65 research outputs found

    Study of the Electrode Effects on Ferroelectric Hf0.5Zr0.5O2 Thin Film

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    ํ•™์œ„๋…ผ๋ฌธ(๋ฐ•์‚ฌ)--์„œ์šธ๋Œ€ํ•™๊ต ๋Œ€ํ•™์› :๊ณต๊ณผ๋Œ€ํ•™ ์žฌ๋ฃŒ๊ณตํ•™๋ถ€,2020. 2. ํ™ฉ์ฒ ์„ฑ.Ferroelectricity of doped HfO2 was first reported in 2011 by NaMLab in Dresden, Germany. Ever since the discovery of the unprecedented ferroelectric orthorhombic Pca21 phase in doped HfO2, a number of research have been conducted. Unlike conventional ferroelectric perovskite materials, which show degraded ferroelectric property under certain critical thickness, fluorite structured-doped HfO2 maintains its property under few nm thickness, which is a high gain in terms of scaling and three dimensional structure. Its Si compatibility is another intriguing factor for manufacturing. Numerous studies have been conducted to find the origin of ferroelectric orthorhombic phase within doped HfO2, including effects from film thickness, dopant type, annealing condition, top electrode presence. A number of studies on the first principle calculation based on thermodynamics have been also conducted. However, very few research has been conducted on the kinetics and bottom electrode effect, on which this dissertation aims to emphasize. Finding the origin of the unprecedented ferroelectricity within doped HfO2 has suffered from a serious gap between its theoretical calculation, mostly based on thermodynamic approach. To fill the gap, the first part of the dissertation proposes to consider the kinetic energy, providing the evidence of the kinetic energy barrier upon a phase transformation from the tetragonal phase to the monoclinic phase affected by the TiN top electrode (capping layer). 10 nm thick Hf0.5Zr0.5O2 thin films were deposited and annealed with or without the TiN capping layer with subsequent annealing at different time and temperature. Arrhenius plot is constructed to obtain the activation energy for the tetragonal-to-monoclinic phase transformation by calculating the amount of the transformed phase using X-ray diffraction pattern. Johnsonโ€“Mehlโ€“Avrami and nucleation-limited transformation models are utilized to describe the characteristic nucleation and growth time and calculate the activation energy for the monoclinic phase transformation of the Hf0.5Zr0.5O2 thin film. Both models demonstrate that the TiN capping layer provides a kinetic energy barrier for tetragonal-to-monoclinic phase transformation and enhances the ferroelectric property. The second part of the dissertation explains the bottom electrode effect, especially Ru electrode. Ru has been reported to be oxidized to RuO2 during initial atomic layer deposition process when using O3 for oxidant. This formation of RuO2 layer on Ru electrode is expected to act as a layer to hinder the growth of a non-ferroelectric monoclinic phase and promote the tetragonal phase formation, which can transform into a metastable ferroelectric orthorhombic phase. It turned out that Hf0.5Zr0.5O2 thin film is crystallized on Ru electrode aided by the formation of RuO2 layer at as-deposited condition without any further post-annealing process. As-deposited film, however, showed high leakage current and endurance problem, which required further annealing, which caused Ru diffusion into the dielectric layer and degraded the ferroelectric property. Without the post-annealing process, ~10 nm Hf0.5Zr0.5O2 thin film produced a large amount of orthorhombic phases which aided in high remnant polarization of ~17 ฮผC/cm2 at 4 MV/cm with ~108 endurance cycling.2011๋…„ ๋…์ผ ๋“œ๋ ˆ์Šค๋ด์— ์žˆ๋Š” NaMLab ์—์„œ ๊ฐ•์œ ์ „์„ฑ์„ ๋ณด์ด๋Š” HfO2 ๋ฌผ์งˆ์„ ์ฒ˜์Œ ๋ฐœํ‘œ ํ•œ ํ›„๋กœ๋ถ€ํ„ฐ ๋งŽ์€ ์—ฐ๊ตฌ๊ฐ€ ์ง„ํ–‰ ๋˜์–ด ์™”๋‹ค. ๊ฐ•์œ ์ „์„ฑ์„ ๋‚˜ํƒ€๋‚ด๋Š” Pca21 ์ƒ์˜ HfO2 ๋Š” ๋‘๊ป˜๊ฐ€ ๊ฐ์†Œ๋จ์— ๋”ฐ๋ผ์„œ ํŠน์„ฑ์ด ์—ดํ™”๋˜๋Š” ๊ธฐ์กด ํŽ˜๋กœ๋ธŒ์Šค์นด์ดํŠธ ๋ฌผ์งˆ๊ณผ ๋‹ค๋ฅด๊ฒŒ ๋ช‡ nm ์ˆ˜์ค€์—์„œ๋„ ๊ฐ•์œ ์ „์„ฑ ํŠน์ง•์„ ๋ณด์ด๊ธฐ ๋•Œ๋ฌธ์— scaling ๊ณผ 3์ฐจ์› ๊ตฌ์กฐ ์ธก๋ฉด์—์„œ ๊ฐ•์ ์„ ๊ฐ–๊ณ  ๊ธฐ์กด Si ๊ณต์ •์— ์ž˜ ๋ถ€ํ•ฉํ•จ์— ๋”ฐ๋ผ ์ฐจ์„ธ๋Œ€ ๋ฉ”๋ชจ๋ฆฌ ๋ฌผ์งˆ๋กœ ๊ผฝํžŒ๋‹ค. ๋‘๊ป˜, ๋„ํŽ€ํŠธ, ์—ด์ฒ˜๋ฆฌ ์กฐ๊ฑด, ์ƒ๋ถ€ ์ „๊ทน ํšจ๊ณผ ๋ฐ ์—ด์—ญํ•™์— ๊ธฐ๋ฐ˜ ๋œ ์ œ1์›๋ฆฌ ๊ณ„์‚ฐ ๋“ฑ ๊ฐ•์œ ์ „์„ฑ์„ ๋‚˜ํƒ€๋‚ด๋Š” HfO2 ๋ฌผ์งˆ ๊ฑฐ๋™์˜ ์›์ธ์— ๋Œ€ํ•ด์„œ ๋งŽ์€ ์—ฐ๊ตฌ๊ฐ€ ์ง„ํ–‰ ๋˜์–ด ์™”๋‹ค. ํ•˜์ง€๋งŒ ๋™๋ ฅํ•™ ์ธก๋ฉด์—์„œ๋Š” ๋งŽ์€ ๋ณด๊ณ ๊ฐ€ ๋˜์–ด์žˆ์ง€ ์•Š๊ณ  Ru ํ•˜๋ถ€ ์ „๊ทน์„ ์‚ฌ์šฉํ•œ ์‹คํ—˜ ๊ฒฐ๊ณผ๋„ ๋งŽ์ด ๋ณด๊ณ  ๋˜์–ด ์˜ค์ง€ ์•Š์•˜๊ธฐ ๋•Œ๋ฌธ์— ์ด ํ•™์œ„ ๋…ผ๋ฌธ์—์„œ๋Š” ์œ„์˜ ๋‘ ํšจ๊ณผ์— ๋Œ€ํ•ด์„œ ์‚ดํŽด๋ณด๊ณ ์ž ํ•œ๋‹ค. ์—ด์—ญํ•™์— ๊ธฐ๋ฐ˜ํ•œ ์ œ1์›๋ฆฌ ๊ณ„์‚ฐ ๊ฒฐ๊ณผ์˜ ๊ฒฝ์šฐ ๊ณ„์‚ฐ ์ƒ์ˆ˜๋ฅผ ๋ฐ”๊ฟ”๋ด๋„ ์‹คํ—˜ ๊ฒฐ๊ณผ์™€ ์ผ์น˜ํ•˜์ง€ ์•Š๋Š” ํ•œ๊ณ„์ ์„ ๋ณด์ธ๋‹ค. ์ด๋Ÿฐ ํ•œ๊ณ„์ ์„ ๊ทน๋ณตํ•˜๊ณ ์ž ๋™๋ ฅํ•™์ ์ธ ์ธก๋ฉด์—์„œ ๊ฐ•์œ ์ „์„ฑ ๋ฐœํ˜„ ํ˜„์ƒ์— ๋Œ€ํ•ด์„œ ์ ‘๊ทผํ•  ํ•„์š”๊ฐ€ ์žˆ๋‹ค. ํ•™์œ„ ๋…ผ๋ฌธ ์ฒซ๋ฒˆ์งธ ํŒŒํŠธ์—์„œ๋Š” Zr ๋„ํ•‘๋œ HfO2 ๋ฐ•๋ง‰์—์„œ ์—ด์ฒ˜๋ฆฌ๋ฅผ ์ง„ํ–‰ ํ•  ๋•Œ tetragonal ์ƒ์—์„œ monoclinic ์ƒ์œผ๋กœ ์ƒ์ „์ด๊ฐ€ ์ผ์–ด๋‚˜๋Š”๋ฐ ์ƒ๋ถ€ ์ „๊ทน์˜ ์กด์žฌ ์œ ๋ฌด์— ๋”ฐ๋ฅธ activation energy ๋ณ€ํ™”๊ฐ’์„ ๊ตฌํ•  ์ˆ˜ ์žˆ๋‹ค. ๋ณธ ์‹คํ—˜์—์„œ๋Š” 10 nm ์˜ Hf0.5Zr0.5O2 ๋ฐ•๋ง‰์„ ์ฆ์ฐฉํ•˜์—ฌ TiN ์ƒ๋ถ€ ์ „๊ทน ์ฆ์ฐฉ ๋ฐ ์—ด์ฒ˜๋ฆฌ ์‹œ๊ฐ„๊ณผ ์˜จ๋„ ์กฐ๊ฑด์— ๋”ฐ๋ผ์„œ ์ƒ์ „์ด๊ฐ€ ์ผ์–ด๋‚˜๋Š” ์ •๋„๋ฅผ X-ray ํšŒ์ ˆ ๋ถ„์„๋ฒ•์„ ํ†ตํ•ด ๊ตฌํ•˜๋ฉฐ Arrhenius plot ์„ ํ†ตํ•ด activation energy ๋ฅผ ๊ณ„์‚ฐ ํ•  ์ˆ˜ ์žˆ๋‹ค. ๊ณ ์ „์ ์ธ Johnson-Mehl-Avrami ๋ชจ๋ธ์œผ๋กœ ๋‹ค๊ฒฐ์ •์ธ Hf0.5Zr0.5O2 ๋ฐ•๋ง‰์˜ nucleation and growth ๊ฑฐ๋™์„ ๋ถ„์„ํ•  ๊ฒฝ์šฐ ํ•œ๊ณ„์ ์„ ๋ณด์˜€์œผ๋ฉฐ ์ƒˆ๋กœ ์ œ์•ˆํ•˜๋Š” nucleation-limited-transformation ๋ชจ๋ธ์„ ์‚ฌ์šฉํ•˜์—ฌ Hf0.5Zr0.5O2 ๋ฐ•๋ง‰์˜ nucleation and growth ์„ฑ์žฅ ๊ฑฐ๋™์„ ์ž˜ ๋Œ€๋ณ€ํ•  ์ˆ˜ ์žˆ๋‹ค. ๋‘๋ฒˆ์งธ ํŒŒํŠธ์—์„œ๋Š” Ru ํ•˜๋ถ€ ์ „๊ทน์ด Hf0.5Zr0.5O2 ๋ฐ•๋ง‰์— ๋ฏธ์น˜๋Š” ์˜ํ–ฅ์— ๋Œ€ํ•ด ๊ณ ์ฐฐํ•œ๋‹ค. Ru ํ•˜๋ถ€ ์ „๊ทน ์œ„์—์„œ ์˜ค์กด์„ ์‚ฐํ™”์ œ๋กœ ์‚ฌ์šฉํ•˜์—ฌ Hf0.5Zr0.5O2 ๋ฐ•๋ง‰์„ ์›์ž์ธต ์ฆ์ฐฉ๋ฒ•์œผ๋กœ ์ฆ์ฐฉํ•  ๋•Œ ์ดˆ๊ธฐ ์„ฑ์žฅ์—์„œ rutile ์ƒ์˜ RuO2 ๊ฐ€ ์ƒ๊ธฐ๊ฒŒ ๋˜๋Š”๋ฐ ์ด๋Š” tetragonal phase ์™€ lattice mismatch ๊ฐ€ ํฌ์ง€ ์•Š์•„ local preferential ํ•œ Hf0.5Zr0.5O2๋ฅผ ์„ฑ์žฅ์‹œํ‚ค๊ณ  ๋น„๊ฐ•์œ ์ „์„ฑ์ธ monoclinic phase ๋ฅผ ์–ต์ œ ์‹œํ‚จ๋‹ค. ํ•œ ๋ฐฉํ–ฅ์œผ๋กœ ๊ฒฐ์ •ํ™”๊ฐ€ ์ž˜ ๋œ Ru ์ „๊ทน์ด in-situ ๊ฒฐ์ •ํ™”๋ฅผ ์œ ๋„ ํ•˜์˜€์œผ๋ฉฐ ๊ฒฐ๊ณผ์ ์œผ๋กœ Ru ํ•˜๋ถ€ ์ „๊ทน ์œ„์— ์ฆ์ฐฉ ๋œ Hf0.5Zr0.5O2 ๋ฐ•๋ง‰์˜ ๊ฒฝ์šฐ ํ›„ ์—ด์ฒ˜๋ฆฌ ์—†์ด ๊ฒฐ์ •ํ™”๊ฐ€ ๋˜๋Š” ๊ฑฐ๋™์„ ๋ณด์ด๋Š”๋ฐ ์ด๋Š” TiN ํ•˜๋ถ€ ์ „๊ทน ์œ„์— ์ฆ์ฐฉํ•œ ๋’ค ์—ด์ฒ˜๋ฆฌ ํ•œ ๋ฐ•๋ง‰๊ณผ ๋น„์Šทํ•œ ์ž”๋ฅ˜ ๋ถ„๊ทน ๊ฐ’์„ ๋ณด์˜€๋‹ค. ํ•˜์ง€๋งŒ ํ›„ ์—ด์ฒ˜๋ฆฌ๊ฐ€ ์—†๋Š” Ru ์œ„ ๋ฐ•๋ง‰์˜ ๊ฒฝ์šฐ ๋†’์€ ๋ˆ„์„ค ์ „๋ฅ˜๋ฅผ ๋ณด์˜€์œผ๋ฉฐ Al2O3 ๋ฅผ ์‚ฝ์ž…ํ•˜์—ฌ ๋ˆ„์„ค ์ „๋ฅ˜๋ฅผ ์–ต์ œํ•ด๋„ fatigue ๋ฌธ์ œ๊ฐ€ ํ•ด๊ฒฐ ๋˜์ง€ ์•Š์•˜๋‹ค. ์ด๋Š” domain wall pinning ์— ์˜ํ•œ ๊ฒฐ๊ณผ์ด๊ณ  ์ด์— ๋Œ€ํ•œ ํšจ๊ณผ๋ฅผ ์ตœ์†Œํ™” ํ•˜๊ณ ์ž frequency ๋ฅผ ๋ฐ”๊ฟ” ์ธก์ • ํ•˜์˜€์„ ๋•Œ 108 ์˜ ์ „๊ณ„ ์‚ฌ์ดํด๋ง์—์„œ 17ฮผC/cm2 ์˜ 2Pr ์„ ์–ป์—ˆ๋‹ค.1. Introduction. 1 1.1. Ferroelectric Doped-HfO2 Thin Film. 1 1.2. Objective and Chapter Overview. 4 1.3. Bibliography 6 2. Literature.. 8 2.1. External Factors Affecting Ferroelectricity of Doped-HfO2. 8 2.2. Top Electrode Capping Effect. 12 2.3. Choice of Bottom Electrode. 18 2.4. Bibliography 22 3. Nucleation-limited Ferroelectric Orthorhombic Phase Formation in Hf0.5Zr0.5O2 Thin Films. 24 3.1. Introduction 24 3.2. Experimental 29 3.3. Results and Discussions. 31 3.4. Conclusion... 59 3.5. Bibliography... 61 4. Ru Bottom Electrode Effects on the Ferroelectricity of Hf0.5Zr0.5O2 Thin Films 67 4.1. Introduction 67 4.2. Experimental 71 4.3. Results and Discussions. 72 4.4. Conclusion 113 4.5. Bibliography 115 5. Conclusion. 118 List of Publications 120 Abstract (in Korean) 125Docto

    Estimation of DSGE model with or without filter

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    ํ•™์œ„๋…ผ๋ฌธ (์„์‚ฌ)-- ์„œ์šธ๋Œ€ํ•™๊ต ๋Œ€ํ•™์› : ๊ฒฝ์ œํ•™๋ถ€, 2012. 8. ๊น€์žฌ์˜.๊ฒฝ๊ธฐ๋ณ€๋™์„ ์„ค๋ช…ํ•˜๊ธฐ ์œ„ํ•œ DSGE ๋ชจํ˜• ์ถ”์ •์— ์žˆ์–ด ํ•„ํ„ฐ๋ง ๋œ ์ž๋ฃŒ๋ฅผ ์‚ฌ์šฉํ•˜๋Š” ๊ฒƒ์ด ์ง€๊ธˆ๊นŒ์ง€์˜ ๋Œ€๋ถ€๋ถ„์˜ ์—ฐ๊ตฌ๋“ค์ด ์‚ฌ์šฉํ•˜๋Š” ๋ฐฉ์‹์ด์—ˆ๋‹ค. ๋”ฐ๋ผ์„œ ๋‹ค์–‘ํ•œ ํ•„ํ„ฐ๋ง ๋ฐฉ๋ฒ•๋“ค์ด ๊ฒฝ์ œํ•™ ์—ฐ๊ตฌ์— ๋„์ž…์ด ๋˜์–ด์™”๋‹ค. ๋ช‡ ๊ฐ€์ง€ ๋„๋ฆฌ ์‚ฌ์šฉ๋˜๋Š” ํ•„ํ„ฐ์˜ ์˜ˆ๋ฅผ ๋“ค์ž๋ฉด Hodrick-Prescott ํ•„ํ„ฐ, band-pass filter, ๊ทธ๋ฆฌ๊ณ  Beveridge-Nelson filter๋ฅผ ๋“ค ์ˆ˜ ์žˆ์„ ๊ฒƒ์ด๋‹ค. ์ด๋Ÿฌํ•œ ๋ฐฉ๋ฒ•๋ก ์˜ ๋‹ค์–‘์„ฑ์€ ์‚ฌ์‹ค ์„œ๋กœ ๋‹ค๋ฅธ ๋ฐฉ๋ฒ•๋ก ์  ๋Œ€์•ˆ๊ฐ„์˜ ์ฐจ์ด์™€, ํ•„ํ„ฐ๋ง์ด ์ž‘๋™ํ•˜๋Š” ๋ฐฉ์‹์— ๋Œ€ํ•ด ๋ช…ํ™•ํ•œ ๋Œ€๋‹ต์ด ์—†์ด ๋ชจํ˜ธํ•œ ์ƒํ™ฉ์ด๋ผ๋ฉด ๋‹จ์ง€ ์—ฐ๊ตฌ์ž์˜ ํ˜ผ๋ž€์„ ๊ฐ€์ค‘์‹œํ‚ค๋Š” ์›์ธ์ด ๋  ์ˆ˜ ์žˆ๋‹ค. ๊ฒŒ๋‹ค๊ฐ€ Fabio Canova(1998)์— ๋”ฐ๋ฅด๋ฉด, ์ถ”์ •์˜ ๊ฒฐ๊ณผ๊ฐ€ ํ•„ํ„ฐ๋ง ๋ฐฉ๋ฒ•์— ๋”ฐ๋ผ ๋‹ค๋ฅด๊ฒŒ ๋‚˜ํƒ€๋‚œ๋‹ค๋Š” ๊ฒƒ์ด ๋ณด๊ณ  ๋˜์–ด ์žˆ๋‹ค. ๋”ฐ๋ผ์„œ ๋ณธ ์—ฐ๊ตฌ์—์„œ๋Š” ํ•„ํ„ฐ์™€ ์ถ”์ •์˜ ๊ด€๊ณ„์— ๋Œ€ํ•ด ๋ถ„์„ํ•˜๊ณ ์ž ํ•œ๋‹ค. ํŠนํžˆ i) ๋„๋ฆฌ ์‚ฌ์šฉ๋˜๊ณ  ์žˆ๋Š” ํ•„ํ„ฐ๋“ค์ด ํ•˜๊ณ  ์žˆ๋Š” ์•”๋ฌต์  ๊ฐ€์ •๋“ค์„ ๋ช…์ฆํ•˜๊ฒŒ ๋ช…๋ฌธํ™”ํ•˜๊ณ , ii) ํ•„ํ„ฐ๋ง์ด ์ถ”์ •์— ๋ฏธ์น˜๋Š” ์˜ํ–ฅ์„ ์ฐพ์•„๋‚ด๊ณ , iii) ํ•„ํ„ฐ๋ฅผ ์‚ฌ์šฉํ•˜์ง€ ์•Š๋Š” ์ถ”์ •๋ฐฉ์‹์„ ์ œ์‹œํ•˜๊ณ ์ž ํ•œ๋‹ค.So far, various filtering techniques have been introduced to the field of economic studies since it has been conventional method to use pre-filtered data to estimate the DSGE model which is constructed to explain business cycle fluctuation. To name a few of widely used filter, Hodrick-Prescott filter, band-pass filter, and Beveridge-Nelson filter. Such diversity of methodological alternatives is a possible source of confusion if the detailed mechanisms of filtering methods and the differences between them are remained unanswered and ambiguous. Furthermore, as Fabio Canova(1998) points out, the results of estimation are not independent of filtering method. Therefore, in this study, the relationship between filter and estimation will be studied. Specifically, it will focus on i) clarify and codify the tacit assumptions on commonly used filtering method, ii) identify the effect of filtering on estimation, iii) propose the estimation method without filtering.1. Introduction 2. Preliminary 2.1 Setting 2.2 Data in frequency domain 2.3 Filter in frequency domain 3. Analysis 3.1 Distortion caused by pre-filtered data 3.2 Minimum mean squared error filtering 3.3 EM algorithm interpretation of filtering 4. Numerical example 4.1 Data generation 4.2 Likelihood function 5. Conclusion Figure ReferencesMaste

    ์ƒˆ๋กœ์šด ์†Œ๊ฒฐ์กฐ์ œ๋กœ์„œ์˜ ์•Œ์นผ๋ฆฌ ํ† ๊ธˆ์† ํƒ„์‚ฐ์—ผ์˜ ์†Œ๋Ÿ‰์ฒจ๊ฐ€์— ์˜ํ•œ MgAl2O4์˜ ์น˜๋ฐ€ํ™” ๊ฑฐ๋™

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    ํ•™์œ„๋…ผ๋ฌธ (์„์‚ฌ)-- ์„œ์šธ๋Œ€ํ•™๊ต ๋Œ€ํ•™์› ๊ณต๊ณผ๋Œ€ํ•™ ์žฌ๋ฃŒ๊ณตํ•™๋ถ€, 2017. 8. ๊ฐ•์‹ ํ›„.Magnesium aluminate spinel, (MgAl2O4, MAS)๋‚ด์— 0.5mol%์˜ ์•Œ์นผ๋ฆฌ ํ† ๊ธˆ์† ์‚ฐํ™”๋ฌผ ๋ฐ ํƒ„์‚ฐ์—ผ์„ ์†Œ๊ฒฐ์กฐ์ œ๋กœ ์ฒจ๊ฐ€ํ•˜์—ฌ ์†Œ๊ฒฐ์„ฑ์„ ์ฆ์ง„์‹œํ‚ค๋Š” ์‹คํ—˜์„ ์ง„ํ–‰ํ•˜์˜€๋‹ค. ์‚ฐํ™”๋ฌผ์„ ์†Œ๊ฒฐ์กฐ์ œ๋กœ ์ฒจ๊ฐ€ํ•˜์˜€์„ ์‹œ MAS์˜ ์ˆ˜์ถ•์œจ์ด ๊ณ ์˜จ์—์„œ ๊ธ‰๊ฒฉํžˆ ๋†’์•„์กŒ๊ณ , ๋ฏธ์„ธ์กฐ์ง์˜ ๊ฒฐ์ •๋ฆฝ์—์„œ ๋ถ€๋ถ„์ ์œผ๋กœ ๋น„์ •์ƒ์ž…์„ฑ์žฅ์ด ์ผ์–ด๋‚œ ๊ฒƒ์œผ๋กœ ๋ณด์•„ MAS์™€ ์‚ฐํ™”๋ฌผ์ด ๊ณ ์˜จ์—์„œ ๊ณต์ •๋ฐ˜์‘์„ ํ•˜์—ฌ ๋ถ€๋ถ„์ ์œผ๋กœ ์•ก์ƒ์„ ํ˜•์„ฑํ•œ ๋’ค ๊ธ‰๊ฒฉํ•œ ์น˜๋ฐ€ํ™”๊ฐ€ ์ด๋ค„์กŒ์„ ๊ฒƒ์ด๋ผ ํŒ๋‹จ๋œ๋‹ค. ํƒ„์‚ฐ์—ผ์„ ์ฒจ๊ฐ€ํ•œ MAS ์—ญ์‹œ ์†Œ๊ฒฐ๊ณผ์ • ์ค‘์— ์—ด๋ถ„ํ•ด๋ฅผ ๊ฑฐ์นœ ํ›„ ๊ณ ์˜จ์—์„œ ์‚ฐํ™”๋ฌผ์˜ ํ˜•ํƒœ๋กœ ๋‚ด๋ถ€์— ์กด์žฌํ•˜๊ฒŒ ๋˜๋ฉฐ ๋”์šฑ ๋†’์€ ์˜จ๋„์—์„œ MAS์™€ ๊ณต์ •๋ฐ˜์‘์„ ์ผ์œผํ‚ค๋Š” ๊ฒƒ์œผ๋กœ ๋ณด์˜€๋‹ค. ์ด๋ ‡๋“ฏ ์ง€์—ฐ๋œ ๊ณต์ •๋ฐ˜์‘์€ ๋”์šฑ ๋†’์€ ์˜จ๋„์—์„œ ์•ก์ƒ์„ ํ˜•์„ฑํ•˜๊ฒŒ ๋งŒ๋“ค์—ˆ๊ณ  ์ด๋กœ ์ธํ•ด ์–ป์–ด์ง„ ๋†’์€ ์œ ๋™์„ฑ์ด ํƒ„์‚ฐ์—ผ์„ ์†Œ๊ฒฐ์กฐ์ œ๋กœ ์‚ฌ์šฉํ•˜์˜€์„ ๋•Œ ์ƒ๋Œ€์ ์œผ๋กœ ์†Œ๊ฒฐ๋ฐ€๋„๊ฐ€ ๋”์šฑ ๋†’๊ฒŒ ๋‚˜ํƒ€๋‚œ ์›์ธ์ด ๋˜์—ˆ์„ ๊ฒƒ์ด๋ผ ํŒ๋‹จ๋œ๋‹ค. ๋˜ํ•œ, 1550โ„ƒ์—์„œ 1์‹œ๊ฐ„ ์œ ์ง€ํ•˜๋Š” ์กฐ๊ฑด์œผ๋กœ 1์ฐจ ์†Œ๊ฒฐ์„ ๋งˆ์นœ ๋’ค ์†Œ๊ฒฐ์ฒด๋ฅผ 200MPa์˜ ์••๋ ฅ์œผ๋กœ 1650โ„ƒ์—์„œ 4์‹œ๊ฐ„ ์œ ์ง€ํ•˜๋Š” ์กฐ๊ฑด์„ ๊ฐ€์ง„ HIP์œผ๋กœ 2์ฐจ์†Œ๊ฒฐ์„ ํ•˜์—ฌ ํˆฌ๊ณผ๋„๋ฅผ ๋น„๊ตํ•ด๋ณด์•˜๋‹ค. CaO์™€ CaCO3๋ฅผ ์†Œ๊ฒฐ์กฐ์ œ๋กœ ์‚ฌ์šฉํ•˜์˜€์„ ๊ฒฝ์šฐ ๊ฐ€์‹œ๊ด‘์„ ์—์„œ ๋‚ฎ์€ ํˆฌ๊ณผ๋„๋ฅผ ๋ณด์˜€๋˜ ๊ฒƒ์— ๋ฐ˜ํ•ด SrO์™€ SrCO3๋ฅผ ์†Œ๊ฒฐ์กฐ์ œ๋กœ ์‚ฌ์šฉํ•˜์˜€์„ ๋•Œ MAS๋Š” ๊ฐ€์‹œ๊ด‘์„ ์—์„œ ๋†’์€ ํˆฌ๊ณผ๋„๋ฅผ ๋ณด์˜€๋‹ค. ๋ณธ ์‹คํ—˜์„ ํ†ตํ•œ ์—ฐ๊ตฌ์—์„œ๋Š” Sr์— ๋น„ํ•ด Ca๊ฐ€ MAS ๋‚ด์— ์กด์žฌํ•  ๋•Œ ๋”์šฑ ํฐ ๋น„์ •์ƒ์ž…์„ฑ์žฅ์„ ๋ณด์˜€์œผ๋ฏ€๋กœ ์ฃผ๋ณ€ ๊ฒฐ์ •๋ฆฝ๊ณผ์˜ ํ˜„์ €ํ•œ ํฌ๊ธฐ์ฐจ์ด๋กœ ์ธํ•ด Ca๋ฅผ ์ฒจ๊ฐ€ํ•œ MAS์˜ ํˆฌ๊ณผ๋„๊ฐ€ ๋‚ฎ๊ฒŒ ๋‚˜์™”๋‹ค๊ณ  ํŒ๋‹จ๋˜์—ˆ๋‹ค.์ œ 1 ์žฅ ์„œ ๋ก  1 ์ œ 1 ์ ˆ ์—ฐ๊ตฌ์˜ ๋ฐฐ๊ฒฝ 1 ์ œ 2 ์žฅ ์‹คํ—˜๊ณผ์ • 5 ์ œ 1 ์ ˆ ์›๋ฃŒ๋ถ„๋ง ์„ ์ • ๋ฐ ์‹คํ—˜๊ณผ์ • 5 ์ œ 3 ์žฅ ๊ฒฐ๊ณผ ๋ฐ ํ† ์˜ 6 ์ œ 1 ์ ˆ Effective concentration of oxide additives 6 ์ œ 2 ์ ˆ Microstructure analysis of MAS with oxide additives 6 ์ œ 3 ์ ˆ Dilatometry analysis of MAS with oxide additives 7 ์ œ 4 ์ ˆ A doping element in MAS 7 ์ œ 5 ์ ˆ Secondary phase in MAS 8 ์ œ 6 ์ ˆ Phase diagram of diverse aluminate compounds 8 ์ œ 7 ์ ˆ Density of MAS with carbonate additives 9 ์ œ 8 ์ ˆ TGA results of MAS powders with carbonate additives 9 ์ œ 9 ์ ˆ Thermal decomposition of carbonates 9 ์ œ 10 ์ ˆ Microstructure analysis of MAS with carbonate additives 10 ์ œ 11 ์ ˆ Dilatometry analysis of MAS with carbonate additives 11 ์ œ 12 ์ ˆ Kinetics of thermal decomposition 11 ์ œ 13 ์ ˆ Hot isostatic pressing 12 ์ œ 14 ์ ˆ Microstructure analysis of MAS with different sintering additives after HIP 12 ์ œ 4 ์žฅ ๊ฒฐ๋ก  14 ์ฐธ๊ณ ๋ฌธํ—Œ 52 Abstract 53 ๊ฐ์‚ฌ์˜ ๊ธ€ 54Maste

    A Study on the Design Optimization of Centrifugal Compressor considering the Efficiency and the Volume

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    ํ•™์œ„๋…ผ๋ฌธ (์„์‚ฌ)-- ์„œ์šธ๋Œ€ํ•™๊ต ๋Œ€ํ•™์› : ๊ธฐ๊ณ„ํ•ญ๊ณต๊ณตํ•™๋ถ€, 2014. 2. ๊ฐ•์‹ ํ˜•.์›์‹ฌ์••์ถ•๊ธฐ๋Š” ์ผ๋ฐ˜์ ์œผ๋กœ ํก์ž…๋œ ์œ ์ฒด์— ํšŒ์ „์šด๋™์œผ๋กœ ์šด๋™์—๋„ˆ์ง€๋ฅผ ๊ฐ€ํ•˜๋Š” ์ž„ํŽ ๋Ÿฌ์™€ ๊ณ ์†์˜ ์šด๋™์—๋„ˆ์ง€๋ฅผ ์••๋ ฅ์œผ๋กœ ๋ณ€ํ™˜ํ•˜๋Š” ๋””ํ“จ์ €, ๊ทธ๋ฆฌ๊ณ  ๋””ํ“จ์ €์—์„œ ๋‚˜์˜จ ๊ณ ์••์˜ ์œ ์ฒด๋ฅผ ๋‹ค๋ฅธ ์žฅ์น˜๋กœ ์ „๋‹ฌํ•˜๋Š” ๋ณผ๋ฃจํŠธ๋กœ ๊ตฌ์„ฑ๋˜์–ด ์žˆ๋‹ค. ์›์‹ฌ์••์ถ•๊ธฐ์˜ ์„ฑ๋Šฅ์„ ์ •ํ™•ํžˆ ์˜ˆ์ธกํ•˜๊ธฐ์— ์–ด๋ ค์›€์ด ์žˆ๋‹ค. ๋”ฐ๋ผ์„œ ์›์‹ฌ์••์ถ•๊ธฐ๋ฅผ ์„ค๊ณ„ํ•˜๊ณ , ์„ฑ๋Šฅ์„ ์˜ˆ์ธกํ•˜๋Š” ๋ฐฉ๋ฒ•์— ๋Œ€ํ•ด์„œ ๋งŽ์€ ์—ฐ๊ตฌ๊ฐ€ ์ง„ํ–‰๋˜์—ˆ๋‹ค(Colwill, 1979, Conrad, 1979, Oh, 1997, Came, 1998, Jang, 2009). ๋ณธ ์—ฐ๊ตฌ์—์„œ๋Š” ์ผ์ฐจ์›์ ์ธ ๋ฐฉ๋ฒ•์„ ์ด์šฉํ•˜์—ฌ ์••์ถ•๊ธฐ์˜ ์„ฑ๋Šฅ์„ ์˜ˆ์ธกํ•˜๊ณ , ์„ค๊ณ„ํ•˜๋Š” ๋ฐฉ๋ฒ•์— ๋Œ€ํ•˜์—ฌ ์—ฐ๊ตฌํ•˜์˜€๋‹ค. ์ด๋ฅผ ์œ„ํ•ด์„œ ์ ์ ˆํ•œ ๊ณ„์‚ฐ ๋ชจ๋ธ์„ ์„ ํƒํ•˜์˜€๊ณ , ํ•„์š”ํ•œ ๋ช‡ ๊ฐ€์ง€ ๋ณ€์ˆ˜๋“ค์— ๋Œ€ํ•ด์„œ๋Š” CFD๋ฅผ ์ด์šฉํ•œ ์ˆ˜์น˜๊ณ„์‚ฐ ๊ฒฐ๊ณผ๋ฅผ ๋ฐ”ํƒ•์œผ๋กœ ์ ์ ˆํ•˜๊ฒŒ ๊ฐ€์ •ํ•˜์˜€๋‹ค. ๋ณธ ์—ฐ๊ตฌ์˜ ์„ค๊ณ„๋ณ€์ˆ˜๋กœ๋Š” ์ž„ํŽ ๋Ÿฌ ์ž…๊ตฌ ์ƒ๋Œ€๋งˆํ•˜์ˆ˜, ์ถœ๊ตฌ ์œ ๋™๊ฐ๊ณผ ๋‚ ๊ฐœ๊ฐ, ๋””ํ“จ์ €์˜ ๋ฐ˜๊ฒฝ๋น„ ๊ทธ๋ฆฌ๊ณ  ๋ณผ๋ฃจํŠธ ์ถœ๊ตฌ ๋งˆํ•˜์ˆ˜๋กœ ์ •ํ•˜์˜€๋‹ค. ์ž„ํŽ ๋Ÿฌ ์ž…๊ตฌ์˜ ์ƒ๋Œ€๋งˆํ•˜์ˆ˜๋Š” ์ž„ํŽ ๋Ÿฌ ํšŒ์ „์†๋„์™€ ๊ด€๋ จ์ด ๊นŠ์œผ๋ฉฐ, ์ถœ๊ตฌ ์œ ๋™๊ฐ๊ณผ ๋‚ ๊ฐœ๊ฐ์€ ์ž„ํŽ ๋Ÿฌ๊ฐ€ ์ž‘๋™์œ ์ฒด์— ์ „๋‹ฌํ•˜๋Š” ์ผ์˜ ์–‘๊ณผ ๊ด€๋ จ์ด ๊นŠ๋‹ค. ๋˜ํ•œ, ๋””ํ“จ์ €์˜ ๋ฐ˜๊ฒฝ๋น„๋Š” ๋””ํ“จ์ € ๋‚ด๋ถ€์—์„œ ์†์‹ค๊ณผ ์••๋ ฅํšŒ๋ณต์— ์˜ํ–ฅ์„ ์ฃผ๋Š” ์ธ์ž์ด๋ฉฐ, ๋ณผ๋ฃจํŠธ ์ถœ๊ตฌ์˜ ๋งˆํ•˜์ˆ˜๋Š” ์ถœ๊ตฌ ๋ฉด์ ์„ ๊ฒฐ์ •ํ•˜๊ณ  ์†์‹ค์„ ๊ฒฐ์ •ํ•˜๋Š” ์—ญํ• ์„ ํ•œ๋‹ค. ์ž„ํŽ ๋Ÿฌ๋Š” Japikse(1996)๊ฐ€ ์ œ์•ˆํ•œ ๋‘ ์˜์—ญ ๋ชจ๋ธ๊ณผ ์ง๋ ฌ ๋‘ ์š”์†Œ ๋ชจ๋ธ์„ ์ด์šฉํ•˜์—ฌ ์„ฑ๋Šฅ ์˜ˆ์ธก ๋ฐ ์„ค๊ณ„ํ•˜์˜€๋‹ค. ๋””ํ“จ์ €๋Š” ๋ฒ ์ธ๋ฆฌ์Šค ๋””ํ“จ์ €๋กœ ํ•œ์ •ํ•˜์˜€์œผ๋ฉฐ, 4์ฐจ Runge-Kutta ๋ฒ•์„ ์ด์šฉํ•˜์—ฌ ๋ฐ˜๊ฒฝ๋น„์— ๋”ฐ๋ผ ์ง€๋ฐฐ๋ฐฉ์ •์‹(Dubitshy, 2008, Johnston, 1966)์„ ๊ณ„์‚ฐํ•˜์—ฌ ์„ฑ๋Šฅ์„ ์–ป์—ˆ๋‹ค. ๋ณผ๋ฃจํŠธ์˜ ์„ฑ๋Šฅ์€ ๋ฐ˜๊ฒฝ๋ฐฉํ–ฅ ์†์‹ค๊ณผ ์ž์˜ค๋ฉด๋ฐฉํ–ฅ ์†์‹ค์„ ๊ณ ๋ คํ•˜๋Š” Japikse(1996)๊ฐ€ ์ œ์•ˆํ•œ ๋ฐฉ๋ฒ•์„ ์ด์šฉํ•˜์—ฌ ์†์‹ค์„ ์˜ˆ์ธกํ•˜์˜€๋‹ค. ์ž„ํŽ ๋Ÿฌ ์ž…๊ตฌ์˜ ์ƒ๋Œ€๋งˆํ•˜์ˆ˜๊ฐ€ ์ปค์ง€๋ฉด ์ž„ํŽ ๋Ÿฌ์˜ ํšŒ์ „์ˆ˜๊ฐ€ ์ปค์ ธ ์ž‘์€ ์ž„ํŽ ๋Ÿฌ๋ฅผ ์„ค๊ณ„ํ•˜๊ฒŒ ๋˜์ง€๋งŒ, ์ž„ํŽ ๋Ÿฌ์˜ ํšจ์œจ์ด ๊ฐ์†Œํ•˜๋ฉด์„œ ์ „์ฒด ์›์‹ฌ์••์ถ•๊ธฐ์˜ ํšจ์œจ์ด ๋‚ฎ์•„์ง€๊ฒŒ ๋œ๋‹ค. ์ž„ํŽ ๋Ÿฌ ์ถœ๊ตฌ์˜ ์œ ๋™๊ฐ์„ ์ฆ๊ฐ€์‹œํ‚ฌ ๊ฒฝ์šฐ, ์ž‘๋™์œ ์ฒด์— ์ „๋‹ฌํ•˜๋Š” ์ผ์˜ ์–‘์ด ์ปค์ง€๊ฒŒ ๋˜์–ด ์ถœ๊ตฌ ๋ฐ˜๊ฒฝ์ด ์ž‘์€ ์ž„ํŽ ๋Ÿฌ๋ฅผ ์„ค๊ณ„ํ•  ์ˆ˜ ์žˆ๋‹ค. ํ•˜์ง€๋งŒ ๋‚ ๊ฐœ๊ฐ์„ ์ฆ๊ฐ€์‹œํ‚ฌ ๊ฒฝ์šฐ, ์ผ์˜ ์–‘์ด ์ž‘์•„์ ธ ์ถœ๊ตฌ ๋ฐ˜๊ฒฝ์ด ํฐ ์ž„ํŽ ๋Ÿฌ๋ฅผ ์„ค๊ณ„ํ•˜๊ฒŒ ๋œ๋‹ค. ๋””ํ“จ์ € ๋ฐ˜๊ฒฝ๋น„๋ฅผ ํฌ๊ฒŒ ์„ ํƒํ•˜๋Š” ๊ฒฝ์šฐ, ์••์ถ•๊ธฐ์˜ ์ „์ฒด ํฌ๊ธฐ๋Š” ์ปค์ง€์ง€๋งŒ ๋””ํ“จ์ €์—์„œ ์••๋ ฅํšŒ๋ณต์ด ์ปค์ง€๊ณ , ๋ณผ๋ฃจํŠธ์—์„œ ์†์‹ค์ด ์ค„์–ด๋“ค๊ฒŒ ๋˜์–ด ์ „์ฒด ์„ฑ๋Šฅ์ด ํ–ฅ์ƒ๋œ๋‹ค. ๋ณผ๋ฃจํŠธ ์ถœ๊ตฌ์˜ ๋งˆํ•˜์ˆ˜๊ฐ€ ์ž‘์•„์ง€๋ฉด, ์ถœ๊ตฌ ๋ฉด์ ์ด ๋„“์–ด์ง€๊ณ , ๋ณผ๋ฃจํŠธ ์ž…์ถœ๊ตฌ ์‚ฌ์ด์˜ ๋ฉด์ ๋น„๊ฐ€ ๋ณ€ํ•˜์—ฌ ์†์‹ค์ด ์ปค์ง€๊ณ  ์ „์ฒด ์„ฑ๋Šฅ์ด ๋‚ฎ์•„์ง„๋‹ค. ์›์‹ฌ์••์ถ•๊ธฐ ์„ค๊ณ„ ๊ฒฐ๊ณผ, ์••์ถ•๊ธฐ์˜ ์„ฑ๋Šฅ์ด ๋†’์•„์ง€๋Š” ์„ค๊ณ„์™€ ํฌ๊ธฐ๊ฐ€ ์ž‘์•„์ง€๋Š” ์„ค๊ณ„๊ฐ€ ์ƒ๋ฐ˜๋˜๋Š” ๊ฒฐ๊ณผ๋ฅผ ๊ฐ€์ ธ์˜ค๊ธฐ๋„ ํ•˜์˜€๋‹ค. ๋”ฐ๋ผ์„œ ์ดˆ๊ธฐ ์„ค๊ณ„์— ์žˆ์–ด ์„ค๊ณ„์ž์˜ ์—ญํ• ์ด ์ค‘์š”ํ•˜๋‹ค. ์–ด๋– ํ•œ ์„ค๊ณ„ ๋ณ€์ˆ˜์— ๊ฐ€์ค‘์น˜๋ฅผ ๋†’๊ฒŒ ํ‰๊ฐ€ํ•˜์—ฌ ์ดˆ๊ธฐ ์„ค๊ณ„๋ฅผ ๊ฒฐ์ •ํ•˜๋Š”๊ฐ€์— ๋”ฐ๋ผ ์›์‹ฌ์••์ถ•๊ธฐ ์„ค๊ณ„ ๊ฒฐ๊ณผ๊ฐ€ ๋‹ค๋ฅด๊ฒŒ ๋‚˜ํƒ€๋‚  ๊ฒƒ์ด๋‹ค. ๋”ฐ๋ผ์„œ ์ดˆ๊ธฐ ์„ค๊ณ„ ๋‹จ๊ณ„์—์„œ๋ถ€ํ„ฐ ์„ค๊ณ„์— ๊ณ ๋ คํ• ๋งŒํ•œ ๋ณ€์ˆ˜๋“ค์— ๋Œ€ํ•˜์—ฌ ๊ฐ๊ด€์ ์ธ ๋ฐฉ๋ฒ•์œผ๋กœ ์„ค๊ณ„ํ•  ํ•„์š”์„ฑ์ด ์žˆ๋‹ค. ๋”์šฑ์ด ์›์‹ฌ์••์ถ•๊ธฐ๋Š” ์‚ฐ์—…์šฉ์œผ๋กœ ์‚ฌ์šฉ๋  ๋ฟ๋งŒ ์•„๋‹ˆ๋ผ ํ•ญ๊ณต์šฐ์ฃผ, ๊ตฐ์‚ฌ ๋“ฑ์˜ ํŠน์ˆ˜ํ•œ ๋ถ„์•ผ์—์„œ๋ถ€ํ„ฐ ๊ฐ€์ „, ์ž๋™์ฐจ ๋“ฑ์˜ ์ƒํ™œ๊ณผ ๋ฐ€์ ‘ํ•œ ๋ถ„์•ผ์—๊นŒ์ง€ ๊ทธ ์“ฐ์ž„์ƒˆ๊ฐ€ ํ™•๋Œ€๋˜๊ณ  ์žˆ๊ธฐ ๋•Œ๋ฌธ์— ์ „ํ†ต์ ์œผ๋กœ ๊ฐ•์กฐ๋˜์–ด์™”๋˜ ํšจ์œจ๋ฟ๋งŒ ์•„๋‹ˆ๋ผ ์••์ถ•๊ธฐ์˜ ํฌ๊ธฐ ๋˜ํ•œ ์„ค๊ณ„ ๊ณผ์ •์—์„œ ๊ณ ๋ คํ•ด์•ผํ•œ๋‹ค. ๋ณธ ์—ฐ๊ตฌ์—์„œ๋Š” ์›์‹ฌ์••์ถ•๊ธฐ์˜ ์ดˆ๊ธฐ ์„ค๊ณ„ ๊ณผ์ •์— ์žˆ์–ด์„œ ์ผ์ฐจ์›์ ์ธ ์„ค๊ณ„ ๊ฒฐ๊ณผ๋ฅผ ๋ฐ”ํƒ•์œผ๋กœ ํšจ์œจ๊ณผ ํฌ๊ธฐ๋ฅผ ๊ณ ๋ คํ•œ ์ตœ์ ์„ค๊ณ„๋ฅผ ์ œ์‹œํ•˜์—ฌ ์ดˆ๊ธฐ ์„ค๊ณ„ ๋‹จ๊ณ„์—์„œ ๊ฐ๊ด€์ ์ธ ์ตœ์ ํ™” ์„ค๊ณ„๋ฅผ ์ œ์‹œํ•˜์˜€๋‹ค. ์›์‹ฌ์••์ถ•๊ธฐ์˜ ์ตœ์ ํ™”์— ๋Œ€ํ•˜์—ฌ ๋งŽ์€ ์—ฐ๊ตฌ๊ฐ€ ์ง„ํ–‰๋˜์–ด์™”๋‹ค(Lee, 2007, Ha, 2011,). ํ•˜์ง€๋งŒ ์ž„ํŽ ๋Ÿฌ์˜ ํ˜•์ƒ์„ ์ตœ์ ํ™”ํ•˜๋Š”๋ฐ๋งŒ ์ดˆ์ ์ด ๋งž์ถฐ์ ธ์žˆ๋‹ค. ๋”ฐ๋ผ์„œ ๋ณธ ์—ฐ๊ตฌ์—์„œ๋Š” ์›์‹ฌ์••์ถ•๊ธฐ ์ „์ฒด์˜ ์ผ์ฐจ์›์ ์ธ ํ˜•์ƒ์— ๋Œ€ํ•œ ์ตœ์ ํ™”๋ฅผ ์ง„ํ–‰ํ•˜์˜€๋‹ค. ์ตœ์ ํ™”์˜ ๋ณ€์ˆ˜๋กœ๋Š” ์ž„ํŽ ๋Ÿฌ ์ž…๊ตฌ ์ƒ๋Œ€๋งˆํ•˜์ˆ˜, ์ถœ๊ตฌ ์œ ๋™๊ฐ๊ณผ ๋‚ ๊ฐœ๊ฐ ๊ทธ๋ฆฌ๊ณ  ๋””ํ“จ์ €์˜ ๋ฐ˜๊ฒฝ๋น„๋กœ ์ •ํ•˜์˜€๊ณ , ์ตœ์ ํ™”์˜ ๋ฐฉ๋ฒ•์œผ๋กœ๋Š” ๊ณต๊ฐ„์ž๋ฃŒ์˜ ์˜ˆ์ธก ๋ฐฉ๋ฒ•์ธ ํฌ๋ฆฌ๊น…์„ ํ™œ์šฉํ•˜์˜€๋‹ค. ์ตœ์ ํ™”์— ํ•„์š”ํ•œ ํ‘œ๋ณธ์€ ์‹คํ—˜์„ค๊ณ„๋ฒ•์— ๋”ฐ๋ผ ๊ฒฐ์ •ํ•˜์˜€๊ณ , ์„ค๊ณ„๊ณต๊ฐ„์—์„œ ๋ชฉ์ ํ•จ์ˆ˜๋ฅผ ์ตœ์†Œ๋กœ ๊ฐ€์ง€๋Š” ์œ„์น˜๋ฅผ ์ฐพ๊ธฐ ์œ„ํ•ด์„œ ํŒจํ„ดํƒ์ƒ‰๋ฒ•์„ ์ด์šฉํ•˜์˜€๋‹ค. ํšจ์œจ๊ณผ ํฌ๊ธฐ์— ๋Œ€ํ•œ ๊ฐ€์ค‘์น˜๋ฅผ ๋‹ค์–‘ํ•˜๊ฒŒ ์ ์šฉํ•˜์—ฌ ๊ณ ๋ คํ•˜๋Š” ๊ฐ€์ค‘์น˜์— ๋”ฐ๋ผ ์„ค๊ณ„ ๋ณ€ํ™”๋ฅผ ๊ด€์ฐฐํ•˜์˜€๋‹ค. ํšจ์œจ์„ ๊ณ ๋ คํ• ์ˆ˜๋ก ์ž„ํŽ ๋Ÿฌ์˜ ํšŒ์ „ ์†๋„๋Š” ๋Š๋ ค์ง€๊ณ , ์ž„ํŽ ๋Ÿฌ ์ถœ๊ตฌ ๋‚ ๊ฐœ๊ฐ์ด ์ปค์ง€๋Š” ๊ฒƒ์„ ํ™•์ธํ•  ์ˆ˜ ์žˆ์—ˆ๋‹ค. ๋””ํ“จ์ €์˜ ๋ฐ˜๊ฒฝ๋น„๋Š” ๋Œ€๋ถ€๋ถ„์˜ ๊ฒฝ์šฐ์—์„œ 1.8~1.9์‚ฌ์ด์˜ ๊ฐ’์œผ๋กœ ๊ฒฐ์ •๋˜๋Š” ๊ฒƒ์„ ํ™•์ธํ•˜์˜€๋Š”๋ฐ, ๊ทธ ์ด์œ ๋Š” ์งง์€ ๋””ํ“จ์ €์˜ ๊ฒฝ์šฐ์— ๋ณผ๋ฃจํŠธ ์†์‹ค์ด ์ฆ๊ฐ€ํ•˜๊ธฐ ๋•Œ๋ฌธ์œผ๋กœ ๋‚˜ํƒ€๋‚ฌ๋‹ค. ๋˜ํ•œ, ์ž„ํŽ ๋Ÿฌ ์ถœ๊ตฌ ์œ ๋™๊ฐ์€ ์ƒ๋Œ€๋งˆํ•˜์ˆ˜ ๋ณ€ํ™”์— ์˜ํ•ด ์••์ถ•๊ธฐ ์ „์ฒด ํšจ์œจ์— ๋ฏธ์น˜๋Š” ์˜ํ–ฅ๋ ฅ์ด ๋‹ฌ๋ผ์ง€๋Š” ๊ฒƒ์„ ํ™•์ธํ•  ์ˆ˜ ์žˆ์—ˆ๋‹ค.์š” ์•ฝ i ๋ชฉ ์ฐจ v List of Tables vii List of Figures viii Nomenclature xii 1. ์„œ ๋ก  1 1.1 ์—ฐ๊ตฌ ๋ฐฐ๊ฒฝ 1 1.2 ์—ฐ๊ตฌ ๋™๊ธฐ ๋ฐ ๋ชฉ์  2 2. ์›์‹ฌ์••์ถ•๊ธฐ ์„ค๊ณ„ ํ”„๋กœ๊ทธ๋žจ 3 2.1 ํ”„๋กœ๊ทธ๋žจ ์„ค๋ช… 3 2.2 ์ž„ํŽ ๋Ÿฌ ์„ค๊ณ„ ๋ฐ ์„ฑ๋Šฅ ์˜ˆ์ธก ๋ฐฉ๋ฒ• 5 2.2.1 ์ง๋ ฌ ๋‘ ์š”์†Œ ๋ชจ๋ธ(TEIS Model) 6 2.2.2 ๋‘ ์˜์—ญ ๋ชจ๋ธ(Two-Zone Model) 7 2.3 ๋ฒ ์ธ๋ฆฌ์Šค ๋””ํ“จ์ € ์„ฑ๋Šฅ ์˜ˆ์ธก ๋ฐฉ๋ฒ• 9 2.4 ๋ณผ๋ฃจํŠธ ์„ฑ๋Šฅ ์˜ˆ์ธก ๋ฐฉ๋ฒ• 11 3. ์„ค๊ณ„ ํ”„๋กœ๊ทธ๋žจ ๊ฒ€์ฆ 18 3.1 ์„ค๊ณ„ ํ”„๋กœ๊ทธ๋žจ ๊ฒ€์ฆ ๋ฐฉ๋ฒ• 18 3.2 ์ˆ˜์น˜ ํ•ด์„ ๋ฐ ๊ฒฐ๊ณผ 18 3.3 ์„ค๊ณ„ ๊ฒฐ๊ณผ ๊ฒ€์ฆ 20 4. ์„ค๊ณ„ ๊ฒฝํ–ฅ ๋ถ„์„ 26 4.1 ์ž„ํŽ ๋Ÿฌ ์ž…๊ตฌ ์ƒ๋Œ€๋งˆํ•˜์ˆ˜ 26 4.2 ์ž„ํŽ ๋Ÿฌ ์ถœ๊ตฌ ์œ ๋™๊ฐ 28 4.3 ์ž„ํŽ ๋Ÿฌ ์ถœ๊ตฌ ๋‚ ๊ฐœ๊ฐ 29 4.4 ๋””ํ“จ์ € ๋ฐ˜๊ฒฝ๋น„ 30 4.5 ๋ณผ๋ฃจํŠธ ์ถœ๊ตฌ ๋งˆํ•˜์ˆ˜ 30 5. ์ตœ์  ์„ค๊ณ„ 44 5.1 ์ตœ์  ์„ค๊ณ„ ๋ฐฉ๋ฒ• 44 5.2 ํฌ๋ฆฌ๊น…(Kriging) 46 5.2.1 ๋ฒ ๋ฆฌ์˜ค๊ทธ๋žจ(Veriogram) 47 5.3 ํŒจํ„ดํƒ์ƒ‰๋ฒ•(Pattern Search Method) 49 6. ์ตœ์  ์„ค๊ณ„ ๊ฒฐ๊ณผ 56 7. ๊ฒฐ ๋ก  61 ์ฐธ๊ณ ๋ฌธํ—Œ 63 ๋ถ€ ๋ก 67 Abstract 86Maste

    RF ์Šคํผํ„ฐ ๊ณต๋ฒ•์„ ์ด์šฉํ•˜์—ฌ ์ฆ์ฐฉํ•œ Hf0.5Zr0.5O2 ๋ฐ•๋ง‰์˜ ๊ฐ•์œ ์ „์„ฑ ํ™•์ธ ๋ฐ ์›์ธ ๋ถ„์„

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    ํ•™์œ„๋…ผ๋ฌธ (์„์‚ฌ)-- ์„œ์šธ๋Œ€ํ•™๊ต ๋Œ€ํ•™์› : ์žฌ๋ฃŒ๊ณตํ•™๋ถ€, 2016. 8. ํ™ฉ์ฒ ์„ฑ.HfO2 ๋ฌผ์งˆ์˜ ๊ฐ•์œ ์ „์„ฑ์„ ์ด์šฉํ•œ ๋‹ค์–‘ํ•œ device application ๋“ค์ด ์žˆ๋‹ค. ๊ธด ์—ญ์‚ฌ๋ฅผ ๊ฐ–๋Š” FeRAM ์„ ์„œ๋‘๋กœ transistor์—์„œ ํ™œ์šฉ๋˜๋Š” FeFET ์ด๋‚˜ capacitance boost ๋ฅผ ์•ผ๊ธฐํ•˜๋Š” Negative Capacitance Effect, ๋˜๋Š” ํ„ฐ๋„๋ง์„ ์ด์šฉํ•œ Ferrolectric Tunnel Junction ๋“ฑ์ด ์žˆ๋‹ค. HfO2 ๋ฌผ์งˆ์—์„œ ๊ฐ•์œ ์ „์„ฑ์„ ๋‚˜ํƒ€๋‚ด๋Š” ์š”์ธ์œผ๋กœ ๋น„๋Œ€์นญ์ ์ธ orthorhombic phase (Pca21) ํ˜•์„ฑ์„ ์ด์œ ๋กœ ๋“ค ์ˆ˜ ์žˆ๋‹ค. ์ผ๋ฐ˜์ ์œผ๋กœ ์ƒ์œ ์ „์ฒด ์ƒ์ธ monoclinic, tetragonal, cubic phase ์™€๋Š” ๋‹ฌ๋ฆฌ ์ด๋Ÿฐ orthorhombic phase ๊ฐ€ ํ˜•์„ฑ๋˜๊ธฐ ์œ„ํ•ด์„œ๋Š” ํŠน์ • ์กฐ๊ฑด์ด ๊ฐ–์ถ”์–ด์ ธ์•ผ ํ•˜๋Š”๋ฐ ์™ธ๋ถ€์ ์ธ ์š”์ธ, ์ฆ‰ quenching ์œผ๋กœ ์ธํ•œ stress๋‚˜ doping ์ด ๊ฐ€ํ•ด์งˆ ๋•Œ tetragonal phase ์—์„œ orthorhombic phase ๋กœ ์ƒ์ „์ด๋ฅผ ์ผ์œผํ‚ฌ ์ˆ˜ ์žˆ๋‹ค. ๋ฐ•๋ง‰์—์„œ orthorhombic phase๋ฅผ ์ข€ ๋” ์•ˆ์ •ํ™” ์‹œํ‚ค๋Š” ์š”์ธ์œผ๋กœ๋Š” ์—ฌ๋Ÿฌ ๊ฐ€์ง€๊ฐ€ ์žˆ๋Š”๋ฐ grain size ๋กœ ์ธํ•œ surface energy effect, oxygen vacancy contribution, ๊ทธ๋ฆฌ๊ณ  ๋ฌผ๋ฆฌ์ ์ธ stress ๋“ฑ์„ ์ค‘์š” ๋ณ€์ˆ˜๋กœ ์ƒ๊ฐ ํ•˜์˜€๊ณ  RF sputtering ๊ณต๋ฒ•์„ ์ด์šฉํ•˜์—ฌ ์ด๋Ÿฐ ๋ณ€์ˆ˜๋“ค์„ ์กฐ์ ˆ ํ•  ์ˆ˜ ์žˆ์„ ๋•Œ ๊ฐ€์žฅ ์ด์ƒ์ ์ธ HfO2 ๋ฐ•๋ง‰์„ ๋งŒ๋“ค ์ˆ˜ ์žˆ์„ ๊ฒƒ์ด๋‹ค. ๋งŽ์€ dopant๋ฅผ ์ด์šฉํ•ด ๋งŒ๋“  ๋ฐ•๋ง‰์— ๋Œ€ํ•œ ๋ฌธํ—Œ๋“ค์ด ๋งŽ์ด ์žˆ์—ˆ์ง€๋งŒ ์กฐ์„ฑ ๋ฒ”์œ„๊ฐ€ ๋„“์€ Zr์„ dopant๋กœ ์‚ฌ์šฉํ•˜์˜€๊ณ  ๋ฐ•๋ง‰ ๋‘๊ป˜๊ฐ€ ~10nm ์ผ ๋•Œ ๊ฐ€์žฅ ์ข‹์€ ํŠน์„ฑ์„ ๋ณด์—ฌ์ค€ ๋ฌธํ—Œ ์—ฐ๊ตฌ๋ฅผ ํ† ๋Œ€๋กœ ์‹คํ—˜ํ•˜์˜€๋‹ค. RF sputter ์‚ฌ์šฉ ์‹œ ๋งŽ์€ ๊ณต์ • ๋ณ€์ˆ˜๋“ค์ด ์žˆ๋Š”๋ฐ ํฌ๊ฒŒ ๋ฐ•๋ง‰ ์ฆ์ฐฉ ์‹œ ๊ณต์ • ๋ณ€์ˆ˜์™€ ์—ด์ฒ˜๋ฆฌ ์‹œ ๊ณต์ • ๋ณ€์ˆ˜๋ฅผ ๋‚˜๋ˆ„์—ˆ๋‹ค. ๋˜ํ•œ ๊ฐ๊ฐ์˜ ๋ณ€์ˆ˜๋ฅผ ํฌ๊ฒŒ ์„ธ ๋ฒ”์œ„๋กœ ๋‚˜๋ˆ  ๊ฐ€์žฅ ์ข‹์€ ์ฆ์ฐฉ ์กฐ๊ฑด์„ ํ˜•์„ฑ ํ•˜์˜€๋‹ค. 135W/190W = HfO2/ZrO2 ์˜ ๋†’์€ ํŒŒ์›Œ๋ฅผ ์‚ฌ์šฉํ•˜์—ฌ ๊ณต์ • ์••๋ ฅ์€ ๊ฐ€์žฅ ๋‚ฎ์€ 1mtorr๋กœ ๊ณ ์ • ์‹œํ‚ค๊ณ  ์‚ฐ์†Œ ๋ถ„์••์„ 3.3%, 2.5%, 1.67%, ๊ทธ๋ฆฌ๊ณ  0%๋กœ ๋‚˜๋ˆ„์–ด ์‹คํ—˜์„ ์ง„ํ–‰ํ•˜์˜€๊ณ  deposition rate ๊ฐ€ ํŒ์ดํ•˜๊ฒŒ ๋‹ฌ๋ผ์„œ grain size ์— ์˜ํ–ฅ์„ ์ฃผ์—ˆ๋‹ค. ๊ฒฐ๊ณผ์ ์œผ๋กœ grain size ๊ฐ€ ์ž‘์„ ๋•Œ surface energy effect ํšจ๊ณผ์— ์˜ํ•ด์„œ monoclinic phase ๊ฐ€ ๋ถˆ์•ˆ์ •ํ•˜๊ฒŒ ํ˜•์„ฑ๋˜๊ณ  ์ด๊ฒƒ์ด Zr ์ด ๋„ํ•‘๋œ HfO2 ๋ฐ•๋ง‰์˜ ๊ฐ•์œ ์ „์„ฑ ๊ตฌํ˜„์— ์˜ํ–ฅ์„ ์ฃผ์—ˆ๋‹ค. ๋˜ํ•œ in-plane strain ์„ ๊ณ„์‚ฐํ•œ ๊ฒฐ๊ณผ orthorhombic phase ํ˜•์„ฑ์— ์˜ํ–ฅ์„ ๋ฏธ์น˜์ง€ ์•Š์„ ์ •๋„๋กœ ํฐ strain ์ด ๊ฑธ๋ฆฌ๋Š” ๊ฒƒ์„ ํ™•์ธ ํ•˜์˜€๊ณ  ์‚ฐ์†Œ ์—ด์ฒ˜๋ฆฌ ์ „ ํ›„ XPS ๊ฒฐ๊ณผ๋ฅผ ํ™•์ธ ํ•ด ๋ณธ ๊ฒฐ๊ณผ ์—ด์ฒ˜๋ฆฌ ํ›„ ๋ฐ•๋ง‰์˜ oxygen vacancy ์–‘์ด ๋ฏธ๋ฏธํ•˜๊ฒŒ ์žˆ์„์ง€๋Š” ๋ชจ๋ฅด๋‚˜ ๊ทธ ์ฐจ์ด๋Š” ํฌ์ง€ ์•Š์€ ๊ฒƒ์œผ๋กœ ํŒ๋‹จ ํ•˜์˜€๋‹ค. ๋”ฐ๋ผ์„œ grain size๋กœ ์ธํ•œ surface energy effect ๋ฐ stress๊ฐ€ ๊ฐ€์žฅ ํฐ ์˜ํ–ฅ์„ ์ค€ ๋ณ€์ˆ˜๋กœ ์ƒ๊ฐ์ด ๋˜๊ณ  ๋ˆ„์„ค์ „๋ฅ˜ ํŠน์„ฑ์„ ๊ณ ๋ ค ํ•˜์˜€์„ ๋•Œ HfO2/ZrO2 ํŒŒ์›Œ 135/190W, ์‚ฐ์†Œ๋ถ„์•• 1.67%, ๊ณต์ •์••๋ ฅ 1mtorr, ๊ทธ๋ฆฌ๊ณ  ์‚ฐ์†Œ ์—ด์ฒ˜๋ฆฌ๋ฅผ 600oC์—์„œ 1๋ถ„๋™์•ˆ ํ•˜์˜€์„ ๋•Œ ~20ฮผc/cm2 ์— ๊ฐ€๊นŒ์šด 2Pr ๊ฐ’์„ ํ™•๋ณด ํ•˜์˜€๋‹ค.HfO2 is a dielectric material with a high dielectric constant, which provides an opportunity to replace the conventional Si as a gate dielectric material. Unlike conventional ferroelectrics with a perovskite structure, HfO2 shows unprecedented ferroelectric behavior that arises from a non-symmetric orthorhombic lattice structure when doped by various dopants. Such behavior has been experimentally shown when deposited as a thin film by various deposition method, including atomic layer deposition, pulsed laser deposition, sol-gel method, to name a few. It is expected that only under certain condition does HfO2 show ferroelectricity, and thus it is necessary to compare different deposition mechanisms and utilize the difference and experimental results to fully understand the atomic scale behavior of ferroelectricity within HfO2. In this paper, HfO2 was deposited using a RF sputtering method with Zr as a dopant. RF sputtering method is more favorable than atomic layer deposition method in terms of the cost and the deposition time. Since sputtering imposes stress on the film upon deposition process which could likely act as a driving force for the realization of the non-symmetric lattice structure, it is expected to provide optimum condition for phase transition. Also, Zr possesses similar chemical characteristic with similar size as Hf, which could lead to a favorable electrical behavior. HfO2 and ZrO2 oxide targets were co-sputtered simultaneously to fully provide the proper stoichiometry with O2 reactive gas to avoid oxygen deficiency within the film. The deposition conditions were varied with respect to reactive gas flow amount, power, working pressure, and annealing temperature. Zr doped HfO2 showed different switching behavior and the deposition condition was optimized to result in the best ferroelectric behavior. To fully understand how such condition could affect the ferroelectric behavior, structural analysis and chemical analysis were conducted. As a result, the optimized condition for 10nm Zr doped HfO2 using RF sputtering method was 130W and 195W for ZrO2 and HfO2 target power, respectively, with 1.33% of O2 reactive gas and 600oC annealing temperature for 1 minute under O2 ambience. Different ferroelectric behavior is believed to result from grain size difference and oxygen vacancy concentration.1. Introduction 11 2. Literature 14 2.1. Sputter Deposition Technique 14 2.2. Conventional Ferroelectric Materials 18 2.3. Properties of doped HfO2 and (Hf:Zr)O2 21 2.4. Other Factors to Influence the Ferroelectricity 27 3. Experimental 34 3.1. Oxide targets co-sputtering of thin (Hf:Zr)O2 film 34 3.2. Electrical Measurement and Structural Analysis 36 4. Experimental Results and Discussions 37 4.1. Realization of Ferroelectricity of Sputtered HZO film 37 4.2. Structural Analysis 45 4.3. Electrical Property 53 4.4. Morphology 66 4.5. Chemical Analysis 75 5. Conclusion 81 Reference 83 List of publications 84 Abstract (in Korean) 86Maste

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    ํ•™์œ„๋…ผ๋ฌธ(๋ฐ•์‚ฌ)--์„œ์šธ๋Œ€ํ•™๊ต ๋Œ€ํ•™์› :๊ธฐ๊ณ„์„ค๊ณ„ํ•™๊ณผ,1997.Docto

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    ํ•™์œ„๋…ผ๋ฌธ(์„์‚ฌ)--์„œ์šธ๋Œ€ํ•™๊ต ๋Œ€ํ•™์› :์ฒ ํ•™๊ณผ ์„œ์–‘์ฒ ํ•™์ „๊ณต,1998.Maste

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    ํ•™์œ„๋…ผ๋ฌธ(๋ฐ•์‚ฌ)--์„œ์šธ๋Œ€ํ•™๊ต ๋Œ€ํ•™์› :ํ–‰์ •ํ•™๊ณผ,2008.2.Docto
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