Durable antistatic coating for polymethylmethacrylate

A durable antistatic coating is achieved on polymethylmethacrylate plastic without affecting its optical clarity by applying to the surface of the plastic a low molecular weight solvent having a high electron affinity and a high dipole moment, such as acentonitrile or nitromethane alone or in the presence of photopolymerizable monomer. The treated polymethylmethacrylate plastic dissipates most of the induced electrostatic charge and retains its optical clarity. The antistatic behavior persists after washing, rubbing and vacuum treatment

A parallel-plate flow chamber to study initial cell adhesion on a nanofeatured surface

Cells in the human body come across many types of information, which they respond to. Both material chemistry and topography of the surface where they adhere have an effect on cell shape, proliferation, migration, and gene expression. It is possible to create surfaces with topography at the nanometric scale to allow observation of cell-topography interactions. Previous work has shown that 100-nm-diameter pits on a 300-nm pitch can have a marked effect in reducing the adhesion of rat fibroblasts in static cultures. In the present study, a flow of cell suspension was used to investigate cell adhesion onto nanopits in dynamic conditions, by means of a parallel-plate flow chamber. A flow chamber with inner nanotopography has been designed, which allows real-time observation of the flow over the nanopits. A nanopitted pattern was successfully embossed into polymethylmethacrylate to meet the required shape of the chamber. Dynamic cell adhesion after 1 h has been quantified and compared on flat and nanopitted polymethylmethacrylate substrates. The nanopits were seen to be significantly less adhesive than the flat substrates (p<0.001), which is coherent with previous observations of static cultures

Recent advances in low-temperature deposition methods of transparent, photocatalytic TiO2 coatings on polymers

In this paper, we present an overview as well as current advances in the low-temperature deposition of highly crystalline suspensions of titania nanoparticles on polymers for photocatalytic applications. The presence of preformed titania nanoparticles yields the possibility of producing photocatalytically active coatings at reduced temperatures. Transparent and photocatalytically active TiO2 coatings that degrade organic matter, have been widely applied to bestow self-cleaning properties onto surfaces. This low-temperature deposition method and its transition to polymers would open an entire array of possible self-cleaning applications. During this research, incorporation of a silica buffer layer was applied to improve the compatibility of the inorganic coating on a substrate, such as polymethylmethacrylate (PMMA) and polyphenylsulphone (PPSU). The photocatalytic activity of the obtained coating was analyzed for its photocatalytic abilities by evaluating the color removal of a dye solution (methylene blue, MB) under UV irradiation and compared with commercial Pilkington Activ (R) self-cleaning glass. Our results indicate that the titania-coated silica-polymer systems yield a higher photocatalytic activity towards the degradation of organic pollutants. This method proves that the deposition of highly crystalline anatase suspensions on silica buffer layers is a viable method to produce photocatalytic coatings on heat-sensitive substrates

Fabrication of Switches on Polymer-Based by Hot Embossing

In MEMS technology, most of the devices are fabricated on glass or silicon substrate. However, this research presents a novel manufacture method that is derived from conventional hot embossing technology to fabricate the electrostatic switches on polymer material. The procedures of fabrication involve the metal deposition, photolithography, electroplating, hot embossing and hot embed techniques. The fundamental concept of the hot embed technology is that the temperature should be increased above Tg of polymer, and the polymer becomes plastic and viscous and could be molded. According to the fundamental concept, the metal layer on the silicon/glass substrate could be embedded into polymer material during the hot embossing process. Afterward, the metal layer is bonded together with the polymer after removing the substrate in the de-embossing step. Finally, the electrostatic switch is fabricated on polymethylmethacrylate(PMMA) material to demonstrate the novel method.Comment: Submitted on behalf of TIMA Editions (http://irevues.inist.fr/tima-editions

Test of mode-division multiplexing and demultiplexing in free-space with diffractive transformation optics

open5openGIANLUCA RUFFATO, 1; FILIPPO ROMANATO, ; 1Department of Physics and Astronomy ‘G. Galilei’, University of Padova; 2Laboratory for Nanofabrication of Nanodevices, c.so Stati Uniti 4GIANLUCA RUFFATO, 1; Romanato, Filippo; Ruffato, Gianluca; Astronomy ‘. G. Galilei’, University of Padova; 2Laboratory for Nanofabrication of Nanodevices, c. so Stati Uniti

Quantitative flaw characterization with scanning laser acoustic microscopy

Surface roughness and diffraction are two factors that have been observed to affect the accuracy of flaw characterization with scanning laser acoustic microscopy. In accuracies can arise when the surface of the test sample is acoustically rough. It is shown that, in this case, Snell's law is no longer valid for determining the direction of sound propagation within the sample. The relationship between the direction of sound propagation within the sample, the apparent flaw depth, and the sample's surface roughness is investigated. Diffraction effects can mask the acoustic images of minute flaws and make it difficult to establish their size, depth, and other characteristics. It is shown that for Fraunhofer diffraction conditions the acoustic image of a subsurface defect corresponds to a two-dimensional Fourier transform. Transforms based on simulated flaws are used to infer the size and shape of the actual flaw

Fabrication of photonic band-gap crystals

We describe the fabrication of three-dimensional photonic crystals using a reproducible and reliable procedure consisting of electron beam lithography followed by a sequence of dry etching steps. Careful fabrication has enabled us to define photonic crystals with 280 nm holes defined with 350 nm center to center spacings in GaAsP and GaAs epilayers. We construct these photonic crystals by transferring a submicron pattern of holes from 70-nm-thick polymethylmethacrylate resist layers into 300-nm-thick silicon dioxide ion etch masks, and then anisotropically angle etching the III-V semiconductor material using this mask. Here, we show the procedure used to generate photonic crystals with up to four lattice periods depth