Experimental demonstration of topological effects in bianisotropic metamaterials

Existence of robust edge states at interfaces of topologically dissimilar systems is one of the most fascinating manifestations of a novel nontrivial state of matter, a topological insulator. Such nontrivial states were originally predicted and discovered in condensed matter physics, but they find their counterparts in other fields of physics, including the physics of classical waves and electromagnetism. Here, we present the first experimental realization of a topological insulator for electromagnetic waves based on engineered bianisotropic metamaterials. By employing the near-field scanning technique, we demonstrate experimentally the topologically robust propagation of electromagnetic waves around sharp corners without backscattering effects

Effect of composition on thermoelectric properties of polycrystalline CrSi2

Ingots with compositions CrSi2−x (with 0 < x < 0.1) were synthesized by vacuum arc melting followed by uniaxial hot pressing for densification. This paper reports the temperature and composition dependence of the electrical resistivity, Seebeck coefficient, and thermal conductivity of CrSi2−x samples in the temperature range of 300 K to 800 K. The silicon-deficient samples exhibited substantial reductions in resistivity and Seebeck coefficient over the measured temperature range due to the formation of metallic secondary CrSi phase embedded in the CrSi2 matrix phase. The thermal conductivity was seen to exhibit a U-shaped curve with respect to x, exhibiting a minimum value at the composition of x = 0.04. However, the limit of the homogeneity range of CrSi2 suppresses any further decrease of the lattice thermal conductivity. As a consequence, the maximum figure of merit of ZT = 0.1 is obtained at 650 K for CrSi1.98

Gain theory and models in silicon nanostructures

The main goal in the information technology is to have the possibility of integrating low-dimensional structures showing appropriate optoelectronic properties with the well established and highly advanced silicon microelectronics present technology. Therefore, after the initial impulse given by the work of Canham on visible luminescence from porous Si, nanostructured Si has received extensive attention both from experimental and theoretical point of view during the last ten years. This activity is mainly centered on the possibility of getting relevant optoelectronic properties from nanocrystalline Si, which in the bulk crystalline form is an indirect band gap semiconductor, with very inefficient light emission in the infrared. Although some controversial interpretations of the visible light emission from low-dimensional Si structures still exist, it is generally accepted that the quantum confinement, caused by the restricted size, and the surface passivation are essential for this phenomenon.Here we will review our activity in the field of the theoretical determination of the structural, electronic and optical properties of Si nanocrystals (Si-nc). The present work aims at answer a very important question related to the origin of the enhanced photoluminescence in Si-nc embedded in SiO2. In fact, optical gain has been recently observed in ion implanted Si-nc and in Si-nc formed by plasma enhanced chemical vapour deposition and annealing treatments. We propose, here, an analysis of the experimental findings based on an effective rate equation model for a four level system; moreover looking at our theoretical results for the optical properties of Si-nc we search for structural model that can be linked to the four level scheme. As final outcome, due to the results for the optoelectronic properties of Si-nc in different interface bond configurations, we demonstrate that in order to account for the striking photoluminescence properties of Si-nc it is necessary to take carefully into account not only the role of quantum confinement, but also the role of the interface region surrounding the Si-nc.Silicon, the leading material in microelectronics during the last four decades, also promises to be the key material in the future. Despite many claims that silicon technology has reached fundamental limits, the performance of silicon microelectronics continues to improve steadily. The same holds for almost all the applications for which Si was considered to be unsuitable. The main exception to this positive trend is the silicon laser, which has not been demonstrated to date. The main reason for this comes from a fundamental limitation related to the indirect nature of the Si band-gap. In the recent past, many different approaches have been taken to achieve this goal: dislocated silicon, extremely pure silicon, silicon nanocrystals, porous silicon, Er doped Si-Ge, SiGe alloys and multiquantum wells, SiGe quantum dots, SiGe quantum cascade structures, shallow impurity centers in silicon and Er doped silicon. In this contest the present work aims at answer a very important question related to the origin of the enhanced photoluminescence in Si-nc embedded in SiO2. In fact, optical gain has been recently observed in ion implanted Si-nc and in Si-nc formed by plasma enhanced chemical vapour deposition and annealing treatments. We propose, here, an analysis of the experimental findings based on an effective rate equation model for a four level system; moreover looking at our theoretical results for the optical properties of Si-nc we search for structural model that can be linked to the four level scheme. As final outcome, due to the results for the optoelectronic properties of Si-nc in different interface bond configurations, we demonstrate that in order to account for the striking photoluminescence properties of Si-nc it is necessary to take carefully into account not only the role of quantum confinement, but also the role of the interface region surrounding the Si-nc