosing implant conditions necessary for an effective electrical isolation of GaN-based devices.This work was partly supported by Conselho Nacional de Pesquisas (CNPq, Brazil) under Contract No. 200541/ 99-4

Spatially resolved characterization of InGaAs/GaAs quantum dot structures by scanning spreading resistance microscopy

Cross-sectional scanning spreading resistance microscopy (SSRM) is used to investigate stacked InGaAs/GaAs quantum dot(QD)structures with different doping schemes. Spatially resolved imaging of the QDs by SSRM is demonstrated. The SSRM contrast obtained for the QD layers is found to depend on doping in the structure. In the undoped structures both QD-layers and QDs within the layers could be resolved, while in the dopedstructures the QD layers appear more or less uniformly broadened. The origin of the SSRM contrast in the QD layer in the different samples is discussed and correlated with doping schemes.T. Hakkarainen, O. Douhéret, and S. Anand would like to acknowledge the Swedish Research Council VR for fi- nancial support and the Kurt-Alice Wallenberg KAW foundation for financing the microscope. L. Fu, H. H. Tan, and C. Jagadish would like to acknowledge the Australian Research Council ARC for financial support and Australian National Fabrication Facility ANFF for access to the facilities

Influence of cap layer on implantation induced interdiffusion in InP/InGaAs quantum wells

We have investigated the effect of implantation at room temperature and 200 °C into lattice matched InP/InGaAs quantum wellstructures capped with InP and InGaAs layers. P− ions of 20 keV were implanted into the cap layer at doses of 1×10¹²−1×10¹⁴ cm⁻². The dose dependent evolution of shifts in photoluminescence energy for the InP capped sample was found to be affected by the implant temperature. Rutherford back scattering measurements show that the nature of the damage induced at different implant temperatures is responsible for this behavior. It was found that the InGaAs capped sample was less sensitive to the implant temperature than the InP capped sample

Electron and trap dynamics in As-ion-implanted and annealed GaAs

The ultrafast dynamics of As-ion-implanted and annealed GaAs is investigated using transmission pump–probe measurements.Carrier recombination time was found to increase from 4 to 40 ps with increasing annealing temperature. At lower annealing temperatures, the transmitted optical signal is dominated by induced absorption and at higher annealing temperatures this effect is replaced by induced transparency.This work was supported in part by the EC INCOCOPERNICUS project ‘‘DUO—devices for ultrafast optoelectronics’’ and the Lithuanian Science and Study Foundation

The influence of atmosphere on the performance of pure-phase WZ and ZB InAs nanowire transistors

We compare the characteristics of phase-pure MOCVD grown ZB and WZ InAs nanowire transistors in several atmospheres: air, dry pure N$_2$ and O$_2$, and N$_2$ bubbled through liquid H$_2$O and alcohols to identify whether phase-related structural/surface differences affect their response. Both WZ and ZB give poor gate characteristics in dry state. Adsorption of polar species reduces off-current by 2-3 orders of magnitude, increases on-off ratio and significantly reduces sub-threshold slope. The key difference is the greater sensitivity of WZ to low adsorbate level. We attribute this to facet structure and its influence on the separation between conduction electrons and surface adsorption sites. We highlight the important role adsorbed species play in nanowire device characterisation. WZ is commonly thought superior to ZB in InAs nanowire transistors. We show this is an artefact of the moderate humidity found in ambient laboratory conditions: WZ and ZB perform equally poorly in the dry gas limit yet equally well in the wet gas limit. We also highlight the vital role density-lowering disorder has in improving gate characteristics, be it stacking faults in mixed-phase WZ or surface adsorbates in pure-phase nanowires.Comment: Accepted for publication in Nanotechnolog

Carrier dynamics in ion-implanted GaAs studied by simulation and observation of terahertz emission

We have studied terahertz (THz) emission from arsenic-ion implanted GaAs both experimentally and using a three-dimensional carrier dynamics simulation. A uniform density of vacancies was formed over the optical absorption depth of bulk GaAs samples by performing multi-energy implantations of arsenic ions (1 and 2.4MeV) and subsequent thermal annealing. In a series of THz emission experiments the frequency of peak THz power was found to increase significantly from 1.4 to 2.2THz when the ion implantation dose was increased from 10^13 to 10^16 cm-3. We used a semi-classical Monte-Carlo simulation of ultra-fast carrier dynamics to reproduce and explain these results. The effect of the ion-induced damage was included in the simulation by considering carrier scattering at neutral and charged impurities, as well as carrier trapping at defect sites. Higher vacancy concentrations and shorter carrier trapping times both contributed to shorter simulated THz pulses, the latter being more important over experimentally realistic parameter ranges.Comment: 6 pages, 7 figure

Acceptor-like deep level defects in ion-implanted ZnO

N-type ZnO samples have been implanted with MeV Zn⁺ ions at room temperature to doses between 1×10⁸ and 2×10¹⁰cm⁻², and the defect evolution has been studied by capacitance-voltage and deep level transient spectroscopy measurements. The results show a dose dependent compensation by acceptor-like defects along the implantation depth profile, and at least four ion-induced deep-level defects arise, where two levels with energy positions of 1.06 and 1.2 eV below the conduction band increase linearly with ion dose and are attributed to intrinsic defects. Moreover, a re-distribution of defects as a function of depth is observed already at temperatures below 400 K.This work was supported by the Norwegian Research Council through the Frienergi program and the Australian Research Council through the Discovery projects program