1 research outputs found
Role of Bilayer Resist in 157 nm Lithography
- Author
- 29. J. Hatakeyama M. Nakashima, I.
- A. Blakeney A.H. Gabor, D. White,
- BOWDEN M
- C.R. Kessel L.D. Boardman, S.J. Rh
- HUNG R J
- L. Pollentier M. Maenhoudt, V. Wia
- L.D. Boardman C.R. Kessel, S. Rhym
- M. Hatzakis J. Paraszczak and J. S
- M. Sebald R. Leuschner, R. Sezi, H
- MALIK S
- P. Jagannathan R. Sooriyakumaran,
- Q. Lin A. Katnani, T. Brunner, C.
- Q. Lin K. Petrillo, K. Babich, D.
- R. Kwong P.R. Varanasi, M. Lawson,
- R. Sooriyakumaran D. Fenzel-Alexan
- R. Sooriyakumaran D. Fenzel-Alexan
- R. Sooriyakumaran G. Wallruff, C.
- R.D. Allen G.M. Wallraff, R.A. DiP
- R.G. Brault R.L. Kubena and R.A. M
- R.R. Kunz and D.K. Downs
- R.R. Kunz R.D. Allen, W.D. Hinsber
- R.R. Kunz T.M. Bloomstein, D.E. Ha
- S. Hein S. Angood, D. Ashworth, S.
- S. Kodama I. Kaneko, Y. Takebe, S.
- T. Steinhä
- U. Schaedeli E. Tingueli, A. Blake
- W. Brunsvold K. Stewart, P. Jagann
- Y. Ohnishi M. Suzuki, K. Saigo, Y.
- Y. Ohnishi T. Ushirogouchi, R. Hor
- Publication venue
- 'Technical Association of Photopolymers, Japan'
- Publication date
- 01/01/2003
- Field of study
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