Nanometer-Scale Laser Direct-Write Using Near-Field Optics

This article summarizes research on laser-based processing and structuring of materials at the nanoscale using optical near-field schemes. Both apertureless and tapered fiber near-field scanning optical microscope probes can deliver highly confined irradiation at sufficiently high intensities to cause morphological and structural changes in materials at the nanometer level. The energy emitted by the probes and the absorption within the target material are predicted by carrying out calculations of the near-field electromagnetic distribution. The effects of shrinking laser beam dimensions compete with the energy diffusion into the target material. Experimental results have shown well-controlled subtractive material modification with minimum feature size in the neighborhood of 10 nm. Precise patterning can be achieved via laser-assisted chemical etching. Control of the nucleation of nanostructures via rapid melting and crystallization is demonstrated. The article concludes with an outlook to applications

Near-field scanning optical microscopy based nanostructuring of glass

Nanofabrication, at lateral resolutions beyond the capability of conventional optical lithography techniques, is demonstrated here. Femtosecond laser was used in conjunction with Near-field Scanning Optical Microscopes (NSOMs) to nanostructure thin metal films. Also, the possibility of using these nanostructured metal films as masks to effectively transfer the pattern to the underlying substrate by wet etching process is shown. Two different optical nearfiled processing schemes were studied for near-field nanostructuring. In the first scheme, local field enhancement in the near-field of a scanning probe microscope (SPM) probe tip irradiated with femtosecond laser pulses was utilized (apertureless NSOM mode) and as a second approach, femtosecond laser beam was spatially confined by cantilevered NSOM fiber tip (apertured NOSM mode). The minimized heat- and shock-affected areas introduced during ultrafast laser based machining process, allows processing of even high conductivity thin metal films with minimized formation of any interfacial compounds between the metal films and the underlying substrate. Potential applications of this method may be in the fields of nanolithography, nanofluidics, nanoscale chemical and gas sensors, high-density data storage, nano-opto-electronics, as well as biotechnology related applications

Surface nanostructuring by nano-/femtosecond laser-assisted scanning force microscopy

Surface nanostructuring with lateral resolutions beyond the capabilities of conventional optical lithography techniques was demonstrated in this study. Various nanoscopic surface features, such as grids, craters, and curves, were produced on thin metal and semiconductor films and bulk silicon by using the enhanced electric field underneath a proximity scanning probe tip irradiated with a laser beam. Nanoscale melting and crystallization of amorphous silicon films illustrates the capacity of the present scheme to provide an effective nanolaser source. Numerical simulations yield insight into the spatial distribution of the enhanced field intensity underneath the tip and associated physical phenomena. Calculations of the temperature distribution in the microprobe tip and possible tip expansion show that the main reason for the highly localized nanostructuring achieved with this technique is the enhancement of the electric field in the tip–sample gap. Possible applications of the developed nanostructuring process are anticipated in various nanotechnology fields

Atomic force microscopy based, multiphoton, photoelectron emission imaging

Images of photoelectron emission from metallic surfaces were obtained with a modified atomic force microscope operating in air. Illumination of the samples was achieved in the near field of a metal-coated microcantilever tip, placed in the beam of a femtosecond pulsed laser that is incident at a grazing angle with respect to the sample surface. Photoelectron currents were measured through the tip with a prototype amplifier. The power law dependence of average photocurrent on light intensity is compatible with multiphoton photoelectric effect and the work function of the metal covering a particular area on the two-metal patterned samples used