11 research outputs found
Integrated process of photoresist trimming and dielectric hard mask etching for sub-50 nm gate patterning
No full text10.1016/j.tsf.2005.09.152Thin Solid Films5041-2117-120THSF
Enhanced performance in 50 nm N-MOSFETs with silicon-carbon source/drain regions
No full textTechnical Digest - International Electron Devices Meeting, IEDM1069-1071TDIM
Thermodynamic modeling of the behavior of silicon oxide and nitride precursors in the preparation of dielectric layers
No full text
Lattice strain analysis of transistor structures with silicon-germanium and silicon-carbon sourcedrain stressors
No full text10.1063/1.1871351Applied Physics Letters8691-3APPL
Development of the Rayleigh-Taylor instability at the boundary of a friable medium layer accelerated by a compressed air flow
No full text
Distribution of elastic and electric fields of a photorefractive grating near the boundaries of crystals of 4mm and 6mm symmetry class
No full textNonlinear dynamics of the space charge in a photorefractive crystal under pulsed photoinjection
No full text
