Design for manufacturing (DFM) in submicron VLSI design

As VLSI technology scales to 65nm and below, traditional communication between design and manufacturing becomes more and more inadequate. Gone are the days when designers simply pass the design GDSII file to the foundry and expect very good man¬ufacturing and parametric yield. This is largely due to the enormous challenges in the manufacturing stage as the feature size continues to shrink. Thus, the idea of DFM (Design for Manufacturing) is getting very popular. Even though there is no universally accepted definition of DFM, in my opinion, one of the major parts of DFM is to bring manufacturing information into the design stage in a way that is understood by designers. Consequently, designers can act on the information to improve both manufacturing and parametric yield. In this dissertation, I will present several attempts to reduce the gap between design and manufacturing communities: Alt-PSM aware standard cell designs, printability improve¬ment for detailed routing and the ASIC design flow with litho aware static timing analysis. Experiment results show that we can greatly improve the manufacturability of the designs and we can reduce design pessimism significantly for easier design closure

Theory and Algorithm of Local-Refinement Based Optimization with Application to Device and Interconnect Sizing

In this paper we formulate three classes of optimization problems: the simple, monotonically-constrained, and bounded CH-programs. We reveal the dominance property under the local refinement (LR) operation for the simple CH-program, as well as the general dominance property under the pseudo-LR operation for the monotonically-constrained CH-program and the extended-LR operation for the bounded CH-program. These properties enable a very efficient polynomial-time algorithm, using different types of LR operations to compute tight lower and upper bounds of the exact solution to any CH-program. We show that the algorithm is capable of solving many layout optimization problems in deep submicron IC and/or high-performance MCM/PCB designs. In particular, we apply..