Characterization of All-Chromium Tunnel Junctions and Single Electron Tunneling Devices Fabricated by Direct-Writing Multilayer Technique

We report about the fabrication and analysis of the properties of Cr/CrO_x/Cr tunnel junctions and SET transistors, prepared by different variants of direct-writing multilayer technique. In all cases, the CrO_x tunnel barriers were formed in air under ambient conditions. From the experiments on single junctions, values for the effective barrier height and thickness were derived. For the Cr/CrO_x/Cr SET transistors we achieved minimal junction areas of 17 x 60 nm^2 using a scanning transmission electron microscope for the e-beam exposure on Si_3N_4 membrane substrate. We discuss the electrical performance of the transistor samples as well as their noise behavior.Comment: 19 pages, 9 figure

Single electron transistors with high quality superconducting niobium islands

Deep submicron Al-AlOx-Nb tunnel junctions and single electron transistors with niobium islands were fabricated by electron beam gun shadow evaporation. Using stencil masks consisting of the thermostable polymer polyethersulfone (PES) and germanium, high quality niobium patterns with good superconducting properties and a gap energy of up to 2Delta = 2.5 meV for the niobium were achieved. The I(U) characteristics of the transistors show special features due to tunneling of single Cooper pairs and significant gate modulation in both the superconducting and the normal state.Comment: 4 pages, 4 figure

Aluminum Single Electron Transistors with Islands Isolated from a Substrate

The low-frequency noise figures of single-electron transistors (electrometers) of traditional planar and new stacked geometry were compared. We observed a correlation between the charge noise and the contact area of the transistor island with a dielectric substrate in the set of Al transistors located on the same chip and having almost similar electric parameters. We have found that the smaller the contact area the lower the noise level of the transistor. The lowest noise value 8*10E-6 e/sqrt(Hz) at f = 10 Hz. has been measured in a stacked transistor with an island which was completely isolated from a substrate. Our measurements have unambiguously indicated that the dominant source of the background charge fluctuations is associated with a dielectric substrateComment: Review paper, latex, 10 pages, 7 figures, to be publ. in JLTP, 2000; Proceeding of "Electron Transport in Mesoscopic Systems", August 12-15, 1999 Geteborg, Sweden, http://fy.chalmers.se/meso_satellite/index.html See also LT22 manuscript: http://lt22.hut.fi/cgi/view?id=S1113

The single electron R-pump: first experiment

We fabricated and tested the single electron R-pump, i.e. a three-junction Al circuit with on-chip Cr resistors. We show that due to the presence of the resistors (R > h/e^2 = 25.8 kOhm), the accuracy of electron transfer in the R-pump can approach the level of 10^-8. Preliminary results of experiment with the R-pump made at PTB are reported.Comment: 2 pages, incl. 3 figure

Single-charge devices with ultrasmall Nb/AlOx/Nb trilayer Josephson junctions

Josephson junction transistors and 50-junction arrays with linear junction dimensions from 200 nm down to 70 nm were fabricated from standard Nb/AlOx/Nb trilayers. The fabrication process includes electron beam lithography, dry etching, anodization, and planarization by chemical-mechanical polishing. The samples were characterized at temperatures down to 25 mK. In general, all junctions are of high quality and their I-U characteristics show low leakage currents and high superconducting energy gap values of 1.35 meV. The characteristics of the transistors and arrays exhibit some features in the subgap area, associated with tunneling of Cooper pairs, quasiparticles and their combinations due to the redistribution of the bias voltage between the junctions. Total island capacitances of the transistor samples ranged from 1.5 fF to 4 fF, depending on the junction sizes. Devices made of junctions with linear dimensions below 100 nm by 100 nm demonstrate a remarkable single-electron behavior in both superconducting and normal state. We also investigated the area dependence of the junction capacitances for transistor and array samples.Comment: 19 pages incl. 2 tables and 11 figure

Storage capabilities of a 4-junction single electron trap with an on-chip resistor

We report on the operation of a single electron trap comprising a chain of four Al/AlOx/Al tunnel junctions attached, at one side, to a memory island and, at the other side, to a miniature on-chip Cr resistor R=50 kOhm which served to suppress cotunneling. At appropriate voltage bias the bi-stable states of the trap, with the charges differing by the elementary charge e, were realized. At low temperature, spontaneous switching between these states was found to be infrequent. For instance, at T=70 mK the system was capable of holding an electron for more than 2 hours, this time being limited by the time of the measurement.Comment: 3 pages of text and 2 figure

Gain Dependence of the Noise in the Single Electron Transistor

An extensive investigation of low frequency noise in single electron transistors as a function of gain is presented. Comparing the output noise with gain for a large number of bias points, it is found that the noise is dominated by external charge noise. For low gains we find an additional noise contribution which is compared to a model including resistance fluctuations. We conclude that this excess noise is not only due to resistance fluctuations. For one sample, we find a record low minimum charge noise of qn = 9*10^-6 e/sqrt(Hz) in the superconducting state and qn = 9*10^-6 e/sqrt(Hz) in the normal state at a frequency of 4.4 kHz.Comment: 10 pages, LaTex 2.09, 4 figures (epsfig