2,010 research outputs found
An Electromigration and Thermal Model of Power Wires for a Priori High-Level Reliability Prediction
In this paper, a simple power-distribution electrothermal model including the interconnect self-heating is used together with a statistical model of average and rms currents of functional blocks and a high-level model of fanout distribution and interconnect wirelength. Following the 2001 SIA roadmap projections, we are able to predict a priori that the minimum width that satisfies the electromigration constraints does not scale like the minimum metal pitch in future technology nodes. As a consequence, the percentage of chip area covered by power lines is expected to increase at the expense of wiring resources unless proper countermeasures are taken. Some possible solutions are proposed in the paper
Commercial Off-The-Shelf (COTS) Parts Risk and Reliability User and Application Guide
All COTS parts are not created equal. Because they are not created equal, the notion that one can force the commercial industry to follow a set of military specifications and standards, along with the certifications, audits and qualification commitments that go with them, is unrealistic for the sale of a few parts. The part technologies that are Defense Logistics Agency (DLA) certified or Military Specification (MS) qualified, are several generations behind the state-of-the-art high-performance parts that are required for the compact, higher performing systems for the next generation of spacecraft and instruments. The majority of the part suppliers are focused on the portion of the market that is producing high-tech commercial products and systems. To that end, in order to compete in the high performance and leading edge advanced technological systems, an alternative approach to risk assessment and reliability prediction must be considered
NEGATIVE BIAS TEMPERATURE INSTABILITY STUDIES FOR ANALOG SOC CIRCUITS
Negative Bias Temperature Instability (NBTI) is one of the recent reliability issues in
sub threshold CMOS circuits. NBTI effect on analog circuits, which require matched
device pairs and mismatches, will cause circuit failure. This work is to assess the
NBTI effect considering the voltage and the temperature variations. It also provides a
working knowledge of NBTI awareness to the circuit design community for reliable
design of the SOC analog circuit. There have been numerous studies to date on the
NBTI effect to analog circuits. However, other researchers did not study the
implication of NBTI stress on analog circuits utilizing bandgap reference circuit. The
reliability performance of all matched pair circuits, particularly the bandgap reference,
is at the mercy of aging differential. Reliability simulation is mandatory to obtain
realistic risk evaluation for circuit design reliability qualification. It is applicable to all
circuit aging problems covering both analog and digital. Failure rate varies as a
function of voltage and temperature. It is shown that PMOS is the reliabilitysusceptible
device and NBTI is the most vital failure mechanism for analog circuit in
sub-micrometer CMOS technology. This study provides a complete reliability
simulation analysis of the on-die Thermal Sensor and the Digital Analog Converter
(DAC) circuits and analyzes the effect of NBTI using reliability simulation tool. In
order to check out the robustness of the NBTI-induced SOC circuit design, a bum-in
experiment was conducted on the DAC circuits. The NBTI degradation observed in
the reliability simulation analysis has given a clue that under a severe stress condition,
a massive voltage threshold mismatch of beyond the 2mV limit was recorded. Bum-in
experimental result on DAC proves the reliability sensitivity of NBTI to the DAC
circuitry
Cross-Layer Resiliency Modeling and Optimization: A Device to Circuit Approach
The never ending demand for higher performance and lower power consumption pushes the VLSI industry to further scale the technology down. However, further downscaling of technology at nano-scale leads to major challenges. Reduced reliability is one of them, arising from multiple sources e.g. runtime variations, process variation, and transient errors. The objective of this thesis is to tackle unreliability with a cross layer approach from device up to circuit level
Robust low-power digital circuit design in nano-CMOS technologies
Device scaling has resulted in large scale integrated, high performance, low-power, and low cost systems. However the move towards sub-100 nm technology nodes has increased variability in device characteristics due to large process variations. Variability has severe implications on digital circuit design by causing timing uncertainties in combinational circuits, degrading yield and reliability of memory elements, and increasing power density due to slow scaling of supply voltage. Conventional design methods add large pessimistic safety margins to mitigate increased variability, however, they incur large power and performance loss as the combination of worst cases occurs very rarely.
In-situ monitoring of timing failures provides an opportunity to dynamically tune safety margins in proportion to on-chip variability that can significantly minimize power and performance losses. We demonstrated by simulations two delay sensor designs to detect timing failures in advance that can be coupled with different compensation techniques such as voltage scaling, body biasing, or frequency scaling to avoid actual timing failures. Our simulation results using 45 nm and 32 nm technology BSIM4 models indicate significant reduction in total power consumption under temperature and statistical variations. Future work involves using dual sensing to avoid useless voltage scaling that incurs a speed loss.
SRAM cache is the first victim of increased process variations that requires handcrafted design to meet area, power, and performance requirements. We have proposed novel 6 transistors (6T), 7 transistors (7T), and 8 transistors (8T)-SRAM cells that enable variability tolerant and low-power SRAM cache designs. Increased sense-amplifier offset voltage due to device mismatch arising from high variability increases delay and power consumption of SRAM design. We have proposed two novel design techniques to reduce offset voltage dependent delays providing a high speed low-power SRAM design. Increasing leakage currents in nano-CMOS technologies pose a major challenge to a low-power reliable design. We have investigated novel segmented supply voltage architecture to reduce leakage power of the SRAM caches since they occupy bulk of the total chip area and power. Future work involves developing leakage reduction methods for the combination logic designs including SRAM peripherals
A COMPARATIVE STUDY OF RELIABILITY FOR FINFET
The continuous downscaling of CMOS technologies over the last few decades resulted in higher Integrated Circuit (IC) density and performance. The emergence of FinFET technology has brought with it the same reliability issues as standard CMOS with the addition of a new prominent degradation mechanism. The same mechanisms still exist as for previous CMOS devices, including Bias Temperature Instability (BTI), Hot Carrier Degradation (HCD), Electro-migration (EM), and Body Effects. A new and equally important reliability issue for FinFET is the Self -heating, which is a crucial complication since thermal time-constant is generally much longer than the transistor switching times. FinFET technology is the newest technological paradigm that has emerged in the past decade, as downscaling reached beyond 20 nm, which happens also to be the estimated mean free path of electrons at room temperature in silicon. As such, the reliability physics of FinFET was modified in order to fit the newly developed transistor technology. This paper highlights the roles and impacts of these various effects and aging mechanisms on FinFET transistors compared to planar transistors on the basic approach of the physics of failure mechanisms to fit to a comprehensive aging model
Circuits and Systems Advances in Near Threshold Computing
Modern society is witnessing a sea change in ubiquitous computing, in which people have embraced computing systems as an indispensable part of day-to-day existence. Computation, storage, and communication abilities of smartphones, for example, have undergone monumental changes over the past decade. However, global emphasis on creating and sustaining green environments is leading to a rapid and ongoing proliferation of edge computing systems and applications. As a broad spectrum of healthcare, home, and transport applications shift to the edge of the network, near-threshold computing (NTC) is emerging as one of the promising low-power computing platforms. An NTC device sets its supply voltage close to its threshold voltage, dramatically reducing the energy consumption. Despite showing substantial promise in terms of energy efficiency, NTC is yet to see widescale commercial adoption. This is because circuits and systems operating with NTC suffer from several problems, including increased sensitivity to process variation, reliability problems, performance degradation, and security vulnerabilities, to name a few. To realize its potential, we need designs, techniques, and solutions to overcome these challenges associated with NTC circuits and systems. The readers of this book will be able to familiarize themselves with recent advances in electronics systems, focusing on near-threshold computing
Recommended from our members
Oxygen-insertion Technology for CMOS Performance Enhancement
Until 2003, the semiconductor industry followed Dennard scaling rules to improve complementary metal-oxide-semiconductor (CMOS) transistor performance. However, performance gains with further reductions in transistor gate length are limited by physical effects that do not scale commensurately with device dimensions: short-channel effects (SCE) due to gate-leakage-limited gate-oxide thickness scaling, channel mobility degradation due to enhanced vertical electric fields, increased parasitic resistances due to reductions in source/drain (S/D) contact area, and increased variability in transistor performance due to random dopant fluctuation (RDF) effects and gate work function variations (WFV). These emerging scaling issues, together with increased process complexity and cost, pose severe challenges to maintaining the exponential scaling of transistor dimensions. This dissertation discusses the benefits of oxygen-insertion (OI) technology, a CMOS performance booster, for overcoming these challenges. The benefit of OI technology to mitigate the increase in sheet resistance () with decreasing junction depth () for ultra-shallow-junctions (USJs) relevant for deep-sub-micron planar CMOS transistors is assessed through the fabrication of test structures, electrical characterization, and technology computer-aided design (TCAD) simulations. Experimental and secondary ion mass spectroscopy (SIMS) analyses indicate that OI technology can facilitate low-resistivity USJ formation by reducing and due to retarded transient-enhanced-diffusion (TED) effects and enhanced dopant retention during post-implantation thermal annealing. It is also shown that a low-temperature-oxide (LTO) capping can increase unfavorably due to lower dopant activation levels, which can be alleviated by OI technology. This dissertation extends the evaluation of OI technology to advanced FinFET technology, targeting 7/8-nm low power technology node. A bulk-Si FinFET design comprising a super-steep retrograde (SSR) fin channel doping profile achievable with OI technology is studied by three-dimensional (3-D) TCAD simulations. As compared with the conventional bulk-Si (control) FinFET design with a heavily-doped fin channel doping profile, SSR FinFETs can achieve higher ratios and reduce the sensitivity of device performance to variations due to the lightly doped fin channel. As compared with the SOI FinFET design, SSR FinFETs can achieve similarly low for 6T-SRAM cell yield estimation. Both SSR and SOI design can provide for as much as 100 mV reduction in compared with the control FinFET design. Overall, the SSR FinFET design that can be achieved with OI technology is demonstrated to be a cheaper alternative to the SOI FinFET technology for extending CMOS scaling beyond the 10-nm node. Finally, this dissertation investigates the benefits of OI technology for reducing the Schottky barrier height () of a Pt/Ti/p-type Si metal-semiconductor (M/S) contact, which can be expected to help reduce the specific contact resistivity for a p-type silicon contact. Electrical measurements of back-to-back Schottky diodes, SIMS, and X-ray photoelectron spectroscopy (XPS) show that the reduction in is associated with enhanced Ti 2p and Si 2p core energy level shifts. OI technology is shown to favor low- Pt monosilicide formation during forming gas anneal (FGA) by suppressing the grain boundary diffusion of Pt atoms into the crystalline Si substrate
Cross-Layer Optimization for Power-Efficient and Robust Digital Circuits and Systems
With the increasing digital services demand, performance and power-efficiency
become vital requirements for digital circuits and systems. However, the
enabling CMOS technology scaling has been facing significant challenges of
device uncertainties, such as process, voltage, and temperature variations. To
ensure system reliability, worst-case corner assumptions are usually made in
each design level. However, the over-pessimistic worst-case margin leads to
unnecessary power waste and performance loss as high as 2.2x. Since
optimizations are traditionally confined to each specific level, those safe
margins can hardly be properly exploited.
To tackle the challenge, it is therefore advised in this Ph.D. thesis to
perform a cross-layer optimization for digital signal processing circuits and
systems, to achieve a global balance of power consumption and output quality.
To conclude, the traditional over-pessimistic worst-case approach leads to
huge power waste. In contrast, the adaptive voltage scaling approach saves
power (25% for the CORDIC application) by providing a just-needed supply
voltage. The power saving is maximized (46% for CORDIC) when a more aggressive
voltage over-scaling scheme is applied. These sparsely occurred circuit errors
produced by aggressive voltage over-scaling are mitigated by higher level error
resilient designs. For functions like FFT and CORDIC, smart error mitigation
schemes were proposed to enhance reliability (soft-errors and timing-errors,
respectively). Applications like Massive MIMO systems are robust against lower
level errors, thanks to the intrinsically redundant antennas. This property
makes it applicable to embrace digital hardware that trades quality for power
savings.Comment: 190 page
- …