학위논문(박사) - 한국과학기술원 : 전기 및 전자공학과, 1994.2, [ ii, 105 p. ]A novel GaAs FET structure with δn−δp DIpole potential Barrier(DIBFET) is proposed and fabricated. The δn- and δp- layer make transversal electric field, and this forms the potential barrier to the electrons. A conventional δ-doped structure has many advantages, but it has fundamental problems of the ionized impurity scattering near the δ-dope plane. The potential barrier of DIB-structure can push up the electrons near the δ-doped plane from the impurity plane to the undoped channel layer. Thus, it is expected that the transport characteristics of DIB-structure will be improved. The measured carrier density and drift mobility at the undoped channel layer obtained above 1×1018cm−3 and 3700cm2/V\cdot\secfromtheC−VandFATFETmethod,respectively.Theyshowtheimprovedtransportcharacteristicsconsideringthecarrierdensity,asexpected.Inthisthesis,themeasureddataandtheresultsofone−dimensionalnumericalcalculationarecompared.ThenumericalcalculationgivestheC−Vandchannel−conductancecharacteristics.Fromthecalculations,thesensitivitiesofthedevicecharacteristicssuchasthevariationsofchannelconductanceandcapacitanceaboutthedopingdensityof\delta−layerandthethicknessoftheundopedchannellayerareshown.ThefabricatedDIBFETwith0.8\mumgatelengthhasthemaximumextrinsictransconductanceof407mS/mmandthecurrentdensityof550mA/mmatzerogatebiascondition.Thehighoutputresistanceof260\Omega\cdotmmismeasured,andthehighvalueofoutputresistanceisduetothepotentialbarriereffectsofthedipolelayer.InRFapplications,themeasuredextrinsiccurrentgaincutofffrequencyofDIBFETwith0.8\mu$m gate length is about 16.7GHz, the extracted intrinsic current gain cutoff frequency is above than 22GHz. The obtained cutoff frequencies of maximum available power gain and of unilateral power gain are 67GHz and 82GHz, respe...한국과학기술원 : 전기 및 전자공학과