Modeling, Algorithms and Implementation of the Microcontroller Control System for the Ion Beam Forming Process for Nanostructures Etching

Abstract. In this work a three-level control system for the vacuum-plasma system with the ion source based on high-frequency induction discharge architecture is described. The system is built on smart sensors and specially designed for operation in high EMI programmable logic controllers (PLCs) in the middle hierarchical level. The structure of PLC and the algorithms of the system are presented. Results of comparative simulation of classical management system and created one, as well as the results of the system applying to obtain beams of positive and negative ions and beams neutralized particles are reported