1 research outputs found
In situ epitaxial MgB2 thin films for superconducting electronics
A thin film technology compatible with multilayer device fabrication is
critical for exploring the potential of the 39-K superconductor magnesium
diboride for superconducting electronics. Using a Hybrid Physical-Chemical
Vapor Deposition (HPCVD) process, it is shown that the high Mg vapor pressure
necessary to keep the MgB phase thermodynamically stable can be achieved
for the {\it in situ} growth of MgB thin films. The films grow epitaxially
on (0001) sapphire and (0001) 4H-SiC substrates and show a bulk-like of
39 K, a (4.2K) of A/cm in zero field, and a
of 29.2 T in parallel magnetic field. The surface is smooth with a
root-mean-square roughness of 2.5 nm for MgB films on SiC. This deposition
method opens tremendous opportunities for superconducting electronics using
MgB