High resolution shadow mask patterning in deep holes and its application to an electrical wafer feed-through

The paper presents a technique to pattern materials in deep holes and/or on non-planar substrate surfaces. A rather old technique, namely, electron-beam evaporation of metals through a shadow mask, is used. The realization of high-resolution shadow masks using micromachining techniques is described. Further, a low ohmic electrical wafer foed-through with a small parasitic capacitance to the substrate and a high placing density is presented

Evolution of a coherent array of Bose-Einstein Condensates in a magnetic trap

We investigate the evolution process of the interference pattern for a coherent array of Bose-Einstein condensates in a magnetic trap after the optical lattices are switched off. It is shown that there is a decay and revival of the density oscillation for the condensates confined in the magnetic trap. We find that, due to the confinement of the magnetic trap, the interference effect is much stronger than that of the experiment induced by Pedri et al. (Phys. Rev. Lett, {\bf 87}, 220401), where the magnetic trap is switched off too. The interaction correction to the interference effect is also discussed for the density distribution of the central peak.Comment: RevTex, 17 pages,9 figures. E-mail: [email protected]

Reduced basis method for computational lithography

A bottleneck for computational lithography and optical metrology are long computational times for near field simulations. For design, optimization, and inverse scatterometry usually the same basic layout has to be simulated multiple times for different values of geometrical parameters. The reduced basis method allows to split up the solution process of a parameterized model into an expensive offline and a cheap online part. After constructing the reduced basis offline, the reduced model can be solved online very fast in the order of seconds or below. Error estimators assure the reliability of the reduced basis solution and are used for self adaptive construction of the reduced system. We explain the idea of reduced basis and use the finite element solver JCMsuite constructing the reduced basis system. We present a 3D optimization application from optical proximity correction (OPC).Comment: BACUS Photomask Technology 200

Numerical analysis of nanostructures for enhanced light extraction from OLEDs

Nanostructures, like periodic arrays of scatters or low-index gratings, are used to improve the light outcoupling from organic light-emitting diodes (OLED). In order to optimize geometrical and material properties of such structures, simulations of the outcoupling process are very helpful. The finite element method is best suited for an accurate discretization of the geometry and the singular-like field profile within the structured layer and the emitting layer. However, a finite element simulation of the overall OLED stack is often beyond available computer resources. The main focus of this paper is the simulation of a single dipole source embedded into a twofold infinitely periodic OLED structure. To overcome the numerical burden we apply the Floquet transform, so that the computational domain reduces to the unit cell. The relevant outcoupling data are then gained by inverse Flouqet transforming. This step requires a careful numerical treatment as reported in this paper

A Rigorous Finite-Element Domain Decomposition Method for Electromagnetic Near Field Simulations

Rigorous computer simulations of propagating electromagnetic fields have become an important tool for optical metrology and design of nanostructured optical components. A vectorial finite element method (FEM) is a good choice for an accurate modeling of complicated geometrical features. However, from a numerical point of view solving the arising system of linear equations is very demanding even for medium sized 3D domains. In numerics, a domain decomposition method is a commonly used strategy to overcome this problem. Within this approach the overall computational domain is split up into smaller domains and interface conditions are used to assure continuity of the electromagnetic field. Unfortunately, standard implementations of the domain decomposition method as developed for electrostatic problems are not appropriate for wave propagation problems. In an earlier paper we therefore proposed a domain decomposition method adapted to electromagnetic field wave propagation problems. In this paper we apply this method to 3D mask simulation.Comment: 9 pages, 7 figures, SPIE conference Advanced Lithography / Optical Microlithography XXI (2008

Rigorous Simulations of 3D Patterns on Extreme Ultraviolet Lithography Masks

Simulations of light scattering off an extreme ultraviolet lithography mask with a 2D-periodic absorber pattern are presented. In a detailed convergence study it is shown that accurate results can be attained for relatively large 3D computational domains and in the presence of sidewall-angles and corner-roundings.Comment: SPIE Europe Optical Metrology, Conference Proceeding