Minimal domain size necessary to simulate the field enhancement factor numerically with specified precision

In the literature about field emission, finite elements and finite differences techniques are being increasingly employed to understand the local field enhancement factor (FEF) via numerical simulations. In theoretical analyses, it is usual to consider the emitter as isolated, i.e, a single tip field emitter infinitely far from any physical boundary, except the substrate. However, simulation domains must be finite and the simulation boundaries influences the electrostatic potential distribution. In either finite elements or finite differences techniques, there is a systematic error ($\epsilon$) in the FEF caused by the finite size of the simulation domain. It is attempting to oversize the domain to avoid any influence from the boundaries, however, the computation might become memory and time consuming, especially in full three dimensional analyses. In this work, we provide the minimum width and height of the simulation domain necessary to evaluate the FEF with $\epsilon$ at the desired tolerance. The minimum width ($A$) and height ($B$) are given relative to the height of the emitter ($h$), that is, $(A/h)_{min} \times (B/h)_{min}$ necessary to simulate isolated emitters on a substrate. We also provide the $(B/h)_{min}$ to simulate arrays and the $(A/h)_{min}$ to simulate an emitter between an anode-cathode planar capacitor. At last, we present the formulae to obtain the minimal domain size to simulate clusters of emitters with precision $\epsilon_{tol}$. Our formulae account for ellipsoidal emitters and hemisphere on cylindrical posts. In the latter case, where an analytical solution is not known at present, our results are expected to produce an unprecedented numerical accuracy in the corresponding local FEF

Diffraction Resistant Scalar Beams Generated by a Parabolic Reflector and a Source of Spherical Waves

In this work, we propose the generation of diffraction resistant beams by using a parabolic reflector and a source of spherical waves positioned at a point slightly displaced from its focus (away from the reflector). In our analysis, considering the reflector dimensions much greater than the wavelength, we describe the main characteristics of the resulting beams, showing their properties of resistance to the diffraction effects. Due to its simplicity, this method may be an interesting alternative for the generation of long range diffraction resistant waves.Comment: 22 pages, 9 figures, Applied Optics, 201

Physics-based derivation of a formula for the mutual depolarization of two post-like field emitters

Recent analyses of the field enhancement factor (FEF) from multiple emitters have revealed that the depolarization effect is more persistent with respect to the separation between the emitters than originally assumed. It has been shown that, at sufficiently large separations, the fractional reduction of the FEF decays with the inverse cube power of separation, rather than exponentially. The behavior of the fractional reduction of the FEF encompassing both the range of technological interest $0<c/h\lesssim5$ ($c$ being the separation and $h$ is the height of the emitters) and $c\rightarrow\infty$, has not been predicted by the existing formulas in field emission literature, for post-like emitters of any shape. In this letter, we use first principles to derive a simple two-parameter formula for fractional reduction that can be of interest for experimentalists to modeling and interpret the FEF from small clusters of emitters or arrays in small and large separations. For the structures tested, the agreement between numerical and analytical data is $\sim1\%$