Stabilization of colloidal palladium particles by a block copolymer of polystyrene and a block containing amide sidegroups

A block copolymer of polystyrene and poly(tert-butylmethacrylate) was prepared by anionic polymerization. The ester groups of the poly(tert-butylmethacrylate) were hydrolyzed, after wich the remaining carboxyl groups were reacted with pyrrolidine. The resulting block copolymer with amide sidegroups was used for stabilization of a palladium colloid in toluene

Study of solution properties of block copolymers Final report

Solution properties of polybutadiene and polystyrene block copolymer

Block Copolymer at Nano-Patterned Surfaces

We present numerical calculations of lamellar phases of block copolymers at patterned surfaces. We model symmetric di-block copolymer films forming lamellar phases and the effect of geometrical and chemical surface patterning on the alignment and orientation of lamellar phases. The calculations are done within self-consistent field theory (SCFT), where the semi-implicit relaxation scheme is used to solve the diffusion equation. Two specific set-ups, motivated by recent experiments, are investigated. In the first, the film is placed on top of a surface imprinted with long chemical stripes. The stripes interact more favorably with one of the two blocks and induce a perpendicular orientation in a large range of system parameters. However, the system is found to be sensitive to its initial conditions, and sometimes gets trapped into a metastable mixed state composed of domains in parallel and perpendicular orientations. In a second set-up, we study the film structure and orientation when it is pressed against a hard grooved mold. The mold surface prefers one of the two components and this set-up is found to be superior for inducing a perfect perpendicular lamellar orientation for a wide range of system parameters

Graft Copolymerization of Methacrylic Acid, Acrylic Acid and Methyl Acrylate onto Styrene–Butadiene Block Copolymer

Methyl acrylate, methacrylic acid, and acrylic acid have been graft copolymerized onto styrene–butadiene block copolymer. All three monomers react through the macroradical interacting with the double bond of butadiene. The site of reaction has been established by infrared spectroscopy. For methyl acrylate every unit of the styrene–butadiene block copolymer is grafted but only a small fraction is grafted when the acids are used. The difference apparently lies in the fact that the reaction with the ester is homogeneous while with the acids the reactions are heterogeneous

Enhancing ordering dynamics in solvent-annealed block-copolymer films by lithographic hard masks supports

We studied solvent-driven ordering dynamics of block copolymer films supported by a densely cross-linked polymer network designed as organic hard mask (HM) for lithographic fabrications. The ordering of microphase separated domains at low degrees of swelling corresponding to intermediate/strong segregation regimes was found to proceed significantly faster in films on a HM layer as compared to similar block copolymer films on silicon wafers. The ten-fold enhancement of the chain mobility was evident in the dynamics of morphological phase transitions and of related process of terrace-formation on a macroscale, as well as in the degree of long-range lateral order of nanostructures. The effect is independent of the chemical structure and on the volume composition (cylinder-/ lamella-forming) of the block copolymers. In-situ ellipsometric measurements of the swelling behavior revealed a cumulative increase in 1-3 vol. % in solvent up-take by HM-block copolymer bilayer films, so that we suggest other than dilution effect reasons for the observed significant enhancement of the chain mobility in concentrated block copolymer solutions. Another beneficial effect of the HM-support is the suppression of the film dewetting which holds true even for low molecular weight homopolymer polystyrene films at high degrees of swelling. Apart from immediate technological impact in block copolymer-assisted nanolithography, our findings convey novel insight into effects of molecular architecture on polymer-solvent interactions.Comment: This document is the unedited Author's version of a Submitted Work that was subsequently accepted for publication in Macromolecules, copyright \c{opyright} American Chemical Society after peer review. To access the final edited and published work see http://pubs.acs.org/doi/abs/10.1021/ma500561