Characterization of the blue emission of Tm/Er co-implanted GaN

Comparative studies have been carried out on the cathodoluminescence (CL) and photoluminescence (PL) properties of GaN implanted with Tin and GaN co-implanted with Tin and a low concentration of Er. Room temperature CL spectra were acquired in an electron probe microanalyser to investigate the rare earth emission. The room temperature CL intensity exhibits a strong dependence on the annealing temperature of the implanted samples. The results of CL temperature dependence are reported for blue emission (similar to 477 nm) which is due to intra 4f-shell electron transitions ((1)G(4)-> H-3(6)) associated with Tm3+ ions. The 477 nm blue CL emission is enhanced strongly as the annealing temperature increases up to 1200 degrees C. Blue PL emission has also been observed from the sample annealed at 1200 degrees C. To our knowledge, this is the first observation of blue PL emission from Tin implanted GaN samples. Intra-4f transitions from the D-1(2) level (similar to 465 nm emission lines) of Tm3+ ions in GaN have been observed in GaN:Tm films at temperatures between 20-200 K. We will discuss the temperature dependent Tm3+ emission in both GaN:Tm,Er and GaN:Tm samples

Strain Relief Analysis of InN Quantum Dots Grown on GaN

We present a study by transmission electron microscopy (TEM) of the strain state of individual InN quantum dots (QDs) grown on GaN substrates. Moiré fringe and high resolution TEM analyses showed that the QDs are almost fully relaxed due to the generation of a 60° misfit dislocation network at the InN/GaN interface. By applying the Geometric Phase Algorithm to plan-view high-resolution micrographs, we show that this network consists of three essentially non-interacting sets of misfit dislocations lying along the directions. Close to the edge of the QD, the dislocations curve to meet the surface and form a network of threading dislocations surrounding the system

Structural changes during the natural aging process of InN quantum dots

The natural aging process of InN nanostructures by the formation of indium oxides is examined by transmission electron microscopy related techniques. Uncapped and GaN-capped InN quantum dots (QDs) on GaN/sapphire substrates were grown under the same conditions and kept at room temperature/pressure conditions. The GaN capping layer is found to preserve the InN QDs in the wurtzite phase, avoiding the formation of group-III oxides, while in the uncapped sample, a thin layer of cubic phases are formed that envelops the nucleus of wurtzite InN. These cubic phases are shown to be mainly bcc- In 2 O3 for long aged samples where the nitrogen atoms in the InN surface layers have been substituted by atmospheric oxygen. This process implies the gradual transformation of the In sublattice from hcp to a quasi-fcc structure. Metastable zinc-blende InN phases rich in oxygen atoms are proposed to act as intermediate phases and they are evinced in samples less aged. The large concurrence of interplanar spaces, the twin formation, and the existence of a free surface that facilitates the transformation support this mechanism and would explain the high instability of the InN nanostructures at ambient conditions.Comisión Interministerial de Ciencia y Tecnología (CICYT) MAT2007-60643Junta de Andalucía TEP383 EspañaUnión Europea NMP4-CT-2004- 50010

Le semiconducteur II-VI ZnSe: epitaxie par MOCVD et etude de la compensation

SIGLEINIST T 75828 / INIST-CNRS - Institut de l'Information Scientifique et TechniqueFRFranc

Epitaxie par jets moléculaires de nitrure de gallium sopé terres rares (caractérisation structurale et optique)

MONTPELLIER-BU Sciences (341722106) / SudocSudocFranceF

Optical and structural properties of Tm3+, Eu3+ and Er3+ doped GaN thin films grown by MBE technology

Les propriétés optiques des couches épitaxiées de GaN dopées aux terres rares ont attiré l'attention pour des applications optoélectroniques tels que la signalisation, [la] lumière blanche et [les] communications optiques. Nous avons étudié les propriétés optiques et structurales des couches minces de GaN dopées aux terres rares (Er3+, Eu3+, Tm3+), réalisées par GSMBE (Gas Source Molecular Beam Epitaxy). La totalité du spectre de la lumière visible a été observé, du GaN:Eu (Rouge : 622 nm) au GaN:Tm (Bleu : 477 nm), en passant par le GaN:Er (Vert : 537 nm, 558 nm). La diffraction de rayons X a été utilisée pour étudier la qualité cristalline des couches. La microscopie électronique en transmission (TEM) a été utilisée pour étudier les défauts dus à l'incorporation d'ions de terres rares dans la matrice de GaN. Des mesures AFM ont aussi été utilisées pour étudier les effets de la température de croissance et de la concentration de terres rares sur la morphologie de la surface des couches dopées. Les études structurales sur les couches de GaN dopées aux terres rares ont montré que les défauts participent au mécanisme de transfert d'énergie de la matrice vers les ions de terres rares, ce qui accroît l'émission de lumière relative aux transitions intra-4f des terres rares, observées par photoluminescence.MONTPELLIER-BU Sciences (341722106) / SudocSudocFranceF

Croissance d'InN par MOCVD (caractérisations réalisations de films minces et de boîtes quantiques)

MONTPELLIER-BU Sciences (341722106) / SudocSudocFranceF

Internal structure and oscillator strengths of excitons in strained alpha-GaN

International audienceWe calculate the excitonic exchange interaction in alpha-GaN, and find it to be about 2 meV. A theoretical modelling of excitons is performed, and the oscillator strengths of radiative levels are calculated as a function of strain for (0001)-grown epilayers. In particular, we find that the strength of optical transitions are extremely sensitive to the residual strain field in view of the small value of the spin-orbit interaction. Our calculation shows agreement with low-temperature reflectance investigations in GaN epilayers grown on sapphire substrates

Les Robots Parallèles

National audienc

LOW-PRESSURE METALORGANIC VAPOR-PHASE EPITAXY GROWTH OF ZNTE USING TRIETHYLAMINE DIMETHYL ZINC ADDUCT

International audienceWe present for the first time a detailed investigation of the growth of ZnTe layers deposited on GaAs substrates by low pressure metalorganic vapour-phase epitaxy using the new triethylamine dimethyl zinc adduct in combination with diisopropyl telluride as zinc and tellurium precursors respectively. The influence of the growth temperature (T(g)), the VI/II molar ratio, and the overall growth pressure (P) are studied. The successful growth of ZnTe is demonstrated at temperatures as low as 300-degrees-C. For growth temperatures ranging between 300 and 450-degrees-C, the growth rate is limited by the kinetics at the growing interface, and we measure an activation energy of 28 kcal/mol. At T(g) = 375-degrees-C, we found a linear variation of the growth rate with the overall growth pressure on the one hand, and with both zinc and telluride molar flows on the other hand. Low temperature reflectance and photoluminescence measurements were performed to characterize all the samples and are used to determine the optimal growth conditions: T(g) = 350-degrees-C, VI/II = 2, with P = 40 Torr. The stress experienced by the epilayers is investigated using the reflectance measurements. The relative intensity of the arsenic related bound exciton emission at 2.367 eV decreases as T(g) decreases. On the other hand, the I(b)1 unknown acceptor related bound exciton emission at 2.356 eV decreases linearly with the growth rate