Outlook for potential third-generation immersion fluids

In a search for alkane candidates for 193 nm immersion fluids, several alkanes and cycloalkanes were synthesized, purified and screened to ascertain their absorption at 193 nm, refractive index and temperature dispersion coefficient in the context of the actual application. In general, cycloalkanes, and more specifically polycycloalkanes, possess a higher refractive index than do linear alkanes. Decalin, cyclodecane, perhydrophenanthreme (PHP), perhydrofluorene (PHF) and perhydropyrene (PHPY) are examined as potential second and third generation immersion fluids. The use of perhydropyrene, which possesses a high refractive index of 1.7014 at 193 nm, may be limited as an immersion fluid because of high absorption at 193 nm. Mixtures of cycloalkanes can lead to a higher enhancement of the refractive index together with a decrease on the viscosity. Exhaustive purification of the fluids is a critical step in determining the real absorption of the different fluids at 193 nm. Two simple purification processes of these cycloalkanes were developed that led to low absorption fluids in the VUV region. The possibility of forming the oxygen complex in aerated fluids was reduced by purging samples with argon or nitrogen. This easy elimination of the oxygen complex shows the weak bonding nature of this complex

Development and Evaluation of a 193nm Immersion Generation-Three Fluid Candidates

The need to extend 193nm immersion lithography necessitates the development of a third generation (Gen-3) of high refractive index (RI) fluids that will enable approximately 1.7 numerical aperture (NA) imaging. A multi-pronged approach was taken to develop these materials. One approach investigated the highest-index organic thus far discovered. The second approach used a very high refractive index nanoparticle to make a nanocomposite fluid. This report will describe the chemistry of the best Gen-3 fluid candidates and the systematic approach to their identification and synthesis. Images obtained with the Gen-3 fluid candidates will also be presented for a NA ≥ 1.7

Development and Evaluation of a 193nm Immersion Generation-Three Fluid Candidates

The need to extend 193nm immersion lithography necessitates the development of a third generation (Gen-3) of high refractive index (RI) fluids that will enable approximately 1.7 numerical aperture (NA) imaging. A multi-pronged approach was taken to develop these materials. One approach investigated the highest-index organic thus far discovered. The second approach used a very high refractive index nanoparticle to make a nanocomposite fluid. This report will describe the chemistry of the best Gen-3 fluid candidates and the systematic approach to their identification and synthesis. Images obtained with the Gen-3 fluid candidates will also be presented for a NA ≥ 1.7