19,656 research outputs found
Reduced basis method for computational lithography
A bottleneck for computational lithography and optical metrology are long
computational times for near field simulations. For design, optimization, and
inverse scatterometry usually the same basic layout has to be simulated
multiple times for different values of geometrical parameters. The reduced
basis method allows to split up the solution process of a parameterized model
into an expensive offline and a cheap online part. After constructing the
reduced basis offline, the reduced model can be solved online very fast in the
order of seconds or below. Error estimators assure the reliability of the
reduced basis solution and are used for self adaptive construction of the
reduced system. We explain the idea of reduced basis and use the finite element
solver JCMsuite constructing the reduced basis system. We present a 3D
optimization application from optical proximity correction (OPC).Comment: BACUS Photomask Technology 200
Should We Drill in the Arctic National Wildlife Refuge? An Economic Perspective
This paper provides model-based estimates of the value of oil in Alaska's Arctic National Wildlife Refuge (ANWR). The best estimate of economically recoverable oil in the federal portion of ANWR is 7.06 billion barrels of oil, a quantity roughly equal to US consumption in 2005. The oil is worth 2005), but would cost 251 billion, would generate social benefits through industry rents of 37 billion and 582 to 1,141.
Image denoising with multi-layer perceptrons, part 1: comparison with existing algorithms and with bounds
Image denoising can be described as the problem of mapping from a noisy image
to a noise-free image. The best currently available denoising methods
approximate this mapping with cleverly engineered algorithms. In this work we
attempt to learn this mapping directly with plain multi layer perceptrons (MLP)
applied to image patches. We will show that by training on large image
databases we are able to outperform the current state-of-the-art image
denoising methods. In addition, our method achieves results that are superior
to one type of theoretical bound and goes a large way toward closing the gap
with a second type of theoretical bound. Our approach is easily adapted to less
extensively studied types of noise, such as mixed Poisson-Gaussian noise, JPEG
artifacts, salt-and-pepper noise and noise resembling stripes, for which we
achieve excellent results as well. We will show that combining a block-matching
procedure with MLPs can further improve the results on certain images. In a
second paper, we detail the training trade-offs and the inner mechanisms of our
MLPs
Rigorous Simulations of 3D Patterns on Extreme Ultraviolet Lithography Masks
Simulations of light scattering off an extreme ultraviolet lithography mask
with a 2D-periodic absorber pattern are presented. In a detailed convergence
study it is shown that accurate results can be attained for relatively large 3D
computational domains and in the presence of sidewall-angles and
corner-roundings.Comment: SPIE Europe Optical Metrology, Conference Proceeding
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