23 research outputs found
Π Π΅Π°ΠΊΡΠΈΡ ΡΠΎΡΠΎΡΠΎΠΆΠ΄Π΅Π½ΠΈΡ ΠΌΠ΅Π·ΠΎΠ½ΠΎΠ² Π½Π° Π½ΡΠΊΠ»ΠΎΠ½Π°Ρ ΠΈ ΡΠ΄ΡΠ°Ρ Π² ΡΠ΅Π·ΠΎΠ½Π°Π½ΡΠ½ΠΎΠΉ ΠΎΠ±Π»Π°ΡΡΠΈ ΡΠ½Π΅ΡΠ³ΠΈΠΉ
ΠΡΡΠ»Π΅Π΄ΠΎΠ²Π°Π½ΠΈΡ ΡΠ΅Π°ΠΊΡΠΈΠΈ ΡΠΎΡΠΎΡΠΎΠΆΠ΄Π΅Π½ΠΈΡ ΠΌΠ΅Π·ΠΎΠ½ΠΎΠ² Π½Π° Π½ΡΠΊΠ»ΠΎΠ½Π°Ρ
Π½Π΅ΠΎΠ±Ρ
ΠΎΠ΄ΠΈΠΌΡ Π΄Π»Ρ ΠΏΠΎΠ»ΡΡΠ΅Π½ΠΈΡ ΡΠΏΠ΅ΠΊΡΡΠ° Π²ΠΎΠ·Π±ΡΠΆΠ΄Π΅Π½Π½ΡΡ
Π±Π°ΡΠΈΠΎΠ½Π½ΡΡ
ΡΠ΅Π·ΠΎΠ½Π°Π½ΡΠΎΠ². Π Π΄Π°Π½Π½ΠΎΠΉ ΡΠ°Π±ΠΎΡΠ΅ ΠΈΡΡΠ»Π΅Π΄ΡΠ΅ΡΡΡ ΠΊΠΈΠ½Π΅ΠΌΠ°ΡΠΈΠΊΠ° ΡΠ΅Π°ΠΊΡΠΈΠΈ ΡΠΎΡΠΎΡΠΎΠΆΠ΄Π΅Π½ΠΈΡ Π½Π° ΠΏΡΠΎΡΠΎΠ½Π΅ ΠΊΠ°ΠΎΠ½Π° ΠΈ Π²ΡΡΠΈΡΠ»Π΅Π½Ρ ΡΠ΅ΡΠ΅Π½ΠΈΡ Π² ΡΠ°ΠΌΠΊΠ°Ρ
ΠΈΠ·ΠΎΠ±Π°ΡΠ½ΠΎΠΉ ΠΌΠΎΠ΄Π΅Π»ΠΈ ΡΡΠΎΠΉ ΡΠ΅Π°ΠΊΡΠΈΠΈ Π² ΠΎΠ±Π»Π°ΡΡΠΈ ΡΠ½Π΅ΡΠ³ΠΈΠΈ Π²ΠΎΠ·Π±ΡΠΆΠ΄Π΅Π½ΠΈΡ ΡΠ΅Π·ΠΎΠ½Π°Π½ΡΠ° N(1900)3/2+ Ρ ΠΏΠΎΠΌΠΎΡΡΡ ΡΠΎΡΠΌΡΠ»Ρ ΠΡΠ΅ΠΉΡΠ°-ΠΠΈΠ³Π½Π΅ΡΠ° Π΄Π»Ρ ΠΈΠ·ΠΎΠ»ΠΈΡΠΎΠ²Π°Π½Π½ΠΎΠ³ΠΎ ΡΠ΅Π·ΠΎΠ½Π°Π½ΡΠ° ΠΈ ΠΌΡΠ»ΡΡΠΈΠΏΠΎΠ»ΡΠ½ΠΎΠ³ΠΎ Π°Π½Π°Π»ΠΈΠ·Π°. ΠΠΎΠ»ΡΡΠ΅Π½Π½ΡΠ΅ ΠΎΡΠ΅Π½ΠΊΠΈ ΡΠ΅ΡΠ΅Π½ΠΈΡ ΡΠΎΠ³Π»Π°ΡΡΡΡΡΡ Ρ ΠΈΠΌΠ΅ΡΡΠΈΠΌΠΈΡΡ ΡΠΊΡΠΏΠ΅ΡΠΈΠΌΠ΅Π½ΡΠ°Π»ΡΠ½ΡΠΌΠΈ Π΄Π°Π½Π½ΡΠΌΠΈ.Investigations of the photoproduction of mesons on nucleons are necessary for obtaining the spectrum of excited baryon resonances. In this paper, we study the kinematics of the photoproduction reaction on the proton of the kaon and calculate the cross sections in the framework of the isobar model of this reaction in the region of the excitation energy of resonance N (1900) 3/2 * using the Breit-Wigner formula for isolated resonance and multipole analysis. The obtained estimates of the cross section agree with the available experimental data
Electrical Properties of Unintentionally Doped Semi-Insulating and Conducting 6H-SiC
Temperature dependent Hall effect (TDH), low temperature photoluminescence (LTPL), secondary ion mass spectrometry (SIMS), optical admittance spectroscopy (OAS), and thermally stimulated current (TSC) measurements have been made on 6H-SiC grown by the physical vapor transport technique without intentional doping. n- and p-type as well semi-insulating samples were studied to explore the compensation mechanism in semi-insulating high purity SiC. Nitrogen and boron were found from TDH and SIMS measurements to be the dominant impurities that must be compensated to produce semi-insulating properties. The electrical activation energy of the semi-insulating sample determined from the dependence of the resistivity was 1.0 eV. LTPL lines near 1.00 and 1.34 eV, identified with the defects designated as UD-1 and UD-3, were observed in all three samples but the intensity of the UD-1 line was almost a factor of 10 more in the n-type sample than in the the p-type sample with that in the semi-insulating sample being intermediate between those two. OAS and TSC experiments confirmed the high purity of this material. The results suggest that the relative concentrations of a dominant deep level and nitrogen and boron impurities can explain the electrical properties in this material
Electrical Properties of Unintentionally Doped Semi-Insulating and Conducting 6H-SiC
Temperature dependent Hall effect (TDH), low temperature photoluminescence (LTPL), secondary ion mass spectrometry (SIMS), optical admittance spectroscopy (OAS), and thermally stimulated current (TSC) measurements have been made on 6H-SiC grown by the physical vapor transport technique without intentional doping. n- and p-type as well semi-insulating samples were studied to explore the compensation mechanism in semi-insulating high purity SiC. Nitrogen and boron were found from TDH and SIMS measurements to be the dominant impurities that must be compensated to produce semi-insulating properties. The electrical activation energy of the semi-insulating sample determined from the dependence of the resistivity was 1.0 eV. LTPL lines near 1.00 and 1.34 eV, identified with the defects designated as UD-1 and UD-3, were observed in all three samples but the intensity of the UD-1 line was almost a factor of 10 more in the n-type sample than in the the p-type sample with that in the semi-insulating sample being intermediate between those two. OAS and TSC experiments confirmed the high purity of this material. The results suggest that the relative concentrations of a dominant deep level and nitrogen and boron impurities can explain the electrical properties in this material