Multilayer reflective coatings for extreme-ultraviolet lithography

Multilayer mirror coatings which reflect extreme ultraviolet (EUV) radiation are a key enabling technology for EUV lithography. Mo/Si multilayers with reflectances of 67.5% at 13.4 nm are now routinely achieved and reflectances of 70 2% at 11.4 nm were obtained with MO/Be multilayers. High reflectance is achieved with careful control of substrate quality, layer thicknesses, multilayer materials, interface quality, and surface termination. Reflectance and film stress were found to be stable relative to the requirements for application to EUV lithography. The run-to-run reproducibility of the reflectance peak position was characterized to be better than 0.2%, providing the required wavelength matching among the seven multilayer-coated mirrors used in the present lithography system design. Uniformity of coating was improved to better than 0.5% across 150 mm diameter substrates. These improvements in EUV multilayer mirror technology will enable us to meet the stringent specifications for coating the large optical substrates for our next-generation EUV lithography system

Preliminary investigation of an additive approach to the fabrication of precision aspheres

We report progress in the aspherization of precision optical substrates via deposition of graded period Mo/Si multilayer coatings using a masking technique. These preliminary results show good agreement between the measured and desired thickness profiles over 85% of the sample, however, thickness deviations of up to 7 % are observed in the central area. The errors are attributed to misalignments of the mask relative to the substrate during deposition

Venous gas embolism as a predictive tool for improving CNS decompression safety

A key process in the pathophysiological steps leading to decompression sickness (DCS) is the formation of inert gas bubbles. The adverse effects of decompression are still not fully understood, but it seems reasonable to suggest that the formation of venous gas emboli (VGE) and their effects on the endothelium may be the central mechanism leading to central nervous system (CNS) damage. Hence, VGE might also have impact on the long-term health effects of diving. In the present review, we highlight the findings from our laboratory related to the hypothesis that VGE formation is the main mechanism behind serious decompression injuries. In recent studies, we have determined the impact of VGE on endothelial function in both laboratory animals and in humans. We observed that the damage to the endothelium due to VGE was dose dependent, and that the amount of VGE can be affected both by aerobic exercise and exogenous nitric oxide (NO) intervention prior to a dive. We observed that NO reduced VGE during decompression, and pharmacological blocking of NO production increased VGE formation following a dive. The importance of micro-nuclei for the formation of VGE and how it can be possible to manipulate the formation of VGE are discussed together with the effects of VGE on the organism. In the last part of the review we introduce our thoughts for the future, and how the enigma of DCS should be approached

Multilayer coatings of 10x projection for extreme-ultraviolet lithography

Two new sets of projections optics for the prototype 10X reduction EUV lithography system were coated with Mo/Si multilayers. The coating thickness was graded across the optics by using shadow masks to ensure maximum throughput at all incidence angles in the camera. The overall deviation of the (normalized) wavelength response across the clear aperture of each mirror is below 0.01% RMS. However, the wavelength mismatch between two optics coated in different runs is up to 0.07 nm. Nevertheless, this is still within the allowed tolerances, and the predicted optical throughput loss in the camera due to such wavelength mismatch is about 4%. EUV reflectances of 63-65% were measured around 13.40 nm for the secondary optics, which is in good agreement with the expected reflectance based on the substrate finish as measured with AFM

Multilayer coating and tests of a 10x extreme-ultraviolet lithographic camera

A new set of mirrors for the SANDIA I OX microstepper has been fabricated. The optics have been tested by optical profilometry, atomic force microscopy, EUV reflectometry and EUV scattering. These measurements allow one to predict the performance of the camera. Mo/Si multilayer coatings with the required thickness profile were produced by DC magnetron sputtering using shadow masks in front of the rotating substrates. The failure errors of the new mirrors (0.6 nm) are considerably smaller than those obtained previously, while mid-spatial frequency roughness still needs improvement. This roughness reduces mostly the throughput of the system; i. e. most of the scattered light occurs outside the field of the camera and there is only a small reduction of contrast or resolution

Multilayer coating and tests of a 10x extreme ultraviolet lithographc camera

A new set of mirrors for the SANDIA I OX microstepper has been fabricated. The optics have been tested by optical profilometry, atomic force microscopy, EUV reflectometry and EUV scattering. These measurements allow one to predict the performance of the camera. Mo/Si multilayer coatings with the required thickness profile were produced by DC magnetron sputtering using shadow masks in front of the rotating substrates. The failure errors of the new mirrors (0.6 nm) are considerably smaller than those obtained previously, while mid-spatial frequency roughness still needs improvement. This roughness reduces mostly the throughput of the system; i. e. most of the scattered light occurs outside the field of the camera and there is only a small reduction of contrast or resolution

<title>Multilayer coated optics for an alpha-class extreme ultraviolet lithography system</title>

We present the results of coating the first set of optical elements for an alpha-class extreme-ultraviolet (EUV) lithography system, the Engineering Test Stand (ETS). The optics were coated with Mo/Si multilayer mirrors using an upgraded DC-magnetron sputtering system. Characterization of the near-normal incidence EUV reflectance was performed using synchrotron radiation from the Advanced Light Source at the Lawrence Berkeley National Laboratory. Stringent requirements were met for these multilayer coatings in terms of reflectance, wavelength matching among the different optics, and thickness control across the diameter of each individual optic. Reflectances above 65% were achieved at 13.35 nm at near-normal angles of incidence. The run-to-run reproducibility of the reflectance peak wavelength was maintained to within 0.4%, providing the required wavelength matching among the seven multilayer-coated optics. The thickness uniformity (or gradient) was controlled to within {+-}0.25% peak-to-valley (P-V) for the condenser optics and {+-}0.1% P-V for the four projection optics, exceeding the prescribed specification for the optics of the ETS

Multilayer coated optics for an alpha-class extreme ultraviolet lithography system

We present the results of coating the first set of optical elements for an alpha-class extreme-ultraviolet (EUV) lithography system, the Engineering Test Stand (ETS). The optics were coated with Mo/Si multilayer mirrors using an upgraded DC-magnetron sputtering system. Characterization of the near-normal incidence EUV reflectance was performed using synchrotron radiation from the Advanced Light Source at the Lawrence Berkeley National Laboratory. Stringent requirements were met for these multilayer coatings in terms of reflectance, wavelength matching among the different optics, and thickness control across the diameter of each individual optic. Reflectances above 65% were achieved at 13.35 nm at near-normal angles of incidence. The run-to-run reproducibility of the reflectance peak wavelength was maintained to within 0.4%, providing the required wavelength matching among the seven multilayer-coated optics. The thickness uniformity (or gradient) was controlled to within {+-}0.25% peak-to-valley (P-V) for the condenser optics and {+-}0.1% P-V for the four projection optics, exceeding the prescribed specification for the optics of the ETS

<title>Experimental investigation of beryllium-based multilayer coatings for extreme ultraviolet lithography</title>

The performance of beryllium-based multilayer coatings designed to reflect light of wavelengths near 11 nm, at normal incidence, is presented. These multilayer coatings are of special interest for extreme ultraviolet lithography (EUVL). The beryllium-based multilayers investigated were Mo/Be, Ru/Be and a new material combination Mo,CiBe. The highest reflectivity achieved so far is 70% at 11.3 mn with 70 bilayers of Mo/Be. However, even though high reflectivity is very important, there are other parameters to satisfy the requirements for an EUVL production tool. Multilayer stress, thermal stability, radiation stability and long term reflectance stability are of equal or greater importance. An experimental characterization of several coatings was carried out to determine the reflectivity, stress, microstructure, and long term stability of these coatings. Theoretically calculated reflectivities are compared with experimental results for different material pairs; differences between experimental and theoretical reflectivities and bandwidths are addressed. Keywords: Extreme ultraviolet (EUV) lithography, reflective coatings, multilayer deposition, beryllium