Random dopant-induced variability in Si-InAs nanowire tunnel FETs: a quantum transport simulation study

In this letter, we report a quantum transport simu- lation study of the impact of Random Discrete Dopants (RDD)s on Si-InAs nanowire p-type Tunnel FETs. The band-to-band tunneling is simulated using the non-equilibrium Green’s func- tion formalism in effective mass approximation, implementing a two-band model of the imaginary dispersion. We have found that RDDs induce strong variability not only in the OFF-state but also in the ON-state current of the TFETs. Contrary to the nearly normal distribution of the RDD induced ON-current variations in conventional CMOS transistors, the TFET’s ON- currents variations are described by a logarithmic distribution. The distributions of other Figures of Merit (FoM) such as threshold voltage and subthreshold swing are also reported. The variability in the FoM is analysed by studying the correlation between the number and the position of the dopants

Numerical simulation of advanced CMOS and beyond CMOS devices

Co-supervisore: Marco PalaopenLo scaling dei dispositivi elettronici e l'introduzione di nuove opzioni tecnologiche per l'aumento delle prestazioni richiede un costante supporto dal punto di vista della simulazione numerica. Questa tesi si inquadra in tale ambito ed in particolare si prefigge lo scopo di sviluppare due tool software completi basati su tecniche avanzate al fine di predire le prestazioni di dipositivi nano-elettronici progettati per i futuri nodi tecnologiciDottorato di ricerca in Ingegneria industriale e dell'informazioneembargoed_20131103Conzatti, Francesc

Quantum Transport Simulation of III-V TFETs with Reduced-Order K.P Method

III-V tunneling field-effect transistors (TFETs) offer great potentials in future low-power electronics application due to their steep subthreshold slope and large "on" current. Their 3D quantum transport study using non-equilibrium Green's function method is computationally very intensive, in particular when combined with multiband approaches such as the eight-band K.P method. To reduce the numerical cost, an efficient reduced-order method is developed in this article and applied to study homojunction InAs and heterojunction GaSb-InAs nanowire TFETs. Device performances are obtained for various channel widths, channel lengths, crystal orientations, doping densities, source pocket lengths, and strain conditions

Monolithically Patterned Wide-Narrow-Wide All-Graphene Devices

We investigate theoretically the performance advantages of all-graphene nanoribbon field-effect transistors (GNRFETs) whose channel and source/drain (contact) regions are patterned monolithically from a two-dimensional single sheet of graphene. In our simulated devices, the source/drain and interconnect regions are composed of wide graphene nanoribbon (GNR) sections that are semimetallic, while the channel regions consist of narrow GNR sections that open semiconducting bandgaps. Our simulation employs a fully atomistic model of the device, contact and interfacial regions using tight-binding theory. The electronic structures are coupled with a self-consistent three-dimensional Poisson's equation to capture the nontrivial contact electrostatics, along with a quantum kinetic formulation of transport based on non-equilibrium Green's functions (NEGF). Although we only consider a specific device geometry, our results establish several general performance advantages of such monolithic devices (besides those related to fabrication and patterning), namely the improved electrostatics, suppressed short-channel effects, and Ohmic contacts at the narrow-to-wide interfaces.Comment: 9 pages, 11 figures, 2 table

High performance Tunnel Field Effect Transistors based on in-plane transition metal dichalcogenide heterojunctions

In-plane heterojunction tunnel field effect transistors based on monolayer transition metal dichalcogenides are studied by means of self-consistent non-equilibrium Green's functions simulations and an atomistic tight-binding Hamiltonian. We start by comparing several heterojunctions before focusing on the most promising ones, i.e WTe2-MoS2 and MoTe2-MoS2. The scalability of those devices as a function of channel length is studied, and the influence of backgate voltages on device performance is analysed. Our results indicate that, by fine-tuning the design parameters, those devices can yield extremely low sub-threshold swings (below 5mV/decade) and Ion/Ioff ratios higher than 1e8 at a supply voltage of 0.3V, making them ideal for ultra-low power consumption.Comment: 10 page

A review of selected topics in physics based modeling for tunnel field-effect transistors

The research field on tunnel-FETs (TFETs) has been rapidly developing in the last ten years, driven by the quest for a new electronic switch operating at a supply voltage well below 1 V and thus delivering substantial improvements in the energy efficiency of integrated circuits. This paper reviews several aspects related to physics based modeling in TFETs, and shows how the description of these transistors implies a remarkable innovation and poses new challenges compared to conventional MOSFETs. A hierarchy of numerical models exist for TFETs covering a wide range of predictive capabilities and computational complexities. We start by reviewing seminal contributions on direct and indirect band-to-band tunneling (BTBT) modeling in semiconductors, from which most TCAD models have been actually derived. Then we move to the features and limitations of TCAD models themselves and to the discussion of what we define non-self-consistent quantum models, where BTBT is computed with rigorous quantum-mechanical models starting from frozen potential profiles and closed-boundary Schr\uf6dinger equation problems. We will then address models that solve the open-boundary Schr\uf6dinger equation problem, based either on the non-equilibrium Green's function NEGF or on the quantum-transmitting-boundary formalism, and show how the computational burden of these models may vary in a wide range depending on the Hamiltonian employed in the calculations. A specific section is devoted to TFETs based on 2D crystals and van der Waals hetero-structures. The main goal of this paper is to provide the reader with an introduction to the most important physics based models for TFETs, and with a possible guidance to the wide and rapidly developing literature in this exciting research field

Simulation and Modeling of Novel Electronic Device Architectures with NESS (Nano-Electronic Simulation Software): A Modular Nano TCAD Simulation Framework

The modeling of nano-electronic devices is a cost-effective approach for optimizing the semiconductor device performance and for guiding the fabrication technology. In this paper, we present the capabilities of the new flexible multi-scale nano TCAD simulation software called NanoElectronic Simulation Software (NESS). NESS is designed to study the charge transport in contemporary and novel ultra-scaled semiconductor devices. In order to simulate the charge transport in such ultra-scaled devices with complex architectures and design, we have developed numerous simulation modules based on various simulation approaches. Currently, NESS contains a driftdiffusion, Kubo–Greenwood, and non-equilibrium Green’s function (NEGF) modules. All modules are numerical solvers which are implemented in the C++ programming language, and all of them are linked and solved self-consistently with the Poisson equation. Here, we have deployed some of those modules to showcase the capabilities of NESS to simulate advanced nano-scale semiconductor devices. The devices simulated in this paper are chosen to represent the current state-of-the-art and future technologies where quantum mechanical effects play an important role. Our examples include ultra-scaled nanowire transistors, tunnel transistors, resonant tunneling diodes, and negative capacitance transistors. Our results show that NESS is a robust, fast, and reliable simulation platform which can accurately predict and describe the underlying physics in novel ultra-scaled electronic devices.European Union Horizon 2020 - 688101 SUPERAID7EPSRC UKRI Innovation Fellowship - EP/S001131/1 (QSEE), No. EP/P009972/1 (QUANTDEVMOD)H2020-FETOPEN-2019 s- No.862539-Electromed-FET OPEN.No. EP/S000259/1(Variability PDK for design based research on FPGA/neuro computing

Single Particle Transport in Two-dimensional Heterojunction Interlayer Tunneling Field Effect Transistor

The single particle tunneling in a vertical stack consisting of monolayers of two-dimensional semiconductors is studied theoretically and its application to a novel Two-dimensional Heterojunction Interlayer Tunneling Field Effect Transistor (Thin-TFET) is proposed and described. The tunneling current is calculated by using a formalism based on the Bardeen's transfer Hamiltonian, and including a semi-classical treatment of scattering and energy broadening effects. The misalignment between the two 2D materials is also studied and found to influence the magnitude of the tunneling current, but have a modest impact on its gate voltage dependence. Our simulation results suggest that the Thin-TFETs can achieve very steep subthreshold swing, whose lower limit is ultimately set by the band tails in the energy gaps of the 2D materials produced by energy broadening. The Thin-TFET is thus very promising as a low voltage, low energy solid state electronic switch