1 research outputs found
Atomistic Simulation of Si3N4 CVD from Dichlorosilane and NH3
- Author
- A Gonzalez-Lafont
- A Omeltchenko
- A Reyes-Serrato
- A. Lekhollm
- AA Bagatur’yants
- AA Bagatur’yants
- AA Korkin
- AD Mclean
- AY Liu
- B.G. Willis
- C Kleijn
- C Moller
- C-E Morosanu
- C-E Morosanu
- C-K Loong
- CC Battaile
- CM Wang
- D.J
- EW Schlag
- F Mota
- F. Brito Mota
- G Mills
- G Pacchioni
- G Peev
- G Reber
- G Valente
- G Zhai
- G.L. Zhao
- H Eyring
- H Rabitz
- H Simka
- H Toraya
- HNG Wadley
- IG Pitt
- J Niesmann
- JA Wendal
- JM Wittbrodt
- JW Klaus
- JW Klaus
- K Kato
- K.F. Roenigk
- KF Jensen
- KH Jack
- L Kubler
- LA Curtiss
- M-D Su
- M. Bjorkqvist
- M.E. Bachlechner
- M.T. Swihart
- M.W. Schmidt
- MD Allendorf
- ME Bachlechner
- MJ Frisch
- MT Swihart
- MT Swihart
- P Avouris
- P Vashishta
- P Yang
- PD Davides
- PJ Robinson
- R Grun
- R.L. Jenkins
- RE Weston
- RG Gilbert
- RK Kalia
- RN Katz
- RP Dickinson
- RS Rosier
- S Ishidzuka
- S Koseki
- S Koseki
- S Koseki
- S Yokoyama
- S Yokoyama
- S. Ishidzuka
- ST Rodgers
- T Sorita
- T Watanabe
- T. Ogata
- TP Merchant
- W-Y Ching
- W.Y. Lee
- WA Pliskin
- WH Press
- WY Ching
- X Wang
- XY Guo
- Y Kusakabe
- Y-N Xu
- Y. Widjaja
- Publication venue
- 'Springer Science and Business Media LLC'
- Publication date
- 01/01/2004
- Field of study
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