Optoelectronic devices and packaging for information photonics

This thesis studies optoelectronic devices and the integration of these components onto optoelectronic multi chip modules (OE-MCMs) using a combination of packaging techniques. For this project, (1×12) array photodetectors were developed using PIN diodes with a GaAs/AlGaAs strained layer structure. The devices had a pitch of 250μm, operated at a wavelength of 850nm. Optical characterisation experiments of two types of detector arrays (shoe and ring) were successfully performed. Overall, the shoe devices achieved more consistent results in comparison with ring diodes, i.e. lower dark current and series resistance values. A decision was made to choose the shoe design for implementation into the high speed systems demonstrator. The (1x12) VCSEL array devices were the optical sources used in my research. This was an identical array at 250μm pitch configuration used in order to match the photodetector array. These devices had a wavelength of 850nm. Optoelectronic testing of the VCSEL was successfully conducted, which provided good beam profile analysis and I-V-P measurements of the VCSEL array. This was then implemented into a simple demonstrator system, where eye diagrams examined the systems performance and characteristics of the full system and showed positive results. An explanation was given of the following optoelectronic bonding techniques: Wire bonding and flip chip bonding with its associated technologies, i.e. Solder, gold stud bump and ACF. Also, technologies, such as ultrasonic flip chip bonding and gold micro-post technology were looked into and discussed. Experimental work implementing these methods on packaging the optoelectronic devices was successfully conducted and described in detail. Packaging of the optoelectronic devices onto the OEMCM was successfully performed. Electrical tests were successfully carried out on the flip chip bonded VCSEL and Photodetector arrays. These results verified that the devices attached on the MCM achieved good electrical performance and reliable bonding. Finally, preliminary testing was conducted on the fully assembled OE-MCMs. The aim was to initially power up the mixed signal chip (VCSEL driver), and then observe the VCSEL output

Materials for high-density electronic packaging and interconnection

Electronic packaging and interconnections are the elements that today limit the ultimate performance of advanced electronic systems. Materials in use today and those becoming available are critically examined to ascertain what actions are needed for U.S. industry to compete favorably in the world market for advanced electronics. Materials and processes are discussed in terms of the final properties achievable and systems design compatibility. Weak points in the domestic industrial capability, including technical, industrial philosophy, and political, are identified. Recommendations are presented for actions that could help U.S. industry regain its former leadership position in advanced semiconductor systems production

Advances in electronic packaging technologies by ultra-small microvias, super-fine interconnections and low loss polymer dielectrics

The fundamental motivation for this dissertation is to address the widening interconnect gap between integrated circuit (IC) demands and package substrates specifically for high frequency digital-RF systems applications. Moore's law for CMOS ICs predicts that transistor density on ICs will double approximately every 18 months. The current state-of-the-art in IC package substrates is at 20µm lines/spaces and 50-60µm microvia diameter using epoxy dielectrics with loss tangent above 0.01. The research targets are to overcome the barriers of current technologies and demonstrate a set of advanced materials and process technologies capable of 5-10µm lines and spaces, and 10-30µm diameter microvias in a multilayer 3-D wiring substrate using 10-25µm thin film dielectrics with loss tangent in the <0.005. The research elements are organized as follows with a clear focus on understanding and characterization of fundamental materials structure-processing-property relationships and interfaces to achieve the next generation targets. (a) Low CTE Core Substrate, (b) Low Loss Dielectrics with 25µm and smaller microvias, (c) Sub-10µm Width Cu Conductors, and (d) Integration of the various dielectric and conductor processes.Ph.D.Committee Chair: Tummala, Rao; Committee Member: Iyer, Mahadevan; Committee Member: Saxena, Ashok; Committee Member: Swaminathan, Madhavan; Committee Member: Wong, Chingpin

JTEC Panel report on electronic manufacturing and packaging in Japan

This report summarizes the status of electronic manufacturing and packaging technology in Japan in comparison to that in the United States, and its impact on competition in electronic manufacturing in general. In addition to electronic manufacturing technologies, the report covers technology and manufacturing infrastructure, electronics manufacturing and assembly, quality assurance and reliability in the Japanese electronics industry, and successful product realization strategies. The panel found that Japan leads the United States in almost every electronics packaging technology. Japan clearly has achieved a strategic advantage in electronics production and process technologies. Panel members believe that Japanese competitors could be leading U.S. firms by as much as a decade in some electronics process technologies

Glass multilayer bonding for high density interconnect substrates

The aim of this research was the investigation of bonding borosilicate glass sheets, its trade mark CMZ, 100μm thickness, to create multilayer substrates capable of supporting high-density electrical interconnections. CMZ glass was chosen as it has a coefficient of thermal expansion that is close to that of silicon, thereby minimising thermal stresses in assemblies generated by manufacturing processes or service conditions. Two different methods of bonding the glass were used in this study; pressure assisted low temperature bonding (PALTB), and water glass bonding, using Sodium Trisilicate (Na2Si3O7) solution. These two bonding methods have already been applied in electronics manufacturing applications, such as silicon wafer bonding and multichip modules (MCMs). However, glass-to-glass bonding is a relatively new subject and this study is an attempt to standardise bonding processes. Additionally, the concept of using glass as a multilayer substrate provides a foundation for further exploration by other investigators. Initial tests that were carried out before standardising the procedures for these two methods showed that a two-stage bonding process provided optimum results. A preliminary stage commenced by placing the cleaned (using Decon 90 solution) samples in a vacuum oven for 15 minutes, then heating at 100oC for 1hr. The permanent stage was then achieved by heating the samples in a conventional oven at temperatures from 200 to 400oC, for different periods. At this stage, the main difference between the two methods was the application of pressure (1-2MPa) during heating of the PALTB samples. To evaluate the quality of the bonds, qualitative tests such as visual, optical microscope and dye penetrant were used. In addition, to estimate the strength and the rigidity of the interlayer bonds, two quantitative tests, comprising of deflection under cyclic stresses and crack opening were used. Thermal cycling and humidity tests were also used to assess resistance of the bonds to environmental effects. The results showed that heating to 100oC was insufficient to enhance the bonds, as occasionally a sudden increase of deflection was observed indicating slippage/delamination. These bonds were enhanced during the permanent bonding stage by heating to 300oC in PALTB, under a pressure of 1-2MPa. The crack-opening test showed that the delamination distances of the bonds in the permanent stage were lower than that for preliminary bonding in both bonding methods. The delamination distances from the crack opening tests were used to calculate the strain energy release rate (GIC) and fracture toughness (KIC) values of the interlayers. The results showed that the KIC values of the permanent PALTB and water glass interlayers were higher than 1MPa.m0.5, while the KIC value of the CMZ glass, determined by linear elastic fracture mechanics, was around 0.8MPa.m0.5. The optical observations revealed that the prepared bonded sheets did not delaminate or break after thermal cycling and humidity tests

Understanding Mechanisms of Metastasis of Aggressive Breast Cancers via Microfluidic Means

The spread of cancer from its site of origin to other organs is called metastasis, and it is this stage of the disease that is responsible for over 90% of cancer deaths. Tumors are comprised of a heterogeneous population and not every cell in a primary tumor has the intrinsic capability to metastasize. Understanding what gives certain metastatically enabled cells this potential will ultimately provide insight into how to target and prevent metastases. In order to form a metastasis, a cancer cell must: move, invade through often stiff supporting tissue, enter the vasculature via small intercellular spaces, survive the hydrodynamic forces of circulation, squeeze through vessel endothelium once again, and finally proliferate. Imbued with the knowledge of this metastatic journey of a cancer cell, it is understandable how very physical and mechanical in nature the process is. Therefore, to study the steps of metastasis effectively requires the ability to precisely control physical attributes of a cell’s surroundings. The engineering field of microfluidics affords this opportunity and in this work I advanced our present knowledge of the metastatic process by using microfluidic techniques in four fundament studies of critical steps required for metastases. In one study, cancer cells are challenged with a geometrically confining migration space which mimics the constraints of a lymphatic capillary and the early necessary intravasation metastatic step. After migration, motile and non-motile cells are recaptured and analyzed for genetic differences which allow for intravasation. In another study, the effects of secreted factors from normal immune cells in the tumor microenvironment are tested for their stimulation of cancer cell migration – the first required step of metastasis – in the most aggressive form of breast cancer that is considered metastatic at its inception. A third study leveraged the adhesive properties of cancer cells as a novel paradigm for circulating tumor cell capture and analysis independent of dynamic cell surface markers. Lastly, specifically designed microfluidic assays were used to determine a multiparametric cellular phenotype of the most aggressive subpopulation of cancer cells’ biomechanical properties, which may confer the capability to effectively traverse the inefficient steps of metastasis.PHDCellular & Molec Biology PhDUniversity of Michigan, Horace H. Rackham School of Graduate Studieshttps://deepblue.lib.umich.edu/bitstream/2027.42/143962/1/allensg_1.pd

Microstructural and mechanical characteristics of micro-scale intermetallic compounds interconnections

Following the continually increasing demand for high-density interconnection and multilayer packaging for chips, solder bump size has decreased significantly over the years, this has led to some challenges in the reliability of interconnects. This thesis presents research into the resulting effects of miniaturization on the interconnection with Sn-solder, especially focusing on the full intermetallics (IMCs) micro-joints which appear in the 3D IC stacking packaging. Thereby, systematic studies have been conducted to study the microstructural evolution and reliability issues of Cu-Sn and Cu-Sn-Ni IMCs micro-joints. (1) Phenomenon of IMCs planar growth: The planar IMCs interlayer was asymmetric and composed of (Cu,Ni)6Sn5 mainly in Ni/Sn (2.5~5 µm)/Cu interconnect. Meanwhile, it was symmetric two-layer structure in Cu/Sn (2.5~5 µm)/Cu interconnect with the Cu3Sn fine grains underneath Cu6Sn5 cobblestone-shape-like grains for each IMCs layer. Besides, it is worth noticing that the appearance of Cu-rich whiskers (the mixture of Cu/Cu2O/SnOx/Cu6Sn5) could potentially lead to short-circuit in the cases of ultra-fine (<10 µm pitch) interconnects for the miniaturization of electronics devices. (2) Microstructural evolution process of Cu-Sn IMCs micro-joint: The simultaneous solidification of IMCs interlayer supressed the scalloped growth of Cu6Sn5 grains in Cu/Sn (2.5 µm)/Cu interconnect during the transient liquid phase (TLP) soldering process. The growth factor of Cu3Sn was in the range of 0.29~0.48 in Cu-Cu6Sn5 diffusion couple at 240~290 °C, which was impacted significantly by the type of substrates. And the subsequent homogenization process of Cu3Sn grains was found to be consistent with the description of flux-driven ripening (FDR) theory. Moreover, Kirkendall voids appeared only in the Cu3Sn layer adjacent to Cu-plated substrate, and this porous Cu3Sn micro-joint was mechanically robust during the shear test. (3) Microstructural evolution of Cu-Sn-Ni IMCs micro-joint: There was obvious inter-reaction between the interfacial reactions in Ni/Sn (1.5 µm)/Cu interconnect. The growth factor of (Cu,Ni)3Sn on Cu side was about 0.36 at 240 °C, and the reaction product on Ni side was changed from Ni3Sn4 into (Cu,Ni)6Sn5 with the increase of soldering temperature. In particular, the segregation of Ni atoms occurred along with phase transformation at 290 °C and thereby stabilized the (Cu,Ni)6Sn5 phase for the high Ni content of 20 at.%. (4) Micro-mechanical characteristics of Cu-Sn-Ni IMCs micro-joint: The Young s modulus and hardness of Cu-Sn-Ni IMCs were measured by nanoindentation test, such as 160.6±3.1 GPa/ 7.34±0.14 GPa for (Cu,Ni)6Sn5 and 183.7±4.0 GPa/ 7.38±0.46 GPa for (Cu,Ni)3Sn, respectively. Besides, in-situ nano-compression tests have been conducted on IMCs micro-cantilevers, the fracture strength turns out to be 2.46 GPa. And also, the ultimate tensile stress was calculated to be 2.3±0.7 GPa from in-situ micro-bending tests, which is not sensitive with the microstructural change of IMCs after dwelling at 290 °C

Advanced information processing system for advanced launch system: Hardware technology survey and projections

The major goals of this effort are as follows: (1) to examine technology insertion options to optimize Advanced Information Processing System (AIPS) performance in the Advanced Launch System (ALS) environment; (2) to examine the AIPS concepts to ensure that valuable new technologies are not excluded from the AIPS/ALS implementations; (3) to examine advanced microprocessors applicable to AIPS/ALS, (4) to examine radiation hardening technologies applicable to AIPS/ALS; (5) to reach conclusions on AIPS hardware building blocks implementation technologies; and (6) reach conclusions on appropriate architectural improvements. The hardware building blocks are the Fault-Tolerant Processor, the Input/Output Sequencers (IOS), and the Intercomputer Interface Sequencers (ICIS)