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    Autofocus in the systems of automatic mask and wafer pattern inspection

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    Для ΠΏΠΎΠ²Ρ‹ΡˆΠ΅Π½ΠΈΡ точности Π°Π²Ρ‚ΠΎΠΌΠ°Ρ‚ΠΈΠ·ΠΈΡ€ΠΎΠ²Π°Π½Π½ΠΎΠ³ΠΎ контроля Π΄Π΅Ρ„Π΅ΠΊΡ‚ΠΎΠ² топологичСского рисунка Ρ„ΠΎΡ‚ΠΎΡˆΠ°Π±Π»ΠΎΠ½ΠΎΠ² ΠΈ ΠΏΠΎΠ»ΡƒΠΏΡ€ΠΎΠ²ΠΎΠ΄Π½ΠΈΠΊΠΎΠ²Ρ‹Ρ… пластин ΠΏΡ€Π΅Π΄Π»ΠΎΠΆΠ΅Π½Π° систСма автофокусировки, ΠΎΠ±Π΅ΡΠΏΠ΅Ρ‡ΠΈΠ²Π°ΡŽΡ‰Π°Ρ ΡƒΠ΄Π΅Ρ€ΠΆΠ°Π½ΠΈΠ΅ повСрхности ΠΎΠ±ΡŠΠ΅ΠΊΡ‚Π° Π² Π·ΠΎΠ½Π΅ рСзкости ΠΎΠ±ΡŠΠ΅ΠΊΡ‚ΠΈΠ²Π° ΠΏΡ€ΠΈ ΠΏΠΎΡΠ»Π΅Π΄ΠΎΠ²Π°Ρ‚Π΅Π»ΡŒΠ½ΠΎΠΌ сканировании Ρ‚ΠΎΠΏΠΎΠ»ΠΎΠ³ΠΈΠΈ.In order to increase accuracy of automatic mask and wafer pattern inspection an autofocus system is offered which ensures keeping the plane in objective focus zone during the sequential scanning of the pattern
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